Optical rhombus polishing device and polishing method
CN122913992APending Publication Date: 2026-10-16PUJIANG YONGQIANG CRYSTAL GLASS PROD CO LTD
0 Cites 0 Cited by
Patent Information
- Application Number
- CN202611391993.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-09-09
- Publication Date
- 2026-10-16
AI Technical Summary
Technical Problem
[0005]本发明的主要目的是提出一种光学菱镜打磨装置及打磨方法,旨在解决现有堆叠式姿态调整机构易发生偏载,多件菱镜同步打磨时压力分布不均,批量加工面形精度一致性差的技术问题
Benefits of technology
[0016]本发明技术方案的光学菱镜打磨装置及打磨方法,通过将横梁基体两端分别支撑于两组独立运行的横向移动组件上,配合集成升降与旋转功能的调节组件,有效解决了现有设备中运动轴逐层堆叠导致承载能力弱、偏载工况下精度下降的问题,升降机构采用立柱套筒与立柱滑筒同轴穿设配合,增大了导向长度和接触面积,显著提升了抗偏载能力和升降运动重复定位的可靠性,横向移动组件采用双导轨与双滑轨配合的导向结构,结合伺服电机驱动的移动轮滚动抵接方式,确保横梁基体横向进给平稳,两组调节组件通过伺服闭环控制实现横梁两端同步升降与同步旋转,确保工件以精确角度贴合打磨盘,压力分布均匀,多个独立弹性浮动的夹持头可同步夹持多件菱镜并适应尺寸差异,避免刚性压伤,配合横向移动组件实现多工位快速切换,本发明显著提升了设备整体刚度与自动化打磨效率。
✦ Generated by Eureka AI based on patent content.
Abstract
The application discloses an optical diamond polishing device and a polishing method, which comprise a machine body assembly, a grinding disc assembly, a transverse moving assembly, an adjusting assembly and a workpiece clamping mechanism; the machine body assembly comprises a rack and a support leg; a plurality of grinding disc assemblies are assembled on the rack and are used for polishing the surface of the optical diamond; the transverse moving assembly is provided with two groups and is independently arranged on the rack; each transverse moving assembly comprises a sliding seat and a linear driving mechanism; the both ends of the beam base body are supported on the two groups of independently running transverse moving assemblies, and the adjusting assembly with integrated lifting and rotating functions is matched, so that the problem that the bearing capacity is weak and the precision is reduced under the eccentric load working condition caused by the layer-by-layer stacking of the motion shaft in the existing equipment is effectively solved; the lifting mechanism is coaxially arranged in the stand sleeve and the stand sliding cylinder, the guiding length and the contact area are increased, and the eccentric load resistance of the polishing device is obviously improved.
Need to check novelty before this filing date? Find Prior Art