Automatic exposure adjusting method and system

An automatic exposure and adjustment method technology, applied in the field of image processing, can solve the problems of complex image exposure state judgment methods, image exposure state judgment lagging behind real-time performance, etc., to achieve the effect of reducing the amount of calculation, improving real-time performance, and avoiding calculation steps

Active Publication Date: 2014-05-28
VERISILICON MICROELECTRONICS SHANGHAI +3
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Problems solved by technology

[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide an automatic exposure adjustment method and system, which is used t

Method used

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  • Automatic exposure adjusting method and system
  • Automatic exposure adjusting method and system

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Embodiment Construction

[0040] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0041] see figure 1 A flow chart of the image automatic exposure adjustment method of the present invention.

[0042]It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number, shape and shape of the components in actual implementation. Dimension...

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Abstract

The invention provides an automatic exposure adjusting method and system. The method at least comprises the steps of obtaining a current image, and carrying out statistics on the pixels contained in a bright area of the image and the pixels contained in a dark area of the image and the brightness of the pixels; calculating the pixel proportion of the bright area and the pixel proportion of the dark area according to a statistical result; adjusting the exposure parameters of imaging equipment according to the brightness value of the current statistical pixels and a preset brightness threshold value if at least one of the pixel proportion of the bright area and the pixel proportion of the dark area is larger than or equal to a preset proportion; continuously carrying out statistic if the pixel proportion of the bright area and the pixel proportion of the dark area are both smaller than the preset proportion until the brightness values of the pixels reach the preset brightness threshold value. According to the automatic exposure adjusting method and system, operation complexity and operation amount are both low in the exposure state judging process, the exposure state of the image can be judged fast, and the instantaneity of exposure control over the image can be improved at the same time.

Description

technical field [0001] The present invention relates to the technical field of image processing, in particular to an automatic exposure adjustment method and system. Background technique [0002] With the development of digital technology, digital cameras and digital video cameras have been used in many different environments. Wherein, a main function of digital camera and digital video camera is exactly automatic exposure. Automatic exposure is the default setting of a digital camera or digital video camera. In this exposure mode, the camera will automatically control the exposure of the image. The user does not need to do anything. The sensor on the camera or video camera can automatically set it according to the intensity of light reflected from the scene Exposure parameters, such as exposure time setting, gain, aperture value, etc. [0003] However, if the image transmitted from the imaging device is under-exposed or over-exposed, it will have a great impact on the sub...

Claims

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Application Information

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IPC IPC(8): H04N5/235H04N9/77
Inventor 宁珺杨柁周志刚雷永明周缵
Owner VERISILICON MICROELECTRONICS SHANGHAI
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