Doping device for tungsten electrode production
By designing a doping device for tungsten electrode production, the problems of low efficiency and unevenness of existing doping methods are solved, and more efficient doping and more uniform product performance are achieved.
CN222677948UActive Publication Date: 2025-03-28BEIJING NORTH TUNGSTEN TECH CO LTD
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Patent Information
- Application Number
- CN202420564020.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-22
- Publication Date
- 2025-03-28
- Estimated Expiration
- 2034-03-22
AI Technical Summary
Technical Problem
The doping method in the existing tungsten electrode production is inefficient and uneven doping, which affects product performance.
Method used
A doping device including doping tank, through-tube, grid rod, hopper and baffle is designed. By adding raw materials in batches and sequences, the combination of hopper and baffle is achieved more efficient doping.
Benefits of technology
The doping efficiency and effect are improved, and the performance uniformity and stability of the tungsten electrode are ensured.
✦ Generated by Eureka AI based on patent content.
Abstract
The utility model is applicable to the technical field of tungsten electrode production, and provides a doping device for tungsten electrode production, which comprises a doping tank, a top cover of the doping tank is provided with a through pipe in a penetrating manner, a grid rod is arranged in the through pipe, the top of the grid rod is connected with a vertical rod, the vertical rod extends to the outside of the through pipe, and the top cover of the doping tank is provided with a through hole. A carrying plate is arranged above the doping tank, a plurality of hoppers are symmetrically arranged on the carrying plate in a penetrating mode, discharging ports in the bottoms of the hoppers can be inserted into the through pipes, baffles are arranged at the positions, located above the discharging ports, in the hoppers, and one ends of the baffles are hinged to the inner walls of the hoppers; a first sleeve is arranged on the top face of the doping tank top cover, a second sleeve is arranged on the bottom face of the carrier plate, the first sleeve is sleeved with the second sleeve, and a spring is arranged between the first sleeve and the second sleeve. According to the scheme, the raw materials can be added in batches, and the raw materials can be sequentially added at intervals in sequence, so that the doping efficiency and effect are improved.
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