Helium purification treatment system and method thereof

Abstract

According to the helium purification treatment system and method, corresponding feature information is generated by detecting chemical components of to-be-purified gas in a first gas storage device, and one preset control strategy having a mapping relation with the feature information is determined from at least two preset control strategies to serve as a feature control strategy; the characteristic control strategy is a process control instruction set corresponding to the gas treatment demand condition of the to-be-purified gas, and the purification process of helium is controlled based on the characteristic control strategy, so that a proper process can be configured according to different to-be-purified gases input each time. The helium purification treatment system and the helium purification treatment method are high in helium purification efficiency.

Description

Technical Field

[0001] The present application relates to the technical field of gas purification, and in particular to a helium purification processing system and method thereof. Background Art

[0002] In the prior art, helium purification technology generally requires multiple processes such as raw gas input, heating and catalytic treatment, low-temperature distillation and pressure swing adsorption treatment in sequence before helium can be purified from the raw gas; and the helium purification system is equipped with a reaction device corresponding to each of the above-mentioned multiple processes, and the reaction devices corresponding to the multiple processes are connected through a one-way pipeline, so that the raw gas enters each reaction device one by one along the one-way pipeline for corresponding process treatment.

[0003] However, at present, in practical applications, the one-way pipeline structure design of the helium purification system cannot adaptively select different process combinations for raw gases with different gas components, which limits the efficiency of helium purification. Summary of the invention

[0004] Based on the above technical problems, it is necessary to provide a helium purification processing system and method. The present application can automatically configure a suitable process according to the composition of the gas to be purified, thereby improving the efficiency of helium purification.

[0005] In a first aspect, the present application provides a helium purification processing system, the system comprising: A first gas storage device, configured to store gas to be purified; A gas processing device, configured to be in communication with the first gas storage device; a component detection device, connected to the first gas storage device, and configured to detect the chemical composition of the gas to be purified in the first gas storage device to generate corresponding characteristic information; wherein the characteristic information includes at least one of gas type information and gas content information of the gas to be purified; The control device is connected to the component detection device and is configured to determine a characteristic control strategy that has a mapping relationship with the characteristic information from at least two preset control strategies, and based on the characteristic control strategy, input the gas to be purified from the first gas storage device into the gas processing device for gas processing; wherein each preset control strategy is pre-configured as a process control instruction set corresponding to the gas processing requirements of the gas to be purified.

[0006] In some embodiments, the gas processing device includes at least two gas processing branches, each of which is configured to perform at least one of adsorption treatment, oxidation-reduction treatment, and purification treatment on the gas to be purified; Each preset control strategy is configured to input the gas to be purified into one of the gas processing branches; The control device is configured to connect the first gas storage device with the gas processing branch corresponding to the characteristic control strategy based on the characteristic control strategy, and input the gas to be purified into the currently connected gas processing branch for gas processing.

[0007] In some embodiments, the gas to be purified includes one of a gas to be adsorbed, a gas to be oxidized and reduced, a gas to be purified, and helium; The gas processing device also includes: A chemical adsorption device, configured to be in communication with the first gas storage device, and capable of performing adsorption treatment on the gas to be adsorbed; a redox device, configured to be in communication with the first gas storage device and / or the chemical adsorption device, and capable of performing redox treatment on the redox gas to be redoxed; and A gas purification device, configured to be in communication with the first gas storage device and / or the redox device, and capable of purifying the gas to be purified; Each gas processing branch is configured to be composed of at least one or more of a chemical adsorption device, a redox device and a gas purification device.

[0008] In some embodiments, the gas purification device includes a gas membrane separator, and the gas membrane separator includes: A first separation chamber comprises a first cavity, a first air inlet structure and a first air outlet structure respectively connected to the first cavity, and a first separation membrane disposed on the first air outlet structure; and The second separation chamber comprises a second cavity, a second air inlet structure and a second air outlet structure respectively communicated with the second cavity, and a second separation membrane arranged on the second air inlet structure; in: The first gas inlet structure is configured to be connected to at least one of the first gas storage device, the chemical adsorption device and the redox device to input the gas to be purified into the first cavity; the first separation membrane is configured to separate and purify the gas to be purified in the first cavity to obtain a primary purified gas; the first gas outlet structure is configured to transport the primary purified gas out of the first cavity; The second separation membrane is configured to separate and purify the primary purified gas from the first gas outlet structure to obtain a secondary purified gas; the second gas inlet structure is configured to input the secondary purified gas into the second cavity; the second gas outlet structure is configured to transport the secondary purified gas out of the second cavity; Separation and purification treatment refers to the process of separating the gas to be purified and helium by gas membrane; And the following conditional formula is satisfied: J1>J2, J1 is the permeation rate of the first separation membrane to the gas to be purified, J2 is the permeation rate of the second separation membrane to the gas to be purified, and J2≤20GPU.

