Aromatic reactor

Abstract

The invention relates to an aromatic reactor. The aromatic compound reactor of the present invention comprises a mixing member in which reactants can be uniformly dispersed, thereby increasing the flow rate of the reactants to improve the degree of mixing between the substances, increasing the mixing efficiency between the reactants, and weakening the unreacted portion at the lower part of the reactor, thereby improving the selectivity of the reactants. Accordingly, the aromatic compound reactor can improve the productivity and yield of reactants.

Description

Technical Field

[0001] The present invention relates to an apparatus for improving the reactivity of an aromatic compound, and more particularly, to an aromatic compound reactor capable of increasing the mixing efficiency of reactants and improving the selectivity of reactants. Background Art

[0002] Toluene (an aromatic compound) can be chlorinated by reacting with chlorine to be made into o-chlorotoluene and p-chlorotoluene. In the reactor where the chlorination reaction occurs, gaseous chlorine is injected through a distributor arranged inside the reactor, and a portion of the reaction solution containing toluene is injected through a nozzle at the bottom of the reactor to cause the reaction.

[0003] The reactor having such a structure has a problem in that a channeling phenomenon occurs while a reaction solution containing toluene (aromatic compound) reacts with chlorine, or the degree of mixing between substances is significantly deteriorated, thereby reducing reaction efficiency.

[0004] In Korean Application Publication No. 10-1196278 ("Gas distributor for reactor", November 6, 2012, hereinafter referred to as "Related Technology Document"), a supply pipe facility for supplying reactants from the bottom of the reactor to the distributor of the reactor distributor system through a distribution system arranged on the distributor is disclosed. In addition, the device is configured to spray liquid through a spray nozzle on the outside of the reactor. However, such a reactor has a problem that the mixing efficiency is reduced due to poor mixing during the process of mixing the reactants and the gas.

[0005] Public Content

[0006] Technical issues

[0007] An object of the present invention is to provide an aromatic compound reactor including a mixing member installed therein so that reactants can be uniformly distributed, instead of supplying reactants through a nozzle at the bottom of the aromatic compound reactor of the related art.

[0008] Technical Solution

[0009] In a general aspect, an aromatic compound reactor includes: a reactor having a reaction space formed therein; a plurality of reactant distributors arranged to be spaced apart from each other at a lower portion of the reactor and formed as a flow path to supply reactants to the reaction space through both ends of the flow path; at least one reaction solution injection portion formed as a through hole between the plurality of reactant distributors and supplying a reaction solution to the reaction space; and a mixing member disposed in the reaction solution injection portion and dispersing the reaction solution in the reaction space using a rotating flow induced therein.

[0010] Beneficial Effects

[0011] According to the present invention, by disposing a mixing member in the reactor, the average flow rate of the reactants injected into the reactor can be increased, thereby minimizing the back mixing of the reactants.

[0012] In addition, by configuring a mixing member in the reactor, the flow rate of the reactants can be increased, thereby improving the degree of mixing between the substances and increasing the mixing efficiency between the reactants.

[0013] Furthermore, by disposing a mixing member in the reactor, the unreacted portion at the bottom of the reactor can be weakened, thereby improving the selectivity of the reactants. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 is a schematic diagram showing a front view and a bottom view of a related art aromatic compound reactor.

[0015] Figure 2 is a schematic diagram showing a side view and a bottom view of an aromatic compound reactor of the present invention.

[0016] Figure 3 The shape and structure of a mixing member installed in an aromatic compound reactor according to Example 2 of the present invention are shown.

[0017] Figure 4 This is a table showing the effect of dispersing the flow direction of toluene introduced from the bottom of the reactor and increasing its linear velocity by installing the mixing member of the present invention, and the effect of correspondingly improving the degree of catalyst mixing.

[0018] Figure 5 TABLE 2 is a table showing a simulation of the unreacted portion at the bottom of the reactor of the present invention.

[0019] Figure 6 (a) is a graph showing the uniformity of the catalyst (FeCl3) of the present invention.

