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264results about How to "Reduce divergence" patented technology

Backlight using surface-emitting light sources

A lighting apparatus for providing illumination, comprising: a) an array of surface-emitting light sources, wherein each surface-emitting light source directs a source illumination beam, over a beam angle θ, toward an illumination plane; b) an array of beam spreading optical elements corresponding with the array of surface-emitting light sources, wherein refraction of the source illumination beam by each beam spreading optical element substantially satisfies a distribution function:
dy/dθ=ƒ(θ)
wherein y is a radial distance along the illumination plane from the optical axis of the beam-spreading optical element, dy is an arbitrarily small increment of the radial distance, dθ is the angular increment of the beam angle corresponding to dy, and ƒ(θ) is the distribution function for the angular distribution of the light source, such that each beam spreading optical element adjusts the luminous intensity of the source illumination beam from the corresponding surface-emitting light source to provide a uniformized illumination beam directed toward the illumination plane; and, c) an array of beam-divergence reducing lens elements, wherein each beam-divergence reducing lens element reduces the angular divergence of a corresponding uniformized illumination beam, providing illumination having improved uniformity and reduced beam divergence thereby.
Owner:SKC HAAS DISPLAY FILMS CO LTD

Migration method and system based on deep residual error correction network

The invention discloses a migration method and system based on a deep residual error correction network. The method comprises the following steps: setting values of parameters in a pre-constructed target network model based on a source domain data set and a target domain data set in the network; based on the target network model with the set parameter values, carrying out image category classification on all the data in the target domain data set, and obtaining the category corresponding to each piece of data; labeling the corresponding data in the target domain data set based on the categorycorresponding to each piece of data to obtain a target domain data set with a label; wherein the target network model is constructed based on a residual error correction block and a loss function; wherein the source domain data set comprises a plurality of pictures and labels corresponding to the pictures; wherein the target domain data set comprises a plurality of pictures. According to the residual error correction block and the loss function provided by the concept of the invention, the generalization ability of the original network can be improved through deepening the network, so that thecross-domain image classification accuracy is improved.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Backlight using surface-emitting light sources

A lighting apparatus for providing illumination, comprising:a) an array of surface-emitting light sources, wherein each surface-emitting light source directs a source illumination beam, over a beam angle θ, toward an illumination plane;b) an array of beam spreading optical elements corresponding with the array of surface-emitting light sources, wherein refraction of the source illumination beam by each beam spreading optical element substantially satisfies a distribution function:dy / d⁢⁢θ=f⁡(θ)wherein y is a radial distance along the illumination plane from the optical axis of the beam-spreading optical element,dy is an arbitrarily small increment of the radial distance,dθ is the angular increment of the beam angle corresponding to dy, andƒ(θ) is the distribution function for the angular distribution of the light source, such that each beam spreading optical element adjusts the luminous intensity of the source illumination beam from the corresponding surface-emitting light source to provide a uniformized illumination beam directed toward the illumination plane;and,c) an array of beam-divergence reducing lens elements, wherein each beam-divergence reducing lens element reduces the angular divergence of a corresponding uniformized illumination beam,providing illumination having improved uniformity and reduced beam divergence thereby.
Owner:SKC HAAS DISPLAY FILMS CO LTD

Device and method for reckoning fatigue crack propagation rate of flat alloy by AC potentiometry

InactiveCN101832970AImprove conductivityIsolation of high resistance interferenceMaterial magnetic variablesPotential measurementAlloy
The invention provides a device and a method for reckoning the fatigue crack propagation rate of a flat alloy by AC potentiometry, relating to the field of detecting material fatigue performance. The method comprises the following steps: in the process of a tension-tension fatigue test, two pairs of probes are arranged on the surface of a flat alloy sample, and the sample monitors electric potential change at the two sides of a crack in real time by an AC potentiometry sensor thereon when the fatigue crack propagates; the electric potential change is transmitted to a dual-trace oscilloscope by an amplifier; the dual-trace oscilloscope displays the electric potential oscillogram of the propagation of the two ends of the crack; and the electric potential oscillogram is input to a computer by an A/D converter, and is analyzed by a bundled software to obtain fatigue propagation rate such as the fatigue crack propagation rate and the like. The device of the invention mainly comprises a fatigue-testing machine, sample fixtures, the AC potentiometry sensor, potential measurement probes, lead wires, a signal amplifier, the dual-trace oscilloscope, the A/D converter, a CCD image acquisition system and the computer. The invention is applicable to research on the fatigue crack propagation behavior of the alloy.
Owner:JIANGSU UNIV

Method and arrangement for the plasma-based generation of intensive short-wavelength radiation

The invention is directed to a method and an arrangement for the plasma-based generation of intensive short-wavelength radiation, particularly EUV radiation. The object of the invention, to find a novel possibility for plasma-based generation of intensive soft x-radiation, particularly EUV radiation, which permits efficient energy conversion in the desired spectral band with high repetition frequency (several kHz) of the plasma excitation, minimized emission of debris and low erosion of the nozzle of the target generator, is met according to the invention in that an additional energy beam is directed on the target flow spatially in advance of its interaction with the high-energy beam, the target flow being acted upon by this additional energy beam with substantially weaker energy pulses compared to the high-energy beam in order to divide the target flow into a first portion and at least one second portion, wherein the target flow is excited at an interaction point within the second portion by the high-energy beam for generating a hot, radiating plasma, and the second portion is decoupled from the first portion and therefore from the target generator in such a way that a hydrodynamic disturbance generated in the second portion by the pulse of the high-energy beam is transmitted into the first portion only negligibly.
Owner:XTREME TECH
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