FFS (Fringe Field Switching) type TFT-LCD (Thin Film Transistor Liquid Crystal Display) array substrate and manufacturing method thereof

Abstract

The invention discloses an FFS (Fringe Field Switching) type TFT-LCD (Thin Film Transistor Liquid Crystal Display) array substrate and a manufacturing method thereof. The method comprises the following steps of: depositing a first metal film on a transparent substrate, and forming a pattern comprising a grid line, a grid electrode and a common electrode line through a first pattern composition process; depositing a grid insulating layer, an active layer film and a second metal film, and retaining the active layer film and the second metal film in a data line region, a source electrode region,a drain electrode region and a TFT channel region through a second pattern composition process; depositing a first transparent conducting film, and forming a pattern comprising a source electrode, a drain electrode, a TFT channel and a pixel electrode through a third pattern composition process; and depositing a passivation layer, forming a pattern comprising a connecting hole through a fourth pattern composition process, carrying out photoresist ashing process, depositing a second transparent conducting layer, and forming a pattern comprising a common electrode through an off-ground stripping process. The invention can reduce the excessive etching degree of the TFT channel and can ensure the display performance of a liquid crystal display.

Description

technical field [0001] The invention relates to a liquid crystal display, in particular to an FFS type TFT-LCD array substrate capable of reducing the degree of excessive etching of a TFT channel and a manufacturing method thereof. Background technique [0002] Thin Film Transistor Liquid Crystal Display (TFT-LCD for short) is a main flat panel display (Flat Panel Display, FPD for short). [0003] According to the direction of the electric field driving the liquid crystal, the TFT-LCD is divided into a vertical electric field type and a horizontal electric field type. Among them, the vertical electric field TFT-LCD needs to form pixel electrodes on the array substrate and the common electrode on the color filter substrate; however, the horizontal electric field TFT-LCD needs to form the pixel electrodes and common electrodes on the array substrate at the same time. Therefore, when manufacturing the array substrate of the horizontal electric field type TFT-LCD, it is necessa...

AI Technical Summary

Problems solved by technology

Since it is difficult to control the degree of etching by wet etching, the problem of over etching of the TFT channel (Over Etch) is inevitable.

For the significant TFT channel in the array substrate, this over-etching is a non-negligible defect, which will cause the TFT channel to widen and have a significant adverse effect on the overall performance of the liquid crystal display.

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