A method for manufacturing an integrated resonant quartz accelerometer

Through an integrated resonant quartz accelerometer manufacturing method, the problems of insufficient width and mechanical stability of the cantilever beam in the prior art are solved, and the high sensitivity and mechanical stability of the cantilever beam width reaching 30 μm are achieved.

CN119018847BActive Publication Date: 2025-03-25YUNJI XINGGUANG (ZHUHAI) MICROELECTRONICS CO LTD +1
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Patent Information

Application Number
CN202411467855.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-10-21
Publication Date
2025-03-25
Estimated Expiration
2044-10-21

AI Technical Summary

Technical Problem

The existing quartz accelerometer manufacturing process is difficult to achieve the width of the cantilever beam less than 70 μm, and the mechanical stability is insufficient, so the electrodeposited pattern cannot be etched on the side wall surface of the cantilever beam.

Method used

The integrated resonant quartz accelerometer manufacturing method is used to rinse the quartz sheets by pickling, alkali washing and DI water to form a film layer of preset thickness, use magnetron sputtering coating, spin-coated photoresist and double-sided exposure to form a metal hard mask, combined with wet etching and dry etching to form a cantilever beam and hinge, and electrodes are made on the side wall of the cantilever beam.

Benefits of technology

The width of the cantilever beam reaches about 30 μm, which improves the sensitivity of the accelerometer by about 4 times, ensures mechanical stability, and increases the electromechanical coupling coefficient.

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Abstract

The present invention discloses a manufacturing method of an integrated resonant quartz accelerometer, comprising: selecting a quartz sheet, sequentially acid-washing, alkaline-washing and DI water-rinsing the quartz sheet to obtain a processed quartz sheet; performing film coating to form a film layer; forming a quartz sheet with a metal hard mask having an accelerometer structure pattern; placing a first organic etching solution for wet etching; removing edges on the sidewalls of the quartz sheet; forming a metal hard mask on the lower surface of the hinge thickness direction of the quartz sheet and a metal hard mask on the upper surface of the cantilever beam thickness direction, and then placing the quartz sheet in a second organic etching solution for etching to obtain a cantilever beam and a hinge; removing the surface film layer of the quartz sheet; and making electrodes on the surface of the cantilever beam of the quartz accelerometer to obtain a final quartz accelerometer. The present invention increases the sensitivity of the quartz accelerometer by about 4 times, ensures its mechanical stability, and also greatly increases the electromechanical coupling coefficient.
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