A copolyimide film with low dielectric constant and low thermal expansion coefficient and a method for preparing the same
By introducing ortho-hydroxyl groups into the main chain and converting them into oxazole rings, combined with cage-type polysilsesquioxane end-capping agents, a copolymerized polyimide film with low dielectric constant and low thermal expansion coefficient was prepared, which solved the problem of difficulty in simultaneously achieving low dielectric constant and low thermal expansion coefficient in the existing technology, improved the structure and thermal stability of the film, and reduced the dielectric constant.
Patent Information
- Application Number
- CN202510160246.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-13
- Publication Date
- 2025-10-10
- Estimated Expiration
- 2045-02-13
AI Technical Summary
It is difficult for existing polyimide films to achieve both low dielectric constant and low thermal expansion coefficient simultaneously, and existing methods can lead to a decrease in mechanical properties or an increase in thermal expansion coefficient.
By introducing ortho-hydroxyl groups into the main chain and converting them into oxazole rings through thermal rearrangement reaction, combined with the use of cage-shaped polysilsesquioxane as a capping agent, a copolymerized polyimide film with low dielectric constant and low thermal expansion coefficient was prepared.
A copolymerized polyimide film with a dielectric constant of 2.7-3.0 and a thermal expansion coefficient of 19.5-26.5 ppm/K was achieved, which enhanced the structural stability and thermal stability while reducing the dielectric constant.