The invention discloses an ultra-narrow-
pitch wafer level encapsulation 
cutting method. According to the method, a layer of 
photoresist is paved at the front side of a 
wafer, a first opening is formed through an 
exposure and development process, and a 
dielectric layer corresponding to a 
cutting path is exposed; then, a second opening is formed through an 
etching process or a 
laser cutting process, so that the second opening penetrates into a substrate at a certain depth; then, the 
grinding is carried out from the back surface, so that the stress is totally concentrated in a sharp corner position of the second opening formed through 
etching or cutting, and certain cracks are generated; if the extension resistance generated in the 
grinding process is great enough, the cracks can crack along a certain angle, and the 
wafer is further divided into single chips; if the extension resistance generated in the 
grinding process is not great enough, certain external force is exerted on a wafer, so that the cracks expand, and the water is further divided into the single chips. The ultra-narrow-
pitch wafer level encapsulation cutting method has the advantages that the cutting of the wafer with the ultra-narrow cutting passage can be realized, in addition, the technological process is simple, and the 
process window is also correspondingly increased.