Optical system and laser scribing apparatus with multiple wavelengths of laser light

Abstract

The utility model discloses an optical system and laser scribing equipment with multi -wavelength laser, include gradually along the first direction: laser emission unit for outputing first laser beam along the first direction, wavelength conversion unit for converting part first laser beam into second laser beam, output contains the mixed light of first laser beam and second laser beam, and the wavelength of second laser beam is different with the wavelength of first laser beam, first beam splitting unit for making second laser beam transmit along the first direction, and make first laser beam reflect along the second direction, second beam splitting unit for making second laser beam reflect along the second direction, wherein, the first direction and the second direction intersect. The optical system of the present application can be used in laser scribing process, only need a laser source of output fixed wavelength, can output two different wavelength lights to the same direction, and two different wavelength lights are used in laser scribing process on different film layers, improve the processing efficiency of scribing process, and save the cost.

Description

Technical Field

[0001] This utility model relates to the field of perovskite solar cell technology, and in particular to an optical system with multi-wavelength laser and a laser scribing device. Background Technology

[0002] The fabrication process of perovskite solar cells involves four steps that require laser scribing equipment: P1 laser scribing, P2 laser scribing, P3 laser scribing, and P4 laser edge cleaning. In the fabrication of perovskite solar cells, P1 scribing cuts through the bottom TCO layer, serving as insulation and dividing the cell into several sub-cells to increase the module voltage. P2 scribing creates a channel between the top electrode layer and the TCO layer, allowing for good contact between the positive and negative electrodes and enabling series connection between sub-cells. P3 scribing divides the top electrode layer to form the device. P4 edge cleaning removes the film layer from approximately 10mm of the cell's edge, facilitating encapsulation and preventing short circuits caused by uneven film layer bonding.

[0003] In actual scribing processes, different film layers have different absorption characteristics for each wavelength of laser light, meaning that laser scribing for different film layers requires lasers of different wavelengths. Laser scribing for perovskite solar cells often uses lasers with wavelengths of 532nm and 1064nm, commonly referred to as green and infrared lasers. However, a single laser capable of outputting multiple wavelengths is very expensive, creating an unnecessary cost burden. Furthermore, using multiple lasers in conjunction with each other during the fabrication of perovskite solar cell modules can affect processing accuracy and efficiency, leading to instability in the cells.

[0004] Therefore, how to ensure processing accuracy while reducing costs is a problem that the industry needs to solve. Utility Model Content

[0005] The purpose of this invention is to provide an optical system and laser marking device with multi-wavelength lasers, which uses a fixed-wavelength laser to output laser beams of at least two wavelengths for laser marking.

[0006] The objective of this utility model is achieved through the following technical solution:

[0007] This utility model provides an optical system with multi-wavelength laser, comprising, along a first direction, the following:

[0008] A laser emitting unit is used to output a first laser beam along the first direction;

[0009] A wavelength conversion unit is used to convert a portion of the first laser beam into a second laser beam and output a mixed light containing the first laser beam and the second laser beam, wherein the wavelength of the second laser beam is different from the wavelength of the first laser beam.

[0010] The first beam splitter is used to transmit the second laser beam along the first direction and to reflect the first laser beam along the second direction.

[0011] The second beam splitter is used to reflect the second laser beam along the second direction;

[0012] The first direction and the second direction intersect.

[0013] As a further improvement of one embodiment of the present invention, the wavelength conversion unit includes a frequency doubling crystal.

[0014] As a further improvement of one embodiment of the present invention, the wavelength conversion unit further includes a heating device connected to the frequency doubling crystal, the heating device being used to heat the frequency doubling crystal to control the conversion efficiency of the frequency doubling crystal for the received first laser beam.

[0015] As a further improvement of one embodiment of the present invention, it further includes a first reflection component and a second reflection component disposed in the second direction. The first reflection component is disposed on the transmission path of the reflected first laser beam and is used to adjust the collimation and pitch of the first laser beam; the second reflection component is disposed on the transmission path of the reflected second laser beam and is used to adjust the collimation and pitch of the second laser beam.