[0009] In some embodiments, the second separation membrane is a membrane structure made of a metal organic framework material modified by a characteristic modified material, wherein the characteristic modified material includes at least one of fullerene, carbon nanotube and graphene, and the metal framework organic material contains a bulk cubic phase and forms a plurality of microporous structures.

[0010] In some embodiments, the second separation membrane satisfies at least one of the following conditions: H>0.2; 250mm≤T≤300mm; 2.6A<d<3.6A; Wherein, h is the proportion of the bulk cubic phase in all crystalline phases in the second separation membrane; T is the thickness of the second separation membrane; and d is the pore size of each microporous structure.

[0011] In some embodiments, the first separation chamber further includes a third gas outlet structure, which is configured to be in communication with the first gas outlet structure and can transport the gas that fails to pass through the first separation membrane to the redox device; The second separation chamber further includes a fourth gas outlet structure, which is configured to be in communication with the second gas inlet structure and can transport the gas that fails to permeate the second separation membrane to an external inert gas tank.

[0012] In some embodiments, the gas purification device further comprises: The dehydrogenation treatment structure is configured to be connected to the first gas outlet structure and / or the second gas inlet structure, and can perform catalytic dehydrogenation treatment on the primary purified gas from the first gas outlet structure, and can transport the primary purified gas after dehydrogenation treatment to the second gas inlet structure.

[0013] In some embodiments, the dehydrogenation treatment structure includes: A dehydrogenation chamber having an air inlet and an air outlet, wherein the air inlet of the dehydrogenation chamber is configured to be communicated with the first air outlet structure, and the air outlet of the dehydrogenation chamber is configured to be communicated with the second air inlet structure; The dehydrogenation catalytic reaction pipeline is circuitously arranged in the dehydrogenation chamber to connect the air inlet and the air outlet of the dehydrogenation chamber, and is filled with a dehydrogenation catalyst. The pipeline is configured to perform dehydrogenation catalytic treatment on the primary purified gas using a dehydrogenation catalyst.

[0014] In a second aspect, the present application further provides a helium purification method, which is implemented using the above-mentioned helium purification processing system, and the method includes: Inputting the gas to be purified into the first gas storage device; Using a component detection device to detect the chemical composition of the gas to be purified in the first gas storage device to generate corresponding characteristic information; Determine, by means of a control device, a characteristic control strategy having a mapping relationship with the characteristic information from at least two preset control strategies; The control device is used to input the gas to be purified from the first gas storage device into the gas processing device for gas processing based on a characteristic control strategy.

[0015] In the above-mentioned helium purification processing system and method, the corresponding characteristic information is generated by detecting the chemical composition of the gas to be purified in the first gas storage device, and one of the preset control strategies that has a mapping relationship with the characteristic information is determined as the characteristic control strategy from at least two preset control strategies. Since the characteristic control strategy is a process control instruction set corresponding to the gas processing requirements of the gas to be purified, the helium purification process is controlled based on the characteristic control strategy. It is possible to configure a suitable process for each different gas to be purified input, which is beneficial to avoid process redundancy and affect the helium purification efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the conventional technology, the drawings required for use in the embodiments or the conventional technology descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0017] Figure 1 A schematic diagram of the structure of a helium purification system according to an embodiment; Figure 2 A schematic diagram of the relative connection relationship of a gas processing device according to an embodiment; Figure 3 A schematic diagram of the structure of a gas membrane separator according to an embodiment; Figure 4 A schematic structural diagram of a dehydrogenation treatment structure according to an embodiment; Figure 5 The figure is a schematic flow chart of a helium purification method according to an embodiment. DETAILED DESCRIPTION

[0018] In order to facilitate understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Embodiments of the present application are provided in the drawings. However, the present application can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive.

[0019] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application.

[0020] It is understood that the terms "first" and "second" used in this application are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0021] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0022] When used herein, the singular forms "a", "an" and " / the" may also include the plural forms, unless the context clearly indicates otherwise. It should also be understood that the terms "include / comprise" or "have" and the like specify the presence of stated features, wholes, steps, operations, components, parts or combinations thereof, but do not exclude the possibility of the presence or addition of one or more other features, wholes, steps, operations, components, parts or combinations thereof. At the same time, the term "and / or" used in this specification includes any and all combinations of the relevant listed items.

[0023] In order to enable those skilled in the art to more clearly understand and implement the embodiments of this specification, the technical solutions in the embodiments of this specification will be clearly and completely described below in conjunction with the drawings in the embodiments of this specification.

[0024] like Figure 1-5 As shown, the present application provides a helium purification system 100, which at least includes a first gas storage device 10, a gas processing device 20, a component detection device 30 and a control device 40. Among them: The first gas storage device 10 is configured to store the gas to be purified, and the gas processing device 20 is configured to be in communication with the first gas storage device 10. Specifically, in some embodiments, the first gas storage device 10 is a gas storage tank having a plurality of gas outlets, and the gas processing device 20 includes at least two gas processing branches, each of which is connected to a gas outlet of one of the first gas storage devices 10 through a delivery pipeline.

