Substrate transport system
By designing a support plate with a high open area and a cleaning module in the substrate transport system, the substrate contamination problem was solved, and stable transport and efficient process were achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SAMSUNG DISPLAY CO LTD
- Filing Date
- 2025-05-30
- Publication Date
- 2026-06-12
AI Technical Summary
How to effectively reduce substrate contamination during substrate transport to improve process efficiency and substrate quality?
A substrate conveying system is designed, including a pair of facing tracks, a shuttle, and a support plate arranged between the tracks. The support plate has openings with an open area of 50% to 90% and is equipped with a cleaning module containing brushes and nozzles for cleaning the tracks and shuttle. The system also includes a cleaning chamber for periodically cleaning the shuttle.
By reducing particulate contamination and maintaining stable substrate transport, process efficiency is improved and substrate quality is ensured.
Smart Images

Figure CN224349686U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to a substrate conveying system. Background Technology
[0002] Recently, electronic devices have been widely used. Electronic devices are used in various ways, such as mobile electronic devices and fixed electronic devices, and such electronic devices include display devices that can provide users with visual information such as images or videos to support multiple functions.
[0003] Display devices, which visually display data, are formed by depositing multiple layers such as organic and metallic layers. To improve efficiency and quality in the manufacturing process of display devices, it is crucial to stably deliver highly sensitive substrates or deposition masks.
[0004] An OHS (Overhead Handling System) is an automated transport system that can be applied to substrate transport processes to improve efficiency. In such a system, it is crucial to minimize the risk of contamination during substrate transport and to ensure stable and highly reliable delivery.
[0005] The aforementioned background technology refers to the technical information held by the inventor in order to derive this utility model or obtained during the deriving process of this utility model, and it is not necessarily publicly known technology disclosed to the general public before the application of this utility model. Utility Model Content
[0006] The purpose of this invention is to provide a substrate transport system that minimizes substrate contamination during transport.
[0007] One aspect of this utility model provides a substrate conveying system, the substrate conveying system comprising a pair of tracks extending along a predetermined path and facing each other, a shuttle for loading substrates thereon and moving along the tracks, and a support plate arranged between the pair of tracks and having a plurality of openings.
[0008] Furthermore, in the support plate, the opening can extend along the width direction of the track.
[0009] Furthermore, in the support plate, the ratio of the open area of the opening per unit area can be from 50% to 90%.
[0010] In addition, the substrate conveying system may also include a cleaning module mounted on the shuttle and moving along the track with the shuttle.
[0011] In addition, the cleaning module may be provided with a brush section arranged along the track and a nozzle section adjacent to the brush section.
[0012] In addition, the cleaning module may be equipped with a first brush that moves along the bottom surface of the track and a second brush that moves along the side wall of the track.
[0013] In addition, the cleaning module may be equipped with a first dust collection nozzle that moves along the bottom surface of the track and a second dust collection nozzle that moves along the side wall of the track.
[0014] In addition, the cleaning module may also include a base, a dust collection unit mounted on the base and connected to the nozzle, and a connector arranged in front of the base and connected to the shuttle.
[0015] In addition, the substrate conveying system may also include a cleaning room arranged on the path of the track and used to clean the incoming shuttle.
[0016] Furthermore, the track can be installed on the ceiling of the work space, and the opening of the support plate communicates with the work space.
[0017] According to embodiments of this invention, a substrate transport system can be provided that maintains stable transport and substrate quality. Furthermore, the substrate transport system improves process efficiency by minimizing substrate contamination during transport. Attached Figure Description
[0018] Figure 1 This is a schematic diagram illustrating a substrate transport system according to an embodiment of the present invention.
[0019] Figure 2 It is shown illustratively. Figure 1 The diagram shows the substrate transport system.
[0020] Figure 3 It is shown Figure 2 A cross-sectional view of the substrate transport system shown.
[0021] Figure 4 It is shown Figure 2 The diagram shows a portion of the substrate transport system.
[0022] Figure 5 It is shown Figure 2 A perspective view of the track unit.
