100 results about "Interaction point" patented technology

The invention is directed to a method and an arrangement for the plasma-based generation of intensive short-wavelength radiation, particularly EUV radiation. The object of the invention, to find a novel possibility for plasma-based generation of intensive soft x-radiation, particularly EUV radiation, which permits efficient energy conversion in the desired spectral band with high repetition frequency (several kHz) of the plasma excitation, minimized emission of debris and low erosion of the nozzle of the target generator, is met according to the invention in that an additional energy beam is directed on the target flow spatially in advance of its interaction with the high-energy beam, the target flow being acted upon by this additional energy beam with substantially weaker energy pulses compared to the high-energy beam in order to divide the target flow into a first portion and at least one second portion, wherein the target flow is excited at an interaction point within the second portion by the high-energy beam for generating a hot, radiating plasma, and the second portion is decoupled from the first portion and therefore from the target generator in such a way that a hydrodynamic disturbance generated in the second portion by the pulse of the high-energy beam is transmitted into the first portion only negligibly.

A pixelated detector assembly comprising a stack of thin detector crystals, each detector crystal having a pair of planar surfaces bound by edges substantially thinner than the dimensions of the surfaces. The stack is disposed such that the radiation to be detected is incident on one set of edges of the stack of detector crystals. The dimension of the planar surfaces in the general direction of incidence of the radiation incidence is sufficient to ensure that substantially all of the high energy photons to be detected are absorbed within the depth of the detector assembly. Each of the detector crystals has a two-dimensional pixelated anode array formed on one of its planar surfaces. A cathode is formed on its opposite planar surface, preferably covering substantially all of the surface. The position of interaction of a photon in the plane perpendicular to the direction of the incident radiation, is determined by which of the detector crystals in the stack detects the absorption, and by which of the rows of pixelated anodes in that crystal detects the absorption. The depth of interaction of a photon is determined by the location of the particular anode pixel in the above-mentioned row of pixelated anodes where the photon absorption is detected. The detector assembly is thus able to detect the point of interaction of a photon in all three dimensions.

The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.

The invention is directed to an arrangement for providing target material for the generation of short-wavelength electromagnetic radiation, in particular EUV radiation. It is the object of the invention to find a novel possibility for providing target material for the generation of short-wavelength radiation based on an energy beam induced plasma which makes it possible to supply a reproducible successive flow of mass-limited targets in the interaction chamber in such a way that only the amount of target material needed for efficient generation of radiation achieves plasma generation. This object is met, according to the invention, in that the target generator opens into a selection chamber which precedes the interaction chamber and which has, along the target path, an outlet opening into the interaction chamber and in which a target selector is arranged. The target selector has elements for eliminating individual targets needed for the regular target sequence of the target generator, so that only the individual targets needed for efficient plasma generation and radiation generation corresponding to the pulse frequency of the energy beam are admitted to the interaction point.

Systems and methods of managing customer journeys are implemented using one or more processors in a computing system. Each journey may comprise a succession of interactions at interaction points such as telephone conversations, responses to an interactive voice response “IVR” system and viewing a web page. Customer journey scores are determined for customers at one or more interaction points along the customer journey and the customer journey score is used to determine whether and when an intervention should take place. Models for determining customer journey scores may be created for a set of customers based on one or both of subjective and objective data relating to a subset of the set of customers that have made some or part of the journey, e.g. customers that have responded to polls. An intervention may take place during the journey or after completion of the journey.