Gallium oxide NMOS (N-channel metal oxide semiconductor) field effect transistor-based logic unit and implementation method thereof
By designing logic units based on gallium oxide NMOS field-effect transistors, the problem of P-type doping materials in gallium oxide CMOS logic circuits is solved, realizing a monolithically integrated, low-cost, high-performance gallium oxide logic circuit that supports complete logic functions and fast response, making it suitable for high-efficiency electronic systems.
Patent Information
- Application Number
- CN202511908433.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-17
- Publication Date
- 2026-03-17
AI Technical Summary
In existing gallium oxide CMOS logic circuits, P-type doped materials are difficult to realize or have poor performance, resulting in poor performance of gallium oxide PMOS transistors, which limits their application in CMOS complementary digital logic circuits. Furthermore, existing monolithic integration solutions suffer from high process complexity and lattice matching issues.
The logic cell design based on gallium oxide NMOS field-effect transistors is adopted. By combining pull-up structures and pull-down networks, and utilizing differential on-resistance ratio design and channel doping engineering, a complete logic functional unit is constructed, achieving monolithic integration without heterogeneous integration.
It realizes a low-cost, low-process-complexity gallium oxide monolithic logic circuit, which has strong anti-interference ability, supports complete logic functions, short transmission delay, fast response speed, and is compatible with existing EDA tools. It is suitable for high-efficiency, highly integrated electronic systems.