Clean isolation method between dust removal equipment and granular silicon product
By coating high-purity polyurethane on the inner surface of the dust removal equipment to isolate the contact between the particulate silicon and the metal surface, the pollution problem between the dust removal equipment and the particulate silicon is solved, and the high quality and cleanliness of the particulate silicon are achieved.
Patent Information
- Application Number
- CN202411820932.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-11
- Publication Date
- 2025-03-28
AI Technical Summary
During the dust removal and polishing of the granular silicon surface, it is difficult for the prior art to effectively isolate the pollution between the dust removal equipment and the granular silicon, resulting in the risk of granular silicon quality degradation and impurity contamination.
By applying high-purity polyurethane coating on the inner surface of the dust removal equipment, the direct contact between the particulate silicon and the metal surface is isolated, and the cleanliness and wear resistance of the isolation layer is ensured through steps such as finishing and baking.
It effectively avoids direct contact between the granular silicon and the metal surface, prevents quality degradation, and avoids the pollution caused by the introduction of other impurities, improving the cleanliness and quality stability of the granular silicon.