Adaptive target control for curvilinear optical proximity correction (OPC)

By applying optical proximity correction technology in circuit design and adjusting the amplitude of the photomask, the problem of inaccurate image reproduction caused by optical proximity effect during lithography is solved, and higher image resolution and manufacturing quality are achieved.

CN119717406APending Publication Date: 2025-03-28SIMENS INDASTRI SOFTVEAR INK
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Patent Information

Application Number
CN202411353321.X
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2023-09-27
Filing Date
2024-09-26
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

As the size of circuit components decreases, the optical proximity effect during lithography leads to inaccurate image reproduction and defects, and the prior art is difficult to effectively solve this problem.

Method used

Optical proximity correction (OPC) technology is used to modify layout design data, adjust the amplitude of the photomask, compensate for the light diffraction effect, and improve the fidelity of the graphics. The specific method includes curve OPC, determining whether the image is on the target by measuring the position, and generating a curved target to correct edge placement errors.

Benefits of technology

The image resolution and accuracy during lithography are significantly improved, the optical proximity effect is reduced, and the quality of the manufacturing device is improved.

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Abstract

Aspects of the disclosed technology relate to techniques for implementing optical proximity correction. Anchors in the layout design may be designated as more important or less important. An optical proximity correction iteration is performed on each of the plurality of regions to generate a modified layout design by differently processing more important and less important anchors (e.g., by differently weighting or by dynamically changing the targets of the less important anchors). In this manner, edge placement errors may be reduced or eliminated for more important anchors.
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