RAFT (reversible addition fragmentation chain transfer) reagent as well as preparation method and application thereof
By designing novel RAFT reagents and their synthesis methods, the problem of insufficient photoresponsiveness in photocontrolled reversible addition-fragmentation chain transfer polymerization technology has been solved, enabling rapid photocuring and efficient large-scale production, which is suitable for photocuring 3D printing.
Patent Information
- Application Number
- CN202511553034.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-29
- Publication Date
- 2025-11-28
- Estimated Expiration
- 2045-10-29
AI Technical Summary
Existing photo-reversible addition-fragmentation chain transfer polymerization (Photo-RAFT) technology is insufficient in terms of photoresponsiveness, resulting in a prolonged polymerization induction period and a slow overall curing rate, which limits its application in high-speed photocuring scenarios.
A novel RAFT reagent is provided, wherein the Z group is an indazole derivative and the R group is a C3-C6 alkyl ester group. It is prepared by a one-pot synthesis process under low temperature conditions and has excellent rapid photoresponse characteristics and high triplet quantum yield, enabling rapid photocuring.
It achieves rapid photopolymerization, increased polymerization rate, and narrow molecular weight distribution, making it suitable for the field of photopolymerization 3D printing. It also achieves high-purity, high-efficiency, large-scale production by simplifying the synthesis process.