[0025] In actual applications, valves are also provided in the delivery pipelines between each gas processing branch and the corresponding gas outlet of the first gas storage device 10, and each valve is used to control the connection or closing of each gas processing branch and the corresponding gas outlet of the first gas storage device 10.

[0026] It should be noted that the gas to be purified includes one of the gas to be adsorbed, the gas to be oxidized and reduced, the gas to be purified and helium. Among them, the gas to be adsorbed refers to a corrosive or toxic gas that can be adsorbed, including but not limited to at least one of chlorine, chloride, fluoride, bromide, and sulfide; the gas to be oxidized and reduced refers to a gas that can be oxidized and reduced, including but not limited to at least one of oxygen, carbon monoxide, carbon dioxide, hydrogen, methane, and hydrocarbons; the gas to be purified refers to a gas that has not been adsorbed or removed by oxidation and reduction, including but not limited to at least one of nitrogen, argon, and neon, and may also include hydrogen that has not been removed by oxidation and reduction; helium is an inert gas that does not react in chemical adsorption treatment, oxidation and reduction treatment and other processes.

[0027] Each gas processing branch is configured to perform at least one of the following processes: adsorption treatment, oxidation-reduction treatment, and purification treatment on the gas to be purified. Specifically, adsorption treatment refers to the use of a chemical adsorbent to perform adsorption treatment on the gas to be adsorbed, so that the gas to be adsorbed is removed from the gas to be purified; oxidation-reduction treatment refers to the use of the gas to be oxidized and reduced to undergo an oxidation-reduction reaction with oxygen, so that the gas to be oxidized and reduced is removed from the gas to be purified, and the oxidation-reduction reaction includes but is not limited to at least one of catalysis using a thermal catalyst; purification treatment refers to the purification and removal treatment of the gas to be purified, and the purification and removal treatment includes but is not limited to one of the processes such as distillation purification treatment for nitrogen, argon or neon, and dehydrogenation catalytic treatment for residual hydrogen. For example, in some embodiments, the gas processing device 20 includes but is not limited to a first branch L1, a second branch L2, and a third branch L3. The first branch L1 can realize three processes such as adsorption treatment, oxidation-reduction treatment, and purification treatment for the gas to be purified. The second branch L2 can realize two processes such as oxidation-reduction treatment and purification treatment for the gas to be purified. The third branch L3 can realize the purification treatment process for the gas to be purified.

[0028] The gas to be purified includes one of the gas to be adsorbed, the gas to be oxidized and reduced, the gas to be purified and helium. Among them, the gas to be adsorbed refers to a corrosive or toxic gas that can be adsorbed, including but not limited to at least one of chlorine, chloride, fluoride, bromide, and sulfide; the gas to be oxidized and reduced refers to a gas that can be oxidized and reduced, including but not limited to at least one of oxygen, carbon monoxide, carbon dioxide, hydrogen, methane, and hydrocarbons; the gas to be purified refers to a gas that has not been adsorbed or removed by oxidation and reduction, including but not limited to at least one of nitrogen, argon, and neon, and may also include hydrogen that has not been removed by oxidation and reduction; helium is an inert gas that does not react in chemical adsorption treatment, oxidation and reduction treatment and other processes.

[0029] The component detection device 30 refers to a device that can detect the chemical composition of the gas, including but not limited to one of a chromatograph and a spectrometer. Specifically, the component detection device 30 is connected to the first gas storage device 10, and the component detection device 30 is configured to detect the chemical composition of the gas to be purified in the first gas storage device 10 to generate corresponding characteristic information.

[0030] Among them, the characteristic information includes at least one of the gas type information and gas content information of the gas to be purified. For example, in some embodiments, if the gas to be purified includes gases to be adsorbed (such as chlorine), gases to be oxidized and reduced (such as carbon monoxide, carbon dioxide, hydrogen), gases to be purified (such as hydrogen, nitrogen), and helium, then after the component detection device 30 detects the gas to be purified, the first characteristic information generated is used to characterize the gas to be purified, which contains four types of gas type information such as gas to be adsorbed, gas to be oxidized and reduced, gas to be purified, and helium, and / or gas content information corresponding to various types of gases. Of course, here, the gas type of the gas to be purified mentioned above is only an example, and is not limited to other embodiments. The gas to be purified may contain other types of gases or different gas contents.