[0016] As a further improvement of one embodiment of the present invention, it also includes a first optical shutter structure and a second optical shutter structure disposed in the second direction. The first optical shutter structure is disposed on the transmission path of the reflected first laser beam and is used to disconnect the transmission of the first laser beam when activated. The second optical shutter structure is disposed on the transmission path of the reflected second laser beam and is used to disconnect the transmission of the second laser beam when activated.

[0017] As a further improvement of one embodiment of the present invention, it also includes a first beam expanding unit and a second beam expanding unit disposed in the second direction, wherein the first beam expanding unit is disposed on the transmission path of the reflected first laser beam and the second beam expanding unit is disposed on the transmission path of the reflected second laser beam.

[0018] The first beam expanding unit and the second beam expanding unit are respectively used to adjust the spot diameter of the first laser beam and the second laser beam.

[0019] As a further improvement of one embodiment of the present invention, it also includes an image sensor disposed in the second direction, the image sensor being disposed on the transmission path of the reflected first laser beam and / or the transmission path of the reflected second laser beam.

[0020] As a further improvement of one embodiment of the present invention, the wavelength of the second laser beam is 1 / 2 of the wavelength of the first laser beam;

[0021] And / or, the wavelength of the first laser beam is 1064nm, the wavelength of the second laser beam is 532nm, the first beam splitting unit is set as a 1064R / 532T dichroic mirror, and the second beam splitting unit is set as a 532R / 1064T dichroic mirror;

[0022] And / or, the first direction and the second direction are perpendicular.

[0023] As a further improvement of one embodiment of the present invention, the second beam splitting unit includes a beam splitting crystal and a half-wave plate arranged sequentially along the first direction. The second beam splitting unit is used to reflect part of the second laser beam along the second direction and transmit another part of the second laser beam along the first direction.

[0024] It also includes another wavelength conversion unit and a third beam splitting unit sequentially disposed on the transmission side of the second beam splitting unit. The other wavelength conversion unit is used to convert the other part of the second laser beam into a third laser beam for output. The third beam splitting unit is used to reflect the third laser beam along the second direction. The wavelength of the third laser beam is different from the wavelength of the second laser beam.

[0025] This utility model also provides a laser marking device, including an optical system with multi-wavelength lasers as described above and a mobile platform. The mobile platform is arranged along the second direction and is used to carry the product to be marked. The first laser beam and the second laser beam transmitted by the optical system along the second direction are used to laser mark the product to be marked.

[0026] Compared with the prior art, the beneficial effects of this utility model include at least the following: by incorporating an optical system, this utility model only requires one laser light source with a fixed output wavelength to output at least two different wavelengths of light in the same direction, which can be applied to laser scribing process. The two different wavelengths of light are applied to laser scribing process on different film layers, which improves the processing efficiency of laser scribing process and saves costs. Attached Figure Description

[0027] Figure 1 This is a schematic diagram of the structure of the optical system with multi-wavelength laser in Embodiment 1 of this utility model;

[0028] Figure 2 This is a schematic diagram of the structure of the optical system with multi-wavelength laser in Embodiment 2 of this utility model.

[0029] In the diagram: 1. Laser emitting unit; 2. Wavelength conversion unit; 3. First beam splitting unit; 4. Second beam splitting unit; 51. First reflecting component; 511. First reflecting mirror; 512. Second reflecting mirror; 52. Second reflecting component; 521. Third reflecting mirror; 522. Fourth reflecting mirror; 53. Third reflecting component; 531. Fifth reflecting mirror; 532. Sixth reflecting mirror; 61. First optical shutter structure; 62. Second optical shutter structure; 63. Third optical shutter structure; 7. Image sensor; 8. Light collecting unit; 91. Another wavelength conversion unit; 92. Third beam splitting unit; a. First laser beam; b. Second laser beam; c. Third laser beam. Detailed Implementation

[0030] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make the present invention more comprehensive and complete, and to fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore repeated descriptions of them will be omitted.