[0023] Figure 6 It is shown Figure 5 An exploded perspective view of a modified example of the orbital unit.
[0024] Figure 7 It is shown Figure 2 A top view of the cleaning module.
[0025] Figure 8 It is shown Figure 2 A diagram showing a variation of the cleaning module.
[0026] Figure 9 It is shown Figure 3 A diagram of another variation of the cleaning module.
[0027] Figure 10 It is shown Figure 1 A cross-sectional view of the cleaning room.
[0028] Figure 11 Shown from another side Figure 10 A cross-sectional view of the cleaning room.
[0029] Explanation of reference numerals in the attached figures
[0030] 1: Substrate conveying system; 100: Track unit; 200: Shuttle car; 300: Cleaning module Detailed Implementation
[0031] This utility model can be implemented in various ways and can have various embodiments. Specific embodiments are illustrated in the accompanying drawings and described in detail in the specific implementation. (See attached drawings for details.) Figure 1 By referring to the detailed embodiments described below, the effects, features, and methods of implementing this utility model will become clear. However, this utility model is not limited to the embodiments disclosed below, but can be implemented in various forms.
[0032] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. When describing with reference to the accompanying drawings, the same or corresponding constituent elements will be given the same reference numerals, and repeated descriptions of them will be omitted.
[0033] In the following embodiments, the terms "first," "second," etc., are not intended to be limiting, but are used to distinguish one constituent element from other constituent elements.
[0034] In the following embodiments, unless the context clearly indicates a different meaning, the singular expression includes the plural expression.
[0035] In the following embodiments, terms such as include or have indicate the presence of the features or constituent elements described in the specification, and are not intended to preclude the additional possibility of more than one other feature or constituent element.
[0036] In the following embodiments, when a portion of a membrane, region, constituent element, etc. is described as being above or on top of other portions, this includes not only the case where it is located directly above other portions, but also the case where other membranes, regions, constituent elements, etc. are sandwiched between them.
[0037] In the accompanying drawings, for ease of explanation, the sizes of the constituent elements may be exaggerated or reduced. For example, for ease of explanation, the sizes and thicknesses of the various components shown in the drawings are arbitrarily depicted, therefore the present invention is not necessarily limited to what is shown in the drawings.
[0038] In the following embodiments, when described as membranes, regions, constituent elements, etc., being interconnected, this includes not only cases where membranes, regions, and constituent elements are directly interconnected, but also cases where they are indirectly interconnected by interleaving other membranes, regions, and constituent elements between them. For example, when described in this specification as membranes, regions, constituent elements, etc., being electrically interconnected, this includes not only cases where membranes, regions, and constituent elements are directly electrically interconnected, but also cases where they are indirectly electrically interconnected by interleaving other membranes, regions, and constituent elements between them. Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
[0039] Figure 1 This is a schematic diagram illustrating a substrate transport system 1 according to an embodiment of the present invention, and Figure 2 It is shown illustratively. Figure 1 The diagram shows the substrate transport system 1.
[0040] Reference Figure 1 and Figure 2 According to an embodiment of the present invention, the substrate conveying system 1 can move the conveyed object located in the loading area A1 to the unloading area A2, and can clean the internal space while conveying the conveyed object.
[0041] The objects being transported can be defined in various ways depending on the objects loaded on the shuttle 200. For example, the shuttle 200 can move the substrate SUB between processes in the manufacturing process of a display device.
[0042] As one embodiment, the substrate SUB can be an insulating substrate, a semiconductor substrate, a display device substrate, etc., but is not limited to these. For example, the substrate SUB can be a substrate for a display device. An organic material can be deposited on the substrate SUB to form an organic light-emitting element. Hereinafter, the case where the substrate SUB is a substrate for an organic light-emitting display device will be described as an example.
[0043] The structures included in the substrate SUB can vary depending on which step of the deposition process is used in the manufacturing process of the organic light-emitting display device. For example, if the deposition process is a hole injection layer formation process, the substrate can be a substrate with a pixel defining film and an anode formed. And if the deposition process is an organic light-emitting layer formation process, the substrate can be a substrate with not only a pixel defining film and an anode formed, but also a hole injection layer and / or a hole transport layer formed.