[0031] A plurality of different preset control strategies are pre-configured in the control device 40 to establish a control strategy library, and each preset control strategy is pre-configured as a process control instruction set corresponding to the gas processing requirements of the gas to be purified. For example, in some embodiments, if the gas processing device 20 includes but is not limited to the first branch L1, the second branch L2 and the third branch L3 mentioned above, it is necessary to set three preset control strategies corresponding to the three branches respectively, wherein the first preset control strategy is configured to correspond to the first branch L1, that is, the first preset control strategy at least includes an opening instruction that can control the valve between the first branch L1 and the first gas storage device 10, and a control instruction to input the gas to be purified into the first branch L1 for three processes such as adsorption treatment, oxidation-reduction treatment and purification treatment in sequence, and the first preset control strategy is configured to correspond to the first gas type information used to characterize the four types of first gas types, namely, gas to be adsorbed, gas to be oxidized and reduced, gas to be purified and helium, contained in the gas to be purified, so as to establish a mapping relationship between the two. Similarly, the second preset control strategy is configured to correspond to the second branch L2, and is configured to correspond to the second gas type information used to characterize the three types of gas to be purified, namely, gas to be oxidized and reduced, gas to be purified, and helium, so as to establish a mapping relationship; the third preset control strategy is configured to correspond to the third branch L3, and is configured to correspond to the third gas type information used to characterize the two types of gas to be purified, namely, gas to be purified and helium, so as to establish a mapping relationship.

[0032] Of course, in other embodiments, new processing processes may be introduced into the helium purification system or part of the processing processes may be simplified according to actual usage requirements, and the specific number of gas processing branches and preset control strategies and specific parameter configurations may be added or deleted accordingly, which will not be elaborated here.

[0033] The control device 40 is connected to the component detection device 30, and the control device 40 can receive the characteristic information generated by the component detection device 30. After the preset control strategy configuration is completed, the control device 40 can determine the characteristic control strategy that has a mapping relationship with the characteristic information from at least two preset control strategies, and based on the characteristic control strategy, input the gas to be purified from the first gas storage device 10 into the gas processing device 20 for gas processing, and the high-purity helium obtained after processing is transported to the external helium gas storage tank 50. For example, in some embodiments, the control device 40 receives the above-mentioned first characteristic information, then selects the first preset control strategy as the characteristic control strategy, and based on the characteristic control strategy, controls the valve V1 between the first gas storage device 10 and the first branch L1 to open so that the two are connected, and controls the gas to be purified to be input into the first branch L1 to sequentially perform three processes such as adsorption treatment, oxidation-reduction treatment and purification treatment to perform gas treatment.

[0034] It is worth mentioning that, in some embodiments, the characteristic information generated by the component detection device 30 also includes gas content information corresponding to various types of gases. After the control device 40 determines the characteristic control strategy through the characteristic information, the control device 40 can also control at least one of the gas pressure, gas flow rate, and reaction temperature of the gas to be purified in the corresponding gas processing branch according to the gas content information, so as to adjust the environmental conditions of each process to the optimal reaction conditions.

[0035] In the above-mentioned helium purification processing system, the corresponding characteristic information is generated by detecting the chemical composition of the gas to be purified in the first gas storage device 10, and one of the preset control strategies that has a mapping relationship with the characteristic information is determined as the characteristic control strategy from at least two preset control strategies. Since the characteristic control strategy is a process control instruction set corresponding to the gas processing requirements of the gas to be purified, the helium purification process is controlled based on the characteristic control strategy. It is possible to configure a suitable process for each different gas to be purified input, which is beneficial to avoid process redundancy and affect the helium purification efficiency.

[0036] More specifically, in some embodiments, the gas processing device 20 also includes a chemical adsorption device 210, a redox device 220 and a gas purification device 230, and each gas processing branch is configured to be composed of at least one or more of the chemical adsorption device 210, the redox device 220 and the gas purification device 230.

[0037] Specifically, the chemical adsorption device 210 is connected to one of the gas outlets of the first gas storage device 10 through a delivery pipeline with a valve, and the control device 40 can control the valve to open so that the chemical adsorption device 210 is connected to the first gas storage device 10; a chemical adsorbent is added to the chemical adsorption device 210, and the gas to be adsorbed can be adsorbed under the action of the chemical adsorbent.

[0038] The redox device 220 is connected to one of the gas outlets of the first gas storage device 10 through one of the delivery pipelines with a valve, and the redox device 220 is also connected to the chemical adsorption device 210 through another delivery pipeline with a valve. The control device 40 can control the valve between the redox device 220 and the first gas storage device 10 and / or the chemical adsorption device 210 to open so that the redox device 220 is connected to the first gas storage device 10 and / or the chemical adsorption device 210.

[0039] In addition, the redox device 220 is a thermal catalytic reactor provided with a thermal catalyst, and the thermal catalyst can be used to promote the redox reaction of the gas to be oxidized and reduced to achieve redox treatment; more specifically, the redox device 220 is provided with a gas distribution chamber and a thermal reaction chamber. Since the redox reaction requires a certain amount of oxygen and reaction temperature, the gas to be purified needs to be first input into the gas distribution chamber, and the control device 40 injects an appropriate amount of oxygen corresponding to the gas content information of the gas to be oxidized and reduced in the gas to be purified into the gas distribution chamber according to the gas content information of the gas to be oxidized and reduced in the gas to be purified. After the gas distribution is completed, the gas to be purified is heated to the reaction temperature and transported to the thermal reaction chamber. Under the action of the thermal catalyst, the gas to be oxidized and reduced undergoes a redox reaction with oxygen.

