Reaction cavity inner wall cleaning device

By setting a transition flange and annular groove in the reaction chamber of the plasma water-washing exhaust gas treatment equipment and using a water pump to flush the inner wall of the reaction chamber, the problem of dust accumulation is solved, and the long-term stable operation of the equipment and water resource conservation are achieved.

CN223352480UActive Publication Date: 2025-09-19苏州仓立新能源科技有限公司
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Patent Information

Application Number
CN202422612399.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-10-29
Publication Date
2025-09-19
Estimated Expiration
2034-10-29

AI Technical Summary

Technical Problem

When existing plasma water-washing tail gas treatment equipment processes PECVD special gases, dust easily adheres to the inner wall of the reaction chamber, causing the volume to decrease and affecting the operating stability of the equipment.

Method used

A device for cleaning the inner wall of a reaction chamber is designed. A transition flange, an annular groove and a water inlet hole are arranged on the reaction cylinder. A water pump is used to guide water into the annular groove and the water flows into the water tank along the inner wall to flush the inner wall of the reaction cylinder and prevent dust accumulation.

Benefits of technology

Effectively prevent dust accumulation on the inner wall of the reaction chamber, ensure long-term stable operation of the equipment, reduce water waste, and improve the negative pressure stability of the equipment.

✦ Generated by Eureka AI based on patent content.
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Abstract

The utility model discloses a reaction cavity inner wall cleaning device which comprises a transition flange fixedly connected with a reaction cylinder, the top of the reaction cylinder is fixedly connected with an upper flange, a cover plate is arranged above the transition flange, the transition flange is located between the cover plate and the upper flange, and the upper flange, the transition flange and the cover plate are fixedly connected through a plurality of bolts. A mounting seat is fixedly mounted at the top of the cover plate, a plurality of air inlet pipes are fixedly mounted on the peripheral wall of the mounting seat, and a plasma generator fixedly penetrates through the top of the mounting seat; by arranging the transition flange, the annular groove and the like, in the process of treating PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas or other tail gas which easily generates a large amount of dust, water can be guided into each water inlet hole through the water pump, so that the water can enter the annular groove and downwards flow into the water tank along the inner wall of the reaction barrel to wash the inner wall of the reaction barrel; therefore, dust cannot be accumulated on the inner wall of the reaction sleeve, and long-term stable operation of the plasma washing type tail gas treatment equipment is ensured.
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