[0044] As another example, the substrate SUB can be a mask having a deposition pattern used in the process of depositing a deposited material onto a substrate for a display device.
[0045] Hereinafter, "particles" can be defined as foreign matter generated in the substrate transport system 1. Particles are various foreign matter that affect the quality of the substrate, for example, they may be generated during the driving of the shuttle 200 or flow in from the outside.
[0046] As one embodiment, the substrate transport system 1 may be provided with a track unit 100, a shuttle 200, and a cleaning module 300. Furthermore, as an optional embodiment, the substrate transport system 1 may be provided with a cleaning booth CB.
[0047] The substrate conveying system 1 can load the substrate SUB onto the shuttle 200 and move the substrate SUB from the loading area A1 to the unloading area A2, which is the destination location, while moving the shuttle 200 along the track unit 100.
[0048] The track unit 100 can extend along a preset path to define the path for the shuttle 200 to move. The track unit 100 can extend between the loading area A1 and the unloading area A2.
[0049] The track unit 100 can be arranged inside the track space 50. By arranging the track unit 100 and the shuttle 200 inside the track space 50, the position of the track unit 100 and the movement path and working space of the shuttle 200 can be separated in space.
[0050] The shuttle 200 can move along the track unit 100 and can load substrate SUBs. The substrate SUBs can be directly loaded into the loading space of the shuttle 200. Alternatively, the substrate SUBs can be housed in an additional cassette, which can be loaded into the shuttle 200.
[0051] When the shuttle 200 is positioned in the loading area A1, a loading robot (not shown) can load the substrate SUB into the loading space of the shuttle 200. Subsequently, when the shuttle 200 moves to the unloading area A2, an unloading robot (not shown) can move the substrate SUB from the shuttle 200 to the destination location.
[0052] The cleaning module 300 can be mounted on the shuttle 200 and move along with it. The cleaning module 300 can clean the track unit 100 while moving along it. A detailed explanation of this will follow.
[0053] The cleaning room CB can be arranged on the path of the track unit 100 and the cleaning shuttle 200.
[0054] As an example, when the cleaning room CB is arranged on the circulating track unit 100 and the shuttle 200 travels a distance or drives for a preset target time, the shuttle 200 can enter the cleaning room CB and perform the cleaning process.
[0055] As another example, although not shown, when the cleaning room CB is set on an additional cleaning track (not shown) branching from the track unit 100 and the shuttle 200 travels a distance or drives for a preset target time, the shuttle 200 can enter the cleaning room CB set on the cleaning track for cleaning and perform the cleaning process.
[0056] As another example, although not shown in the figure, the cleaning room CB can be raised and lowered in the height direction on the track unit 100.
[0057] Specifically, when the shuttle 200 travels a certain distance or travels for a predetermined time, the shuttle 200 enters the cleaning chamber CB. Subsequently, the cleaning chamber CB rises or falls on the track to occupy an additional cleaning space. The cleaning process of the shuttle 200 is then performed in the cleaning space, and when the cleaning process is complete, the cleaning chamber CB can move in the opposite direction to allow the shuttle 200 to return to its original position on the track unit 100.
[0058] As one embodiment, the substrate transport system 1 can be arranged on the ceiling of the work space. The substrate transport system 1 is a system including an overhead shuttle (OHS), with the track space 50 and track unit 100 arranged on the ceiling, and the manufacturing apparatus 5 that performs each process can be arranged below the track unit 100.
[0059] In the substrate transport system 1, by arranging the space for transporting substrates SUB in the upper part of the work space, the efficiency of work space utilization can be improved and a compact structural arrangement can be achieved.
[0060] Figure 3 It is shown Figure 2 The diagram shows a cross-section of the substrate transport system 1. Figure 4 It is shown Figure 2The diagram shows a portion of the substrate transport system 1, and Figure 5 It is shown Figure 2 Perspective view of track unit 100.
[0061] Reference Figures 3 to 5 The track unit 100 may include a track 110 and a support plate 120.