[0040] The gas purification device 230 is connected to one of the gas outlets of the first gas storage device 10 through one of the delivery pipelines with a valve, and the redox device 220 is also connected to the redox device 220 through another delivery pipeline with a valve. The control device 40 can control the valve between the redox device 220 and the first gas storage device 10 and / or the redox device 220 to open, so that the gas purification device 230 is connected to the first gas storage device 10 and / or the redox device 220. The gas purification device 230 can purify the gas to be purified in the gas to be purified, and can obtain helium with higher purity to achieve the purpose of helium purification, and the purification process includes at least one process of gas membrane separation treatment, dehydrogenation catalytic treatment, and cryogenic distillation treatment.

[0041] More specifically, in some embodiments, the gas purification device 230 includes a gas membrane separator 231, and the gas membrane separator 231 includes a first separation chamber 231a and a second separation chamber 231b, wherein: The first separation chamber 231a includes a first cavity 2311a, a first air inlet structure 2312a and a first air outlet structure 2313a respectively communicated with the first cavity 2311a, and a first separation membrane 2314a disposed on the first air outlet structure 2313a. The second separation chamber 231b includes a second cavity 2311b, a second air inlet structure 2312b and a second air outlet structure 2313b respectively communicated with the second cavity 2311b, and a second separation membrane 2314b disposed on the second air inlet structure 2312b.

[0042] Among them, the first air inlet structure 2312a is configured to be connected to at least one of the first gas storage device 10, the chemical adsorption device 210 and the redox device 220 to input the gas to be purified into the first cavity 2311a; the first separation membrane 2314a is configured to separate and purify the gas to be purified in the first cavity 2311a to obtain a primary purified gas; the first gas outlet structure 2313a is configured to transport the primary purified gas to the outside of the first cavity 2311a; the second separation membrane 2314b is configured to separate and purify the primary purified gas from the first gas outlet structure 2313a to obtain a secondary purified gas; the second air inlet structure 2312b is configured to input the secondary purified gas into the second cavity 2311b; the second gas outlet structure 2313b is configured to transport the secondary purified gas to the outside of the second cavity 2311b; the separation and purification treatment refers to the process of gas membrane separation of the gas to be purified and helium.

[0043] It should be noted that both the first and second separation membranes are gas selective membranes, which have a microporous structure, and the pores of the micropores can only pass through gas molecules that meet the pore size requirements, thereby achieving their selective passing function. And the first and second separation membranes meet the following conditional formula: J1>J2, and J2≤20GPU; J1 is the permeation rate of the first separation membrane 2314a to the gas to be purified, J2 is the permeation rate of the second separation membrane 2314b to the gas to be purified, and GPU is a common unit of permeation rate, which is used to describe the permeation rate of various gases passing through a unit area in a unit time. It is worth mentioning that the range of J1 is not limited. For example, in some embodiments, it is configured as: 20GPU<J1≤50GPU.

[0044] Through the setting of the above conditional formula, it can be understood that the barrier capacity of the second separation membrane 2314b is stronger than the barrier capacity of the first separation membrane 2314a for the gas to be purified. Most of the gas to be purified is separated from the gas to be purified after the first separation and purification by the first separation membrane 2314a, but a small part of the gas to be purified passes through the first separation membrane 2314a and enters the primary purified gas. Since the second separation membrane 2314b has a stronger barrier capacity for the gas to be purified, the remaining gas to be purified is basically separated from the primary purified gas after the secondary separation and purification by the second separation membrane 2314b because it cannot pass through the second separation membrane 2314b.

[0045] In addition, in some embodiments, the second separation membrane 2314b may also be required to satisfy the conditional formula: J3 ≥ 150GPU; J3 is the permeation rate of the second separation membrane 2314b to helium. By setting this conditional formula, the permeation capacity of the second separation membrane 2314b to helium can be effectively guaranteed, so that helium can pass through the second separation membrane 2314b faster and easier to form secondary purified gas, which is beneficial to improving the purification efficiency of helium.

[0046] In the above scheme, the gas membrane separation structure has a secondary gas membrane separation and purification process through the coordinated arrangement of the first and second separation membranes. The gas to be purified first passes through the first separation membrane 2314a to achieve a primary separation and purification treatment to separate most of the gas to be purified within the first cavity 2311a, while helium and a small part of the gas to be purified pass through the first separation membrane 2314a to form a primary purified gas. Then, the primary purified gas passes through the second separation membrane 2314b to achieve a secondary separation and purification treatment to separate the remaining part of the gas to be purified outside the second cavity 2311b, while helium passes through the second separation membrane 2314b to form a secondary purified gas (i.e., high-purity helium). The secondary gas membrane separation and purification process not only effectively ensures the purity of the helium, but also helps to improve the purification efficiency of the helium.