[0020] Figure 6(b) is a graph showing the standard deviation of the catalyst (FeCl3) of the present invention.

[0021] Figure 7 : is a table showing a simulation of the catalyst deposition phenomenon of the present invention. DETAILED DESCRIPTION

[0022] To achieve this purpose, the aromatic compound reactor of the present invention includes: a reactor 100 having a reaction space formed therein; a plurality of reactant distributors 200, which are arranged to be separated from each other at the lower part of the reactor 100 and formed as a flow path to supply reactants to the reaction space through both ends of the flow path; at least one reaction solution injection part 300, which is formed as a through hole between the plurality of reactant distributors 200 and supplies a reaction solution to the reaction space; and a mixing member 400, which is disposed in the reaction solution injection part 300 and disperses the reaction solution in the reaction space by using a rotating flow induced therein.

[0023] Furthermore, in the aromatic compound reactor, the reaction solution supplied to the reaction solution injection portion and the reactant of the reactant distributor may be dispersed by the mixing member.

[0024] Furthermore, the reactant supplied to the reactant distributor 200 may be a gas or a liquid.

[0025] In addition, when the height of the reactor 100 is h, the mixing member 400 may be formed such that a distance from a lower bottom surface of the reactor 100 to a lower bottom surface of the mixing member 400 is in a range of 0.008h to 0.02h.

[0026] In addition, the reactant distributor 200 may be formed such that when the height of the reactor 100 is h, the distance from the upper portion of the mixing member 400 to the center of the reactant distributor 200 is in the range of 0.1h to 0.4h.

[0027] In addition, the mixing member 400 may include: a hub 410, which is connected to the center of the mixing member 400; a sector 420, which includes a plurality of blades 421 formed on the outer circumferential surface of the hub 410; a circumferential portion 430 surrounding the outer circumferential portion 430 of the sector 420; and an impact portion 440, which is formed at the center of the circumferential portion 430 and against which the injected reaction solution collides.

[0028] In addition, the blades 421 may be configured such that the reaction solution injected from the reaction solution injection part 300 and collided with the impact part 440 may be dispersed in the reaction space by a rotational flow caused by the blades 421 .

[0029] In addition, when the thickness of the mixing member 400 is t, the thickness of the blade 421 may be 0.6t to 1.0t.

[0030] In addition, the reaction solution injection part 300 may be connected to an external reaction solution supply part in the form of a nozzle.

[0031] Furthermore, a plurality of reactant dispensers 200 may be connected to an external reactant liquid supply.

[0032] Embodiments of the invention

[0033] The present invention relates to an aromatic compound reactor and will be described in detail by way of drawings as well as examples and comparative examples.

[0034] Figure 1 is a schematic diagram showing a front view and a bottom view of a related art aromatic compound reactor Figure 1 .

[0035] like Figure 1 As shown, in the related art aromatic compound reactor, a portion of the reaction solution containing the aromatic compound is injected through a nozzle at the bottom of the reactor. However, there is a problem that the reaction solution is not mixed with the reaction gas and exhibits a channeling phenomenon, which significantly deteriorates the mixing degree between the materials.

[0036] Therefore, in the present invention, if Figure 2 As shown, a mixing member 400 is disposed above the nozzle at the bottom of the reactor 100 , and through optimized design, the mixing member 400 is configured to reduce the channeling phenomenon inside the reactor 100 and increase the average flow rate to minimize back mixing in the reactor 100 .

[0037] Figure 2 is a schematic diagram 1000 showing side and bottom views of an aromatics reactor of the present invention.

[0038] The reactor 100 may have a reaction space formed therein.

[0039] In addition, a plurality of reactant distributors 200 may be formed to be spaced apart from each other at a lower portion of the reactor 100 and formed in a flow path shape so that reactants may be supplied to the reaction space through both ends.

[0040] Here, a plurality of reactant distributors 200 may be connected to an external reactant supply unit.