[0031] The terms used to describe position and direction in this utility model are illustrated with the accompanying drawings, but changes can be made as needed, and all such changes are included within the scope of protection of this utility model.

[0032] Example 1

[0033] like Figure 1 As shown, this embodiment provides an optical system with multi-wavelength lasers. The optical system is applied to laser scribing processes. The optical system includes, in sequence along a first direction, a laser emitting unit 1, a wavelength conversion unit 2, a first beam splitting unit 3, and a second beam splitting unit 4.

[0034] The laser emitting unit 1 is used to output a first laser beam a along a first direction. Specifically, the laser emitting unit 1 can be a laser that outputs a fixed wavelength.

[0035] Wavelength conversion unit 2 is used to receive a first laser beam a output from laser emitting unit 1, and convert a portion of the first laser beam a into a second laser beam b. Wavelength conversion unit 2 outputs mixed light containing the first laser beam a and the second laser beam b, which is transmitted along a first direction. The wavelength of the second laser beam b is different from the wavelength of the first laser beam a.

[0036] Specifically, in this embodiment, the wavelength conversion unit 2 includes a frequency doubling crystal (KTP / LBO), and the wavelength of the second laser beam b is specifically half the wavelength of the first laser beam a.

[0037] For example, in perovskite solar cells, 1064nm infrared light is typically used for scribing the P1 layer (TCO film) and cleaning the P4 edge (full film edge cleaning), while 532nm green light is used for scribing the P1 layer (TCO film), P2 layer (functional layer), and P3 layer (metal electrode layer). This can be achieved using a laser with a fixed output wavelength of 1064nm. For instance, laser emitting unit 1 outputs a first laser beam a with a wavelength of 1064nm. After passing through a frequency doubling crystal, a portion of the 1064nm laser beam a is converted into a second laser beam b with a wavelength of 532nm and output along a first direction, while the remaining unconverted portion continues to be output along the first direction. In other words, the output of the 1064nm laser beam a, after passing through the frequency doubling crystal, contains a mixed beam of the 1064nm first laser beam a and the 532nm second laser beam b.

[0038] Furthermore, the optical system in this embodiment also includes two 45° high-magnification mirrors and a focusing lens disposed between the laser emitting unit 1 and the wavelength conversion unit 2. The two 45° high-magnification mirrors are close to the laser emitting unit 1 and are used to collimate and adjust the pitch of the first laser beam a output by the laser emitting unit 1. The focusing lens is disposed close to the wavelength conversion unit 2 and is used to refocus the light reflected by the two 45° high-magnification mirrors to ensure that the light spot of the first laser beam a does not diverge before entering the wavelength conversion unit 2, thus preventing issues such as spot detuning and quality degradation.

[0039] Of course, during the actual installation of the optical system, the frequency doubler needs to be moved back and forth within the focal length range of the focusing lens to find the focal point. The focal point is the position where the first laser beam a has the smallest spot size and the strongest light energy in the first direction after passing through the focusing lens. After finding the focal point using the frequency doubler, the wavelength conversion unit 2, i.e., the frequency doubler crystal, is placed at the focal point so that the focal point is exactly at the midpoint of the frequency doubler crystal. The angle and direction of the frequency doubler crystal are repeatedly adjusted to achieve the best frequency doubling effect.

[0040] Of course, when using a frequency multiplier to find the focal point of the light, the optical power of the first laser beam a output by the laser emitting unit 1 can be adjusted to a safe power of less than 100mW.