[0062] The tracks 110 can extend along a preset path and can be arranged in pairs facing each other. The tracks 110 can contact the drive wheels 230 of the shuttle 200.
[0063] As one embodiment, the track 110 may be provided with a first body 111, a side wall 112, and a second body 113.
[0064] The first body 111 can contact the drive wheel 230 of the shuttle 200, and a support plate 120 can be arranged between the first bodies 111. As the first body 111 and the drive wheel 230 rub against each other, particles may be generated in the first body 111.
[0065] The sidewall 112 can extend from the first body 111 and cover the side of the drive wheel 230. In addition, the sidewall 112 can contact the side wheel 240 and the steering wheel 250 of the shuttle 200, so as the shuttle 200 is driven, particles may be generated or scattered in the drive wheel 230, the side wheel 240 and the steering wheel 250.
[0066] The second body 113 can extend from the side wall 112 and face each other to the first body 111. The second body 113 covers the upper part of the drive wheel 230, thereby reducing the movement of particles toward the substrate SUB loaded on the shuttle 200.
[0067] The support plate 120 can be arranged between a pair of rails 110 and has multiple first openings OP1.
[0068] Because the first opening OP1 of the support plate 120 opens downwards, the internal space of the track 110 and the working space can be connected through the first opening OP1. Therefore, there is no need for additional equipment or devices to draw particles into the first opening OP1; instead, particles generated by the drive of the shuttle 200 can fall and be discharged into the working space through the first opening OP1, thereby reducing contamination of the internal space of the track unit 100 and enabling efficient use of the working space.
[0069] As one embodiment, the open area ratio of the first opening OP1 per unit area of the support plate 120 can be 50% to 90%. (The last part, "every 1m of the support plate 120," appears to be an error and doesn't need a direct translation.) 2 The sum of the areas of the first opening OP1 can be 50% to 90%.
[0070] If the open area ratio of the first opening OP1 per unit area is less than 50%, particles generated during the operation of the shuttle 200 may have difficulty being easily discharged downwards through the first opening OP1 and may remain in the internal space of the track unit 100. Furthermore, if the open area ratio of the first opening OP1 per unit area is greater than 90%, the rigidity of the support plate 120 may be reduced.
[0071] As one embodiment, the first opening OP1 can extend in a second direction DR2, which is the width direction of the track 110. Referring to the drawings, a pair of first openings OP1 are arranged in the second direction DR2, and the pair of first openings OP1 can be arranged spaced apart from each other in the first direction DR1.
[0072] The support plate 120 may have a width W in the second direction DR2. The width W may be set to be substantially equal to or less than the distance between the drive wheels 230 of the shuttle 200. Since the drive wheels 230 of the shuttle 200 are in contact in the first body 111 of the track 110, and the support plate 120 is arranged to face the bottom surface of the first base 210 of the shuttle 200, the shuttle 200 can move stably along the track 110, and particles generated in the track 110 can be discharged through the first opening OP1 after moving between the support plate 120 and the bottom surface of the first base 210.
[0073] Figure 6 It is shown Figure 5 An exploded perspective view of a modified example of the orbital unit 100.
[0074] Reference Figure 6 The track unit 100A may be equipped with a track 110A, a support plate 120A, and a movable plate 130A.
[0075] Tracks 110A can be configured as a pair facing each other and have a first body 111A, a sidewall 112A, a second body 113A, and a guide portion 114A. The first body 111A, sidewall 112A, and second body 113A are substantially the same as the first body 111, sidewall 112, and second body 113 in the aforementioned embodiments, so repeated content will be briefly described or omitted.
[0076] The support plate 120A may have a first opening OP1 and be arranged between the first bodies 111A.
[0077] The movable plate 130A may have a second opening OP2 and be arranged to slide within the guide portion 114A. The movable plate 130A may be provided with a central portion 131A having the second opening OP2 and an edge portion 131B supported by the guide portion 114A.