[0041] In addition, here, when the height of the reactor 100 is h, the reactant distributor 200 may be formed such that the distance from the top of the mixing member 400 to the center of the reactant distributor 200 is in the range of 0.1h to 0.4h.

[0042] In addition, at least one reaction solution injection part 300 may be disposed between the plurality of reactant distributors 200 , and may supply the reaction solution to the reaction space.

[0043] Here, the reaction solution injection part 300 may be connected to an external reaction solution supply unit in the form of a nozzle.

[0044] In addition, the mixing member 400 may be provided in the reaction solution injection part 300 , and the reaction solution may be dispersed in the reaction space by using a rotation flow formed by the blades 421 provided in the mixing member 400 .

[0045] Therefore, the aromatic compound reactor 100 having such a structure has an effect of dispersing the reaction solution supplied to the reaction solution injection part 300 and the reactant of the reactant distributor 200 in the reaction space by the rotation flow caused by the blades 421 provided in the mixing member 400 .

[0046] In addition, the reaction solution supplied to the reaction solution injection part 300 and the reactant of the reactant distributor 200 may be dispersed by the mixing member 400 , so that the reaction solution may be dispersed.

[0047] At this time, the reactant supplied to the reactant distributor 200 may be supplied in the form of gas or liquid.

[0048] Figure 3 The shape and structure of a mixing member installed in an aromatic compound reactor according to Example 2 of the present invention are shown.

[0049] The hub 410 may be coupled to the center of the mixing member 400 .

[0050] The sector 420 may include a plurality of blades 421 formed on an outer circumferential surface of the hub.

[0051] Furthermore, the outer side of the sector 420 may be surrounded by a circumferential portion 430 .

[0052] An impact portion 440 is formed at the center of the circumferential portion 430 so that the injected reaction solution can collide therewith, thereby dispersing the reactants.

[0053] In addition, the blade 421 may be disposed toward the bottom of the reaction solution injection part 300. Therefore, the reaction solution injected from the reaction solution injection part 300 may collide with the impact part 400 to be dispersed by the rotation flow caused by the blade 421.

[0054] In addition, here, when the thickness of the mixing member is t, the thickness of the blade 421 may be 0.6t to 1.0t.

[0055] In addition, here, the mixing member may be formed such that when the height of the reactor is h, the distance from the lower bottom surface of the reactor 100 to the lower bottom surface of the mixing member 400 is in the range of 0.008h to 0.02h.

[0056] Figure 4 : is a table showing the effect of dispersing the flow direction of toluene introduced from the bottom of the reactor and increasing its linear velocity by installing the mixing member 400 of the present invention, and the effect of improving the degree of catalyst mixing accordingly.

[0057] like Figure 4 , results of the amount of unreacted catalyst according to the arrangement length from the bottom of the reactor to the top of the mixing member 400 and the height of the mixing member 400 are shown for the comparative example and the experimental example.

[0058] (Comparative Example)

[0059] The reaction solution is injected through the nozzle of the reaction solution injection part 300 .

[0060] (Example 1)

[0061] The reaction solution is injected through the mixing member 400 having no blades 421 at the upper portion thereof installed on the reaction solution injection part 300 .

[0062] In addition, the arrangement distance from the bottom of the reactor to the top of the mixing member 400 was 35 mm, and the height of the mixing member 400 was 5 mm.

[0063] (Example 2)

[0064] The reaction solution is injected by mounting the mixing member 400 having blades 421 formed on the outer circumferential surface of the hub 410 on the reaction solution injection part 300 .

[0065] In addition, the arrangement distance from the bottom of the reactor to the top of the mixing member 400 was 35 mm, and the height of the mixing member 400 was 5 mm.

[0066] like Figure 4As shown, it can be seen that Comparative Example 1 has 100% unreacted catalyst, indicating that no reaction occurred at all, Example 1 has 89.2%, and Example 2 has 87.4%, indicating that the amount of unreacted catalyst in Example 2 is significantly reduced compared to Comparative Example 1 and Example 1.

