IGBT (Insulated Gate Bipolar Translator) device with high short-circuit capability and manufacturing method thereof

Through multiple ion implantation and reducing annealing temperature, an IGBT device with a uniform channel structure is formed, which solves the contradiction between short circuit capability and conduction loss, improves device performance and reduces costs.

CN120568779APending Publication Date: 2025-08-29成都晶湛电子科技有限公司
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Patent Information

Application Number
CN202510691318.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-27
Publication Date
2025-08-29

AI Technical Summary

Technical Problem

Existing trench type IGBT devices have contradictions between short circuit capability and conduction loss, and existing improved methods increase device complexity and cost.

Method used

Multiple ion implantation is used to form a P-type well region, and the annealing temperature is reduced to form a uniform channel structure, avoiding the short channel effect and improving the short circuit capability.

Benefits of technology

It improves the short circuit capability and latch resistance of IGBT devices, while reducing the saturation current and conduction loss of the device, and reducing manufacturing costs.

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Abstract

An IGBT device with high short-circuit capacity comprises a groove on an N-type substrate, a P-type well region is arranged below the outside of the groove, a conducting channel of the IGBT device is located in the P-type well region and close to the side wall of the groove, when voltage is applied to a grid electrode of the device to enable the device to be started, the width of each channel in the vertical direction is kept consistent, and the width of each channel in the vertical direction is kept consistent. The error value of the channel width does not exceed the set maximum error value. The invention further discloses a manufacturing method of the IGBT device with the high short circuit capacity. According to the IGBT device with the high short-circuit capability and the preparation method thereof, the P-type well region adopts multiple times of ion implantation, the annealing temperature of the P-type well region is greatly reduced, the short-channel effect of the device is inhibited, the saturation current of the device is reduced, the short-circuit capability is improved, and meanwhile, the average concentration of the P-type well region is higher than that of a traditional structure, so that the resistance of a body region is reduced; and the latch-up resistance of the device is improved.
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