[0078] The first opening OP1 of the support plate 120A and the second opening OP2 of the movable plate 130A can be arranged to correspond to each other. As the movable plate 130A moves in the first direction DR1, the open area formed by the overlap of the first opening OP1 and the second opening OP2 can be adjusted. Depending on the degree of overlap between the first opening OP1 and the second opening OP2, the open area of the track unit 100A in the downward direction can be adjusted.
[0079] As one embodiment, the area of the second opening OP2 can be set to be substantially the same as the area of the first opening OP1. Furthermore, the interval between adjacent second openings OP2 can be set to be substantially the same as the interval between adjacent first openings OP1. As the moving plate 130A moves, the opening amount of the track unit 100A formed by the overlap of the first opening OP1 and the second opening OP2 can be adjusted according to the movement of the moving plate 130A.
[0080] As another example, the area of the second opening OP2 can be set to be different from the area of the first opening OP1. Furthermore, the spacing between adjacent second openings OP2 can be set to be different from the spacing between adjacent first openings OP1. Thus, the opening of the track unit 100A formed by the overlap of the first opening OP1 and the second opening OP2 can have a pattern, and the opening amount of the track unit 100A can change by the pattern as the moving plate 130A moves.
[0081] Refer again Figure 3 and Figure 4 The shuttle 200 may include a first base 210, a second base 220, a drive wheel 230, a side wheel 240, and a steering wheel 250.
[0082] The first base 210 can be arranged in the internal space of the track 110 and is provided with a drive wheel 230, a side wheel 240 and a steering wheel 250. A second base 220 can be arranged on the upper part of the first base 210 and the second base 220 can provide space for mounting the substrate SUB.
[0083] A support plate 120 may be arranged below the first base 210, and the first opening OP1 may be arranged to face the first base 210.
[0084] Drive wheels 230 can be arranged on both sides of the first base 210 and in contact with the first body 111 of the track 110. Side wheels 240 can be arranged adjacent to the drive wheels 230 and supported on the side wall 112 of the track 110, thereby improving the stability of the shuttle 200. Steering wheels 250 can be arranged on the upper side of the first base 210 and can steer the shuttle 200 according to operation.
[0085] Figure 7 It is shown Figure 2 Top view of the cleaning module 300.
[0086] Reference Figure 4 and Figure 7 The cleaning module 300 is mounted on the shuttle 200 and can move along the track 110 together with the shuttle 200.
[0087] As one embodiment, the cleaning module 300 may be provided with a base body 310, a battery 320, a dust collection unit 330, a brush part 340 and a nozzle part 350.
[0088] The base body 310 forms the basic framework of the cleaning module 300, and can be equipped with a battery 320 and a dust collection unit 330.
[0089] As one embodiment, wheels 311 are arranged on both sides of the base body 310, and wheels 311 can move along track 110. Wheels 311 can be arranged side by side at the rear end of the drive wheels 230 of the shuttle 200.
[0090] As another example, the base body 310 can be separated from the first body 111 of the track 110 and does not include wheels. In this case, the base body 310 can be fixed to the shuttle 200, and the base body 310 can be separated from the track 110 in a non-contact manner.
[0091] The base body 310 can be connected to the rear end of the shuttle 200 via connector 312. The cleaning module 300 can be selectively connected to the shuttle 200 depending on the installation or removal of connector 312.
[0092] The battery 320 can be arranged at the front end of the base body 310 and provide driving force for the dust collection unit 330. In addition, the dust collection unit 330 can be arranged at the rear end of the base body 310 and connected to the nozzle part 350.
[0093] The dust collection unit 330 can be connected to the nozzle section 350 via the dust collection line SL. Particles and the like sucked into the nozzle section 350 can be collected via the dust collection line SL and stored in the storage tank (not shown) of the dust collection unit 330.
[0094] The brush section 340 can be arranged behind the base body 310 and contact the track 110 as the shuttle 200 is driven. The brush section 340 can be provided with a brush B mounted on a brush shaft.
[0095] Brushes B can be arranged on opposite tracks 110 and do not need to contact the support plate 120. A pair of brushes B can be arranged on the first body 111.