[0047] In some embodiments, the first separation membrane 2314a is a membrane structure made of at least one material selected from organic polymers or inorganic compounds, and has a plurality of microporous structures; and the second separation membrane 2314b is a membrane structure made of a metal organic framework material modified by a characteristic modified material, wherein the characteristic modified material includes at least one of fullerenes, carbon nanotubes and graphene, and the metal framework organic material contains a bulk cubic phase and has a plurality of microporous structures.

[0048] It should be noted that, by introducing the characteristic modified material, the pore size of the bulk cubic phase in the metal organic framework is effectively reduced, thereby making the pores of the microporous structure smaller, which can effectively ensure the barrier ability of the second separation membrane 2314b to the gas to be purified while taking into account the strong helium permeability. For example, in some embodiments, fullerene (e.g., C 60 , C 70 Of course, in other embodiments, carbon nanotubes and graphene can also be introduced for modification. In this way, a second separation membrane 2314b with both high barrier capacity for the gas to be purified and high permeability for helium can be obtained.

[0049] It is worth mentioning that in addition to the above-mentioned material setting issues, the parameters of the second separation membrane 2314b such as the crystal phase ratio, thickness setting, and pore size of the microporous structure will directly affect the performance of the second separation membrane 2314b. Preferably, in some embodiments, the second separation membrane 2314b satisfies at least one of the following conditions: H≥0.2; 250mm≤T≤300mm; 2.6A<d<3.6A.

[0050] Among them, h is the proportion of the bulk cubic phase in all crystalline phases in the second separation membrane 2314b; T is the thickness of the second separation membrane 2314b; d is the pore size of each microporous structure; A is Angstrom, which is a unit of length used to measure very small distances, especially when describing the microstructure of a substance.

[0051] For example, in some embodiments, H can be 20%, T can be 280mm, and d can be 2.8A. This structural setting can make J2<20GPU, J3>200GPU. This parameter configuration can effectively ensure the performance of the second separation membrane 2314b; of course, in other embodiments, the above-mentioned H, T, and d can also be specifically set according to actual design requirements.

[0052] More preferably, in some embodiments, the first separation chamber 231a also includes a third gas outlet structure, which is configured to be connected to the first gas outlet structure 2313a, and can transport the gas that fails to pass through the first separation membrane 2314a to the redox device 220, so as to recycle the tail gas generated in the process flow, thereby better improving the utilization rate of the gas; the second separation chamber 231b also includes a fourth gas outlet structure, which is configured to be connected to the second gas inlet structure 2312b, and can transport the gas that fails to pass through the second separation membrane 2314b (for example, at least one of neon, argon, and nitrogen) to the external inert gas tank 60.

[0053] It is worth mentioning that in the above-mentioned gas membrane separation technology, the humidity, temperature, air pressure, etc. of the gas will affect the molecular movement of the gas to be purified. In order to further improve the permeation rate of helium in the first separation membrane 2314a, in some embodiments, the gas to be purified can be dried, temperature controlled, compressed, etc. before entering the first cavity 2311a.

[0054] It should be noted that since most of the raw gas will carry hydrogen, and the product of the oxidation-reduction reaction of hydrogen in the redox device 220 is water, in order to further improve the purification treatment effect of the gas purification device 230, the system also includes a dryer and a temperature controller arranged between the redox device 220 and the gas purification device 230. The dryer is used to remove moisture from the gas to be purified after passing through the redox device 220, and then input the dried gas to be purified into the temperature controller. The temperature controller adjusts the gas to be purified to the reaction temperature and then outputs it to the first air intake structure 2312a of the first cavity 2311a.

[0055] It is worth mentioning that the above-mentioned gas membrane separation and purification process needs to be carried out under certain air pressure conditions. In some embodiments, the system also includes a first compression pump arranged at the first air intake structure 2312a of the first cavity 2311a, and a second compression pump arranged at the second air intake structure 2312b of the second cavity 2311b. The first compression pump is used to input the gas to be purified into the first air intake structure 2312a of the first cavity 2311a at a certain pressure, and the second compression pump is used to input the once purified gas into the second air intake structure 2312b of the second cavity 2311b at a certain pressure.

[0056] It is worth mentioning that during the primary separation and purification process, part of the hydrogen still passes through the first separation membrane 2314a and mixes into the primary purified gas. In order to remove this part of the hydrogen, in some embodiments, the gas purification device 230 also includes a dehydrogenation treatment structure 232 and a cooler (not shown). The dehydrogenation treatment structure 232 is configured to be connected to the first gas outlet structure 2313a and / or the second gas inlet structure 2312b, and the cooler is arranged between the first gas outlet structure 2313a and the dehydrogenation treatment structure 232.

[0057] Specifically, the cooler is configured to cool the primary purified gas from the first gas outlet structure 2313a to a preset temperature threshold (for example, 0-25°C), and then input the cooled primary purified gas into the dehydrogenation treatment structure 232, and the dehydrogenation treatment structure 232 is provided with a dehydrogenation catalyst (for example, including but not limited to a palladium catalyst). Under low temperature conditions, hydrogen molecules can be adsorbed by the catalyst and dissociated into hydrogen atoms, and the hydrogen atoms can further diffuse to the surface or interior of the palladium, thereby realizing the dehydrogenation catalytic treatment of the primary purified gas, and the primary purified gas after the dehydrogenation treatment can be transported to the second gas inlet structure 2312b.