[0067] Figure 5 3 is a table showing simulation of the unreacted portion at the bottom of the reactor of the present invention, showing simulation of the unreacted portion at the bottom of the reactor by computational fluid dynamics (CFD).

[0068] exist Figure 5 In the simulation of the unreacted portion at the bottom of the reactor, a mixing member 400 having a plurality of blades 421 may be included, and the arrangement distance from the bottom of the reactor to the top of the mixing member 400 is 35 mm, and the height of the mixing member 400 is 5 mm.

[0069] Generally, reaction experiments of aromatic compounds are carried out in two phases of toluene and chlorine, but in the present invention, flow analysis is performed by changing to a single-phase simulation for detailed simulation of the lower part of the reactor.

[0070] The flow model used in the analysis uses a mixing member 400 including nine blades 421, and the portion where the actual chlorination reaction occurs is expected to be the portion 30 cm to 70 cm above the reactant distributor 200, so in the simulation of the present invention, the portion up to 30 cm from the tangent line of the reactor is set as the analysis portion.

[0071] In the analysis model of the lower part of the reactor, a form was simulated in which toluene and the catalyst ferric chloride (FeCl3) were introduced from the nozzle of the reaction solution injection part 300 and mixed and settled at the bottom of the lower part of the reactor. In reality, ferric chloride (FeCl3) is dissolved in toluene and does not precipitate in a solid state, but in order to identify the unreacted portion in the flow analysis, the flow analysis was performed by simulating based on the assumption that ferric chloride (FeCl3) is precipitated in a solid state.

[0072] like Figure 5 As shown in the comparative example, it can be seen that the channeling phenomenon is confirmed in the conventional reactor.

[0073] In order to improve this channeling phenomenon, the structure of the mixing member 400 is designed so that the flow in the lower part of the reactor can be dispersed, and in order to perform additional detailed simulations, a mixing member 400 that does not include blades 421 and a mixing member 400 that includes a plurality of blades 421 are designed, and embodiments are implemented.

[0074] like Figure 5 As shown in Examples 1 and 2, it can be seen that, when compared with the existing reactor, the channeling phenomenon is completely solved regardless of the shape of the mixing member 400. According to the results of the velocity vector analysis, it can be determined that this phenomenon is due to the influence of the dispersion effect of the flow in the lower part of the reactor.

[0075] also, Figure 6 (a) is a graph showing the uniformity of the catalyst (FeCl3) of the present invention, and Figure 6 (b) is a graph showing the standard deviation of the catalyst (FeCl3) of the present invention. Figure 6 (a) and Figure 6 As shown in (b), when the distribution uniformity of ferric chloride (FeCl3) was compared by specifying five planes in the height direction of the reactor, it was confirmed that the uniformity of catalyst dispersion was also improved by 20% or more.

[0076] Furthermore, according to the shape of the mixing member 400, in the case where the mixing member 400 does not include the blades 421, the pressure difference of the fluid increases by 32% compared to the existing reactor, and in the case of the mixing member 400 including a plurality of or more blades 421, the pressure difference of the fluid increases by 8%. Considering these results, the mixing member 400 including a plurality of or more blades 421 was confirmed as an improvement plan, and additional simulations were performed.

[0077] Figure 7 is a table showing a simulation of the catalyst deposition phenomenon of the present invention, and shows a simulation of the catalyst deposition phenomenon at the bottom of the reactor by computational fluid dynamics (CFD).

[0078] In order to check the dispersion of the catalyst and the possibility of local stagnation where the catalyst does not participate in the actual reaction in the reactor, the catalyst is set as particles with a certain diameter and simulated using two-phase analysis. Here, the catalyst dissolves in the actual reaction and is in a single phase, but it is configured as two phases for simulation and analysis.

[0079] Since the amount of catalyst actually injected into the reactor was 300 ppm, the volume fraction of the initial condition was assumed to be 0.0001, and the diameter of ferric chloride (FeCl 3 ) was set to about 50 μm.