[0096] Brush B can collect particles remaining on the first body 111. Even if particles generated during the drive of the shuttle 200 remain on the surface of the first body 111 or in the upper space of the first body 111, brush B can move along the space traversed by the drive wheel 230 and quickly capture the particles.
[0097] The nozzle section 350 can be arranged adjacent to the brush section 340 and suck up particles. The nozzle section 350 can be provided with multiple nozzles N and arranged behind the brush section 340.
[0098] The nozzle section 350 may have a plurality of nozzles N arranged on a nozzle shaft extending in the second direction DR2. The plurality of nozzles N may be arranged to be spaced apart at a predetermined interval in the second direction DR2.
[0099] As one embodiment, a portion of the plurality of nozzles N can be arranged to face the first body 111 of the track 110, thereby rapidly drawing particles remaining on the surface of the first body 111 of the track 110 into the dust collection unit 330. Furthermore, another portion of the plurality of nozzles N can be arranged to face the support plate 120 and clean the support plate 120. The nozzles N arranged on the upper part of the support plate 120 can clean the support plate 120, thereby minimizing particle accumulation on the support plate 120.
[0100] The nozzle section 350 can be arranged behind the brush section 340 to minimize additional contamination of the substrate SUB by the cleaning module 300.
[0101] When gas flow is generated inside the track unit 100 or the track space 50, the substrate SUB may be additionally contaminated due to the flow. The nozzle section 350 can be arranged behind the brush B and spaced apart from the shuttle 200. Therefore, it is possible to prevent the shuttle 200 from being additionally contaminated by particles due to the flow when the nozzle section 350 is driven.
[0102] Furthermore, the nozzle section 350 can be arranged adjacent to the brush section 340 to rapidly capture particles captured in the brush B. When the nozzle section 350 is driven, the nozzle N adjacent to the brush B can capture the particles captured in the brush B into the dust collection unit 330.
[0103] Figure 8 It is shown Figure 2 A diagram of a modified example of the cleaning module 300.
[0104] Reference Figure 8 The cleaning module 300 can clean the first body 111 and sidewall 112 of the track 110. The brush unit BT can have a brush shaft BS, a first brush BR1 and a second brush BR2.
[0105] The brush shaft BS can support the first brush BR1 and the second brush BR2, and the first brush BR1 and the second brush BR2 can be mounted in a rotatable manner.
[0106] The first brush BR1 can extend in the second direction DR2 facing the first body 111 of the track 110 and capture particles remaining on the first body 111.
[0107] The second brush BR2 can extend on the third direction DR3 to face the sidewall 112 of the track 110 and capture particles remaining on the sidewall 112.
[0108] The brush unit BT can arrange brushes on the first body 111 in the track 110 that contacts the drive wheel 230 and the side wall 112 that contacts the side wheel 240, thereby quickly capturing particles scattered or remaining inside the track unit 100.
[0109] Figure 9 It is shown Figure 3 A diagram of another variation of the cleaning module 300.
[0110] Reference Figure 9 The cleaning module 300 can clean the first body 111 and side wall 112 of the track 110. The nozzle unit NT may have a nozzle shaft NS, a first dust collection nozzle NO1, and a second dust collection nozzle NO2.
[0111] The nozzle shaft NS can be equipped with a first dust collection nozzle NO1 and a second dust collection nozzle NO2, and has a dust collection line SL connected to the dust collection unit 330 arranged inside it.
[0112] Although Figure 9 The diagram shows a nozzle shaft NS with a bent shape, but it is not limited to this. A first nozzle shaft with a first dust collection nozzle NO1 and a second nozzle shaft with a second dust collection nozzle NO2 can be provided respectively.
[0113] The first dust collection nozzle NO1 can be arranged to face the first body 111 of the track 110 and capture particles remaining on the first body 111. The second dust collection nozzle NO2 can be arranged to face the side wall 112 of the track 110 and capture particles remaining on the side wall 112.
[0114] The first dust collection nozzle NO1 and the second dust collection nozzle NO2 can be driven independently. The suction intensity of the first dust collection nozzle NO1 and the second dust collection nozzle NO2 can be adjusted separately. For example, the first dust collection nozzle NO1 can be set to have a stronger suction force than the second dust collection nozzle NO2.
