The invention discloses a hierarchical optical proximity effect correction method, including the preparation of the pre-correction module library, the initialization of the mask graphic offset and the step using dynamic adjustment algorithm for rapid computation, and it provides a method to make full use of the territory hierarchical structure in the optical proximity effect correction, and under the deep submicron conditions, the high precision mask process is considered as high costs for too big calculation quantities, and the computational complexity can be greatly reduced under the help of the new algorithm, and meanwhile, the new approach provides the module library with pre-correction results to IC design process, making the design engineer more flexible and effective to check the design. The method of the invention can be used for aided high-precision IC mask board, to increase the results predictability in IC design process, and OPC correction computational speed, lower costs, and increase IC production yield and reduce production cycle.