[0080] Furthermore, the flow conditions of the inlet reactants were changed to examine the deposition pattern according to the change of the flow conditions.

[0081] Reference Figure 7In a comparative example, a mixing member 400 that does not include blades 421 is simulated so that the introduced ferric chloride (FeCl3) catalyst flows upward in a strong flow formed along the toluene flow toward the center of the reactor, and then transfers from the upper part of the reactor to the wall side flow, and most of it is deposited at the bottom of the reactor and the upper part of the reactant distributor.

[0082] Reference Figure 7 In Examples 1 to 3, the improvement of the configuration of the mixing member 400 including a plurality of blades 421 is simulated, so that due to the dispersion effect of the flow at the bottom of the reactor, the ferric chloride (FeCl3) catalyst forms a uniform flow with toluene inside the reactor without being deposited, and therefore it can be seen that the amount of unreacted catalyst is improved.

[0083] Therefore, by installing the mixing member inside the aromatic compound reactor, the reactants are uniformly distributed in the aromatic compound reactor of the present invention, which has the effect of increasing the catalyst circulation flow rate at the bottom of the reactor.

[0084] Furthermore, by installing the mixing member inside the aromatic compound reactor, the reactants are uniformly dispersed in the aromatic compound reactor of the present invention, and there is an effect of reducing the amount of catalyst deposited in the reactants.

[0085] Industrial Applicability

[0086] The aromatic compound reactor of the present invention provides a technology that can improve the mixing efficiency of the reactants, improve the selectivity of the reactants, and reduce the amount of catalyst deposition added to the reactants by installing a mixing member inside the aromatic compound reactor that allows the reactants to be evenly dispersed, thereby improving the productivity and yield of the reactants.

Claims

1. An aromatic compound reactor comprising: a reactor having a reaction space formed therein; a plurality of reactant distributors arranged to be spaced apart from each other at a lower portion of the reactor and formed into a flow path to supply reactants to the reaction space through both ends of the flow path; at least one reaction solution injection portion, the at least one reaction solution injection portion being formed as a through hole between the plurality of reactant distributors and supplying a reaction solution to the reaction space; as well as A mixing member is provided in the reaction solution injection portion and disperses the reaction solution in the reaction space by using a rotational flow induced therein. 2 . The aromatic compound reactor according to claim 1 , wherein the reaction solution supplied to the reaction solution injection portion and the reactant of the reactant distributor are dispersed by the mixing member. 3 . The aromatic compound reactor according to claim 2 , wherein the reactant supplied to the reactant distributor is a gas or a liquid.

4. The aromatic compound reactor according to claim 1, wherein the mixing member is formed so that when the height of the reactor is h, the distance from the lower bottom surface of the reactor to the lower bottom surface of the mixing member is in the range of 0.008h to 0.02h.

5. The aromatic compound reactor according to claim 1, wherein the reactant distributor is formed so that when the height of the reactor is h, the distance from the upper portion of the mixing member to the center of the reactant distributor is in the range of 0.1h to 0.4h.

6. The aromatic compound reactor according to claim 1, wherein The mixing member comprises: a hub coupled to a rotating shaft of the mixing member; a sector, the sector comprising a plurality of blades formed on an outer circumferential surface of the hub; a circumference surrounding the outer circumference of the sector; as well as An impact portion is formed at the center of the circumferential portion and the injected reaction solution collides with the impact portion. 7 . The aromatic compound reactor according to claim 6 , wherein the blades are configured so that the reaction solution injected from the reaction solution injection portion and colliding with the impact portion can be dispersed in the reaction space by a rotational flow caused by the blades.

8. The aromatic compound reactor according to claim 7, wherein when the thickness of the mixing member is t, the thickness of the blade is 0.6t to 1.0t. 9 . The aromatic compound reactor according to claim 2 , wherein the reaction solution injection part is connected to an external reaction solution supply part in the form of a nozzle.

10. The aromatic compound reactor of claim 2, wherein the plurality of reactant distributors are connected to the external reaction solution supply.

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