[0115] The nozzle unit NT can arrange the first dust collection nozzle NO1 on the first body 111 in the track 110 that contacts the drive wheel 230 and arrange the second dust collection nozzle NO2 on the side wall 112 that contacts the side wheel 240, thereby quickly capturing particles scattered or remaining inside the track unit 100.
[0116] Figure 10 It is shown Figure 1 A cross-sectional view of the cleanroom CB, and Figure 11 Shown from another perspective Figure 10 A cross-sectional view of the cleanroom CB.
[0117] Reference Figure 10 and Figure 11 The cleaning room CB can be arranged on the path of track 110 and clean the incoming shuttle 200.
[0118] The cleaning chamber CB can be driven according to a target distance or time so that only the shuttle 200 that needs cleaning can enter, and the lower part of the shuttle 200 can be cleaned. The cleaning chamber CB can clean the internal space of the track unit 100 and the drive wheels 230 of the shuttle 200, etc.
[0119] The cleaning room CB may have a first gate GA1 for the shuttle 200 to be cleaned to enter and a second gate GA2 for the cleaned shuttle 200 to exit.
[0120] The track 110 of the cleaning room CB can have multiple openings. A first channel CH1 can be arranged between the tracks 110, and the first channel CH1 can be connected to the cleaning line CL. In addition, a second channel CH2 can be arranged on the side of the track 110, and the cleaning nozzle CN can pass through the second channel CH2 and spray air into the lower structure of the shuttle 200.
[0121] The cleaning chamber CB sprays gas from the cleaning nozzle CN and simultaneously draws in gas from the cleaning line CL. The gas sprayed from the cleaning nozzle CN can cause particles or other particles remaining in the drive wheel 230 of the shuttle 200 or the internal space of the track unit 100 to float, and the cleaning line CL can draw in the floated particles.
[0122] The embodiments applicable to this utility model have been described above. The embodiments described above can be implemented as individual embodiments or as combinations thereof.
[0123] As described above, although the present invention has been illustrated with reference to one embodiment shown in the accompanying drawings, this is merely illustrative, and those skilled in the art should understand that various modifications and variations of the embodiments can be made therefrom. Therefore, the true scope of protection of the present invention should be determined by the technical concept of the appended claims.
Claims
1. A substrate conveying system, characterized in that, include: A pair of tracks, extending along a pre-defined path and facing each other; A shuttle car on which substrates are loaded and moved along the track; as well as A support plate is arranged between the pair of rails and has multiple openings.
2. The substrate conveying system according to claim 1, characterized in that, In the support plate, the opening extends along the width direction of the track.
3. The substrate conveying system according to claim 1, characterized in that, In the support plate, the ratio of the open area of the opening per unit area is 50% to 90%.
4. The substrate conveying system according to claim 1, characterized in that, Also includes: A cleaning module is installed on the shuttle and moves along the track with the shuttle.
5. The substrate conveying system according to claim 4, characterized in that, The cleaning module includes: The brush section is arranged along the track; and The nozzle portion is adjacent to the brush portion.
6. The substrate conveying system according to claim 4, characterized in that, The cleaning module includes: The first brush moves along the bottom surface of the track; and The second brush moves along the sidewall of the track.
7. The substrate conveying system according to claim 4, characterized in that, The cleaning module includes: The first dust collection nozzle moves along the bottom surface of the track; and The second dust collection nozzle moves along the side wall of the track.
8. The substrate conveying system according to claim 5, characterized in that, The cleaning module also includes: Base; A dust collection unit is mounted on the base and connected to the nozzle section; and A connector is arranged in front of the base and connected to the shuttle.
9. The substrate conveying system according to claim 1, characterized in that, Also includes: A cleaning room is located along the path of the track and is used to clean the shuttle cars that enter.
10. The substrate transport system according to claim 1, characterized in that, The track is mounted on the ceiling of the workspace, and the opening in the support plate communicates with the workspace.