A mercury cadmium telluride avalanche photomultiplier and its preparation method
By using etching and injection processes in the avalanche photomultiplier of mercury tellurium avalanche photomultiplier, the electrode holes and doping are achieved, and the bowl-shaped structure is designed to alleviate edge-angle breakdown, which solves the problems of edge-angle breakdown and complex process in the prior art devices under high bias voltage, and achieves lower dark current and high breakdown voltage.
Patent Information
- Application Number
- CN202411892871.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-20
- Publication Date
- 2025-04-04
AI Technical Summary
The existing mercury cadmium tellurium avalanche photomultipliers work under high bias voltage, which are prone to edge and corner breakdown, and the preparation process is complex, with high requirements for process alignment accuracy and etch uniformity, which limits the design and performance of the device.
The electrode holes and doping are achieved through the etching and injection process, and the electrical connection between the cells and the readout circuit is achieved through the electrodes and interconnected indium columns. A bowl-shaped structure is designed to alleviate edge and corner breakdown and simplify the process flow.
Low dark current is achieved, breakdown voltage is increased, process flow is simplified, the impact of etching uniformity on performance is reduced, and edge breakdown problem is alleviated.