[0058] It is worth mentioning that, more preferably, in some embodiments, the dehydrogenation processing structure 232 may be configured to include a dehydrogenation chamber 2321 and a dehydrogenation catalytic reaction pipeline 2322. Among them: The dehydrogenation chamber 2321 has an air inlet 2321a and an air outlet 2322a. The air inlet 2321a of the dehydrogenation chamber 2321 is configured to be in communication with the first air outlet structure 2313a, and the air outlet 2322a of the dehydrogenation chamber 2321 is configured to be in communication with the second air inlet structure 2312b. The dehydrogenation catalytic reaction pipeline 2322 is arranged in a circuitous manner in the dehydrogenation chamber 2321 to connect the air inlet 2321a and the air outlet 2322a of the dehydrogenation chamber 2321, and is filled with a dehydrogenation catalyst, and is configured to perform dehydrogenation catalytic treatment on the primary purified gas using a dehydrogenation catalyst.

[0059] By means of the circuitous arrangement of the hydrogen catalytic reaction pipeline, the contact time between hydrogen and the dehydrogenation catalyst can be effectively increased, so that the dissociation reaction of hydrogen is more sufficient, thereby achieving a better dehydrogenation effect.

[0060] It is worth mentioning that, in some embodiments, the system also includes a filter, which is used to filter out macromolecular gas aerosols (such as, but not limited to dust particles, oil droplets, etc.) in the raw gas, and the filtered gas is input into the first gas storage device 10 as the gas to be purified.

[0061] Preferably, in some embodiments, in order to better ensure the independence of each round of gas to be purified by the system, the system also includes a vacuum pump connected to the first gas storage device 10, and the vacuum pump is configured to extract the gas to be purified remaining in the first gas storage device 10 during the current round of purification after the helium purification process for the current gas to be purified is completely completed, so that the gas in the first gas storage device 10 is evacuated, thereby ensuring that in the next round of helium purification for the new gas to be purified, the residual gas from the previous round is avoided from mixing into the new gas to be purified that is re-input into the first gas storage device 10 in this round, thereby ensuring the accuracy of the chemical composition detection of the new gas to be purified by the component detection device 30, so that the control device 40 can determine the characteristic control strategy based on accurate characteristic information, effectively avoiding the situation where the control device 40 misjudges the control strategy due to the mixing of residual gas.

[0062] like Figure 5 As shown, the present application also provides a helium purification method, which is implemented by using the above-mentioned helium purification processing system 100, and the method includes: Step 102, inputting the gas to be purified into the first gas storage device 10; Step 104, using the component detection device 30 to detect the chemical composition of the gas to be purified in the first gas storage device 10 to generate corresponding characteristic information; Step 106, using the control device 40 to determine a characteristic control strategy having a mapping relationship with the characteristic information from at least two preset control strategies; Step 108 : Using the control device 40 based on the characteristic control strategy, the gas to be purified in the first gas storage device 10 is input into the gas processing device 20 for gas processing.

[0063] In the above method, by utilizing the helium purification processing system, a suitable process can be configured according to the different gases to be purified input each time, which is beneficial to avoid process redundancy and affect the helium purification efficiency.

[0064] Of course, it should be noted that after the above-mentioned method adopts the above-mentioned system, the above-mentioned method can set more corresponding steps according to the operation of each device of the system and the process flow sequence. Since the above-mentioned system has elaborated on the functions of each device, similarly, the above-mentioned method can also set more steps and more combinations of different steps according to the functions of each device. Therefore, they will not be elaborated one by one here.

[0065] In the description of this specification, the description with reference to the terms "some embodiments", "other embodiments", "ideal embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example.

[0066] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0067] The above embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A helium purification system, characterized in that the system include: A first gas storage device, configured to store gas to be purified; a gas processing device, configured to be in communication with the first gas storage device; a component detection device, connected to the first gas storage device, and configured to detect the chemical composition of the gas to be purified in the first gas storage device to generate corresponding characteristic information; wherein the characteristic information includes at least one of gas type information and gas content information of the gas to be purified; A control device is connected to the component detection device and is configured to determine a characteristic control strategy that has a mapping relationship with the characteristic information from at least two preset control strategies, and based on the characteristic control strategy, input the gas to be purified from the first gas storage device into the gas processing device for gas processing; wherein each of the preset control strategies is pre-configured as a process control instruction set corresponding to the gas processing requirements of the gas to be purified.

2. The helium purification system according to claim 1, characterized in that: The gas processing device comprises at least two gas processing branches, each of which is configured to perform at least one process of adsorption treatment, oxidation-reduction treatment and purification treatment on the gas to be purified; Each of the preset control strategies is configured to input the gas to be purified into one of the gas processing branches; The control device is configured to connect the first gas storage device with the gas processing branch corresponding to the characteristic control strategy based on the characteristic control strategy, and input the gas to be purified into the currently connected gas processing branch for gas processing.

