Method for cleaning silicon-polluted reverse osmosis membrane
By configuring a combined cleaning method of anionic surfactants and acidic cleaning agents, the problem of incomplete cleaning of silicon scale on the reverse osmosis membrane is solved, silicon scale and other pollutants are efficiently removed, the desalination rate and water flux of the membrane are restored, and the service life of the membrane is extended.
Patent Information
- Application Number
- CN202510904093.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-01
- Publication Date
- 2025-10-10
AI Technical Summary
In the prior art, the cleaning of silicon scale on the reverse osmosis membrane is not thorough, the cleaning agent is unsafe, and the membrane pores expand after cleaning, resulting in a decrease in the desalination rate and unqualified water quality.
Cleaning agents A, B, and C, composed of anionic surfactants, triethanolamine hydrochloride, ammonium bifluoride, citric acid, and sulfosalicylic acid, are used with different pH values to clean the reverse osmosis membrane in sequence, changing the structure of silica scale, removing organic matter and metal oxides, and finally shrinking the membrane pores.
The reverse osmosis membrane is efficiently cleaned, the desalination rate is restored to over 97%, the life of the membrane element is extended, the maintenance cost is reduced, and there is no damage to the membrane material.