X-ray interferometer for picometer-scale displacement table and displacement measurement method

By designing an X-ray interferometer for a picometer-level displacement stage, using an X-ray source to divide the light into two vertical beams, the problem that existing X-ray interferometers can only measure one-dimensional motion, and the picometer-level accuracy measurement of two-dimensional motion is achieved, with a simple structure and a small radiation risk.

CN119714144AActive Publication Date: 2025-03-28NATIONAL INSTITUTE OF METROLOGY CHINA
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Patent Information

Application Number
CN202510213079.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-02-26
Publication Date
2025-03-28
Estimated Expiration
2045-02-26

AI Technical Summary

Technical Problem

Existing X-ray interferometers can only measure one-dimensional motion, lack the ability to measure two-dimensional degree of freedom displacement, and the structure of using two X-ray sources is complex and the radiation risk is high.

Method used

An X-ray interferometer for a picometer-level displacement stage is designed. Through the first beam of light emitted by the X-ray source is divided into two beams in a perpendicular direction, and an interferometer in two directions is formed with other crystals. The displacement measurement of the X and Y dimensions can be achieved using only one X-ray source.

Benefits of technology

It realizes that picometer-level accuracy can be measured for two-dimensional motion with only one X-ray source. The structure is simple, the radiation risk is small, and the picometer-level displacement can be directly obtained to achieve picometer-level accuracy measurement.

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Abstract

The invention discloses an X-ray interferometer for a picometer-scale displacement table and a displacement measurement method, and relates to the field of interferometers. A first optical splitter in the interferometer is arranged on an emergent light path of an X-ray source; the first reflector and the second optical splitter are respectively arranged on a transmission light path of the first optical splitter; the analyzer is arranged on a reflection light path of the first reflector and a first transmission light path of the second optical splitter; the third optical splitter is arranged on a second transmission light path of the second optical splitter; the second reflector is arranged on a reflection light path of the third optical splitter; the third reflector is arranged on a transmission light path of the third optical splitter; the third optical splitter is arranged on reflection light paths of the second reflector and the third reflector; the detection module is arranged on emergent light paths of the analyzer and the third optical splitter and used for detecting the intensity of interference fringes, the processor calculates displacement in the X direction and the Y direction according to the intensity, two-dimensional motion can be measured at the same time through only one light source, the structure is simple, and the radiation risk is small.
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