Vacuum film tearing platform suitable for Lift-off process
By designing a vacuum film tearing platform, using negative pressure adsorption and individually controlled adsorption holes, the problem of insufficient applicability of the vacuum film tearing platform in the prior art is solved, and efficient and low-cost single-layer chip porcelain dielectric capacitor preparation is achieved.
Patent Information
- Application Number
- CN202422890774.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-26
- Publication Date
- 2025-09-05
- Estimated Expiration
- 2034-11-26
AI Technical Summary
There is a lack of vacuum tearing platform devices suitable for different sizes of metallized substrates and different manufacturing processes in the prior art, resulting in inconvenient operation of preparing single-layer chip ceramic dielectric capacitors.
A vacuum tearing membrane platform is designed, using a vacuum adsorption plate and a vacuum controller to adsorb the metalized ceramic substrate through negative pressure. The adsorption holes can be controlled separately, and are equipped with a display screen and manual/automatic switching buttons to achieve fast and flexible film tearing.
The vacuum film tearing process with simple structure and convenient operation is realized, which reduces production costs and improves the efficiency and accuracy of preparing single-layer chip porcelain dielectric capacitors.