Alignment image generation method and chip alignment method
By adding environmental graphics to the alignment image, an alignment image that is more in line with the actual situation of the chip is generated, the identification error and measurement instability caused by the difference between the alignment image and the actual situation in the prior art are solved, and the success rate of chip alignment is improved.
Patent Information
- Application Number
- CN202510215224.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-26
- Publication Date
- 2025-03-28
- Estimated Expiration
- 2045-02-26
AI Technical Summary
In the prior art, the alignment images used by the measurement software to compare only include graphics of the alignment marks, which are different from the actual situation, resulting in errors and limitations in the identification of the alignment marks of the measurement targets, and the measurement is unstable.
By drawing an alignment mark pattern in the drawing software and obtaining a reference image that reflects the actual situation of the target chip, adding an environment pattern around the alignment mark pattern to generate an alignment image, which is used to align the target chip.
By adding environmental graphics, the alignment images are more in line with the actual situation of the chip, and the accuracy of alignment image recognition is improved, thereby improving the success rate of chip alignment.