3. The helium purification system according to claim 2, characterized in that: The gas to be purified includes one of a gas to be adsorbed, a gas to be oxidized and reduced, a gas to be purified, and helium; The gas processing device also includes: A chemical adsorption device, configured to be in communication with the first gas storage device, and capable of performing adsorption treatment on the gas to be adsorbed; a redox device, configured to be in communication with the first gas storage device and / or the chemical adsorption device, and capable of performing redox treatment on the gas to be oxidized and reduced; and A gas purification device, configured to be in communication with the first gas storage device and / or the redox device, and capable of purifying the gas to be purified; Each of the gas processing branches is configured to be composed of at least one or more of the chemical adsorption device, the redox device and the gas purification device.

4. The helium purification system according to claim 3, characterized in that: The gas purification device comprises a gas membrane separator, and the gas membrane separator comprises: A first separation chamber comprises a first cavity, a first air inlet structure and a first air outlet structure respectively connected to the first cavity, and a first separation membrane disposed on the first air outlet structure; and A second separation chamber, comprising a second cavity, a second air inlet structure and a second air outlet structure respectively communicated with the second cavity, and a second separation membrane disposed on the second air inlet structure; in: The first gas inlet structure is configured to be connected to at least one of the first gas storage device and the redox device to input the gas to be purified into the first cavity; the first separation membrane is configured to separate and purify the gas to be purified in the first cavity to obtain a primary purified gas; the first gas outlet structure is configured to transport the primary purified gas out of the first cavity; The second separation membrane is configured to separate and purify the primary purified gas from the first gas outlet structure to obtain a secondary purified gas; the second gas inlet structure is configured to input the secondary purified gas into the second cavity; the second gas outlet structure is configured to transport the secondary purified gas out of the second cavity; The separation and purification process refers to a process of performing gas membrane separation on the gas to be purified and the helium; And the following conditional formula is satisfied: J1>J2, J1 is the permeation rate of the first separation membrane to the gas to be purified, J2 is the permeation rate of the second separation membrane to the gas to be purified, and J2≤20GPU.

5. The helium purification system according to claim 4, characterized in that: The second separation membrane is a membrane structure made of a metal organic framework material modified by a characteristic modification material, wherein the characteristic modification material includes at least one of fullerene, carbon nanotube and graphene, and the metal framework organic material contains a bulk cubic phase and forms a plurality of microporous structures.

6. The helium purification system according to claim 5, characterized in that: The second separation membrane satisfies at least one of the following conditions: H＞0.2； 250mm≤T≤300mm; 2.6A<d<3.6A; Wherein, h is the proportion of the bulk cubic phase in all crystalline phases in the second separation membrane; T is the thickness of the second separation membrane; and d is the pore size of each microporous structure.

7. The helium purification system according to claim 4, characterized in that: The first separation chamber further includes a third gas outlet structure, which is configured to be in communication with the first gas outlet structure and to transport the gas that fails to pass through the first separation membrane to the redox device; The second separation chamber further includes a fourth gas outlet structure, which is configured to be in communication with the second gas inlet structure and can transport the gas that fails to permeate through the second separation membrane to an external inert gas tank.

8. The helium purification system according to claim 4, characterized in that: The gas purification device also includes: The dehydrogenation treatment structure is configured to be connected to the first gas outlet structure and / or the second gas inlet structure, and can perform catalytic dehydrogenation treatment on the primary purified gas from the first gas outlet structure, and can transport the primary purified gas after dehydrogenation treatment to the second gas inlet structure.

9. The helium purification system according to claim 8, characterized in that: The dehydrogenation treatment structure comprises: a dehydrogenation chamber, comprising an air inlet and an air outlet, wherein the air inlet of the dehydrogenation chamber is configured to be communicated with the first air outlet structure, and the air outlet of the dehydrogenation chamber is configured to be communicated with the second air inlet structure; The dehydrogenation catalytic reaction pipeline is circuitously arranged in the dehydrogenation chamber to connect the air inlet and the air outlet of the dehydrogenation chamber, and is filled with a dehydrogenation catalyst. The pipeline is configured to perform dehydrogenation catalytic treatment on the primary purified gas by using a dehydrogenation catalyst.

10. A helium purification method, characterized in that: The helium purification processing system according to any one of claims 1 to 8 is used to implement a method, the method comprising: Inputting the gas to be purified into the first gas storage device; Using a component detection device to detect the chemical composition of the gas to be purified in the first gas storage device to generate corresponding characteristic information; Determine, by means of the control device, the characteristic control strategy having a mapping relationship with the characteristic information from at least two of the preset control strategies; The control device is used to input the gas to be purified from the first gas storage device into the gas processing device for gas processing based on the characteristic control strategy.

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