[0041] Since the wavelength conversion efficiency of the frequency doubling crystal for the passing laser beam is related to the material properties of the frequency doubling crystal itself, as well as the placement angle and orientation of the frequency doubling crystal, the conversion efficiency of the frequency doubling crystal for the first laser beam a can be changed by altering its temperature after fixing the position, angle, and orientation of the frequency doubling crystal. Therefore, the wavelength conversion unit 2 in this embodiment also includes a heating device connected to the frequency doubling crystal. The heating device is used to heat the frequency doubling crystal to control its conversion efficiency for the received first laser beam a.

[0042] Preferably, the heating device is a heating wire wound around the frequency doubling crystal.

[0043] Preferably, the heating device heats the frequency doubling crystal to a suitable temperature, such that the conversion efficiency of the frequency doubling crystal for the received first laser beam a is 50%. That is, after the first laser beam a output from laser emitting unit 1 passes through the frequency doubling crystal, 50% of the first laser beam a is converted into a second laser beam b and transmitted along the first direction, while the remaining 50% is not converted and continues to transmit along the first direction. Of course, in this embodiment, the power of the first laser beam a and the second laser beam b are equal.

[0044] The first beam splitter 3 is used to transmit the second laser beam b along a first direction and reflect the first laser beam a along a second direction, that is, the first laser beam a reflected by the first beam splitter 3 is transmitted along the second direction. Specifically, the first beam splitter 3 receives the remaining unconverted portion of the first laser beam a output from the wavelength conversion unit 2 and reflects this remaining unconverted portion of the first laser beam a along the second direction; simultaneously, the first beam splitter 3 receives the second laser beam b output from the wavelength conversion unit 2 and transmits this second laser beam b along the first direction. The first beam splitter 3 can be tilted at 45°.

[0045] Specifically, the first and second directions intersect.

[0046] Preferably, the first direction and the second direction are perpendicular, the first direction is horizontal and the second direction is vertical.

[0047] The second beam splitter 4 is used to reflect the second laser beam b along a second direction, that is, the second laser beam b reflected by the second beam splitter 4 is transmitted along the second direction. Specifically, the second beam splitter 4 receives the second laser beam b transmitted from the first beam splitter 3 and reflects the second laser beam b transmitted from the first beam splitter 3 along the second direction. The second beam splitter 4 can be tilted at 45°.

[0048] Furthermore, if the first beam splitting unit 3 does not completely reflect the first laser beam a, and the unreflected portion of the first laser beam a is transmitted through the first beam splitting unit 3, then the second beam splitting unit 4 is also used to transmit the first laser beam a along the first direction, and the first laser beam a transmitted through the second beam splitting unit 4 still transmits along the first direction.

[0049] Specifically, the wavelength of the first laser beam a is 1064nm, the wavelength of the second laser beam b is 532nm, the first beam splitting unit 3 is set as a 1064R / 532T dichroic mirror, and the second beam splitting unit 4 is set as a 532R / 1064T dichroic mirror. That is, after the mixed light output from the wavelength conversion unit 2 passes through the 1064R / 532T dichroic mirror, the 1064nm light is reflected and propagates along the second direction, while the 532nm light is transmitted and propagates along the first direction; the 532nm light transmitted through the 1064R / 532T dichroic mirror is then reflected again by the 532R / 1064T dichroic mirror and propagates along the second direction. Of course, if the 1064R / 532T dichroic mirror does not completely reflect the 1064nm light along the second direction, some 1064nm light will be transmitted along the first direction along with the 532nm light. After passing through the 532R / 1064T dichroic mirror, the excess 1064nm light will continue to be transmitted along the first direction. Furthermore, if the 532R / 1064T dichroic mirror does not completely reflect the 532nm light, some 532nm light will also continue to be transmitted along the first direction. This is related to the coating quality and effect of the 1064R / 532T and 532R / 1064T dichroic mirrors. Ideally, the 1064R / 532T dichroic mirror should completely reflect the 1064nm light, and the 532R / 1064T dichroic mirror should completely reflect the 532nm light.

[0050] Furthermore, the optical system in this embodiment also includes a first reflection component 51 and a second reflection component 52 disposed in the second direction. The first reflection component 51 is disposed on the transmission path of the first laser beam a reflected from the first beam splitter 3, and is used to adjust the collimation and elevation of the reflected first laser beam a. The second reflection component 52 is disposed on the transmission path of the second laser beam b reflected from the second beam splitter 4, and is used to adjust the collimation and elevation of the reflected second laser beam b.

[0051] The first reflecting component 51 includes a first reflecting mirror 511 and a second reflecting mirror 512 arranged along a first direction. The first reflecting mirror 511 and the second reflecting mirror 512 sequentially receive the first laser beam a reflected from the first beam splitting unit 3, and the first laser beam a reflected from the first beam splitting unit 3 is still transmitted along the second direction.

[0052] The second reflecting component 52 includes a third reflecting mirror 521 and a fourth reflecting mirror 522 disposed along a first direction. The third reflecting mirror 521 and the fourth reflecting mirror 522 sequentially receive the second laser beam b reflected from the second beam splitting unit 4, and ensure that the second laser beam b reflected from the second beam splitting unit 4 continues to propagate along the second direction.

[0053] The second reflector 512 is positioned closer to the second reflector assembly 52 than the first reflector 511, and the fourth reflector 522 is positioned closer to the first reflector assembly 51 than the third reflector 521.

[0054] Specifically, the first reflector 511, the second reflector 512, the third reflector 521 and the fourth reflector 522 are all 45° reflectors.

[0055] Thus, this invention can adjust the specific positional relationship of the first laser beam a and the second laser beam b, which pass through the first reflecting component 51 and the second reflecting component 52 respectively and are transmitted along the second direction, by adjusting the positions of the second reflecting mirror 512 and the fourth reflecting mirror 522 in the first direction. For example, the distance between the first laser beam a and the second laser beam b can be adjusted. When subsequently applied to the laser scribing process, since it is necessary to use the first laser beam a or the second laser beam b at different positions on the same film layer for laser scribing, the specific scribing position of the first laser beam a or the second laser beam b can be adjusted accordingly by adjusting the positions of the second reflecting mirror 512 or the fourth reflecting mirror 522 in the first direction.

[0056] Furthermore, in this embodiment, the optical system also includes a first shutter structure 61 and a second shutter structure 62 disposed in the second direction. The first shutter structure 61 is disposed on the transmission path of the first laser beam a reflected from the first beam splitter 3, and is used to disconnect the transmission of the first laser beam a reflected from the first beam splitter 3 when activated. The second shutter structure 62 is disposed on the transmission path of the second laser beam b reflected from the second beam splitter 4, and is used to disconnect the transmission of the second laser beam b reflected from the second beam splitter 4 when activated.

[0057] The first shutter structure 61 can be located on the transmission path of the first laser beam a before it enters the first reflector 51, or on the transmission path of the first laser beam a after it passes through the first reflector 51. The second shutter structure 62 can be located on the transmission path of the second laser beam b before it enters the second reflector 52, or on the transmission path of the second laser beam b after it passes through the second reflector 52.

[0058] The first optical shutter structure 61 and the second optical shutter structure 62 can be configured as movable light-blocking blades. When it is necessary to disconnect the transmission of the first laser beam a reflected from the first beam splitting unit 3, the first optical shutter structure 61 can be controlled to move and block the transmission of the first laser beam a. Of course, if the first optical shutter structure 61 is controlled to return to the initial position, the first laser beam a can continue to transmit along the second direction. When it is necessary to disconnect the transmission of the first laser beam a reflected from the second beam splitting unit 4, the second optical shutter structure 62 can be controlled to move and block the transmission of the second laser beam b. Of course, if the second optical shutter structure 62 is controlled to return to the initial position, the second laser beam b can continue to transmit along the second direction. For example, when using the optical system of this embodiment to perform laser scribing, when P1 scribing and P4 edge clearing are required, the first shutter structure 61 is kept stationary in its initial position, and the second shutter structure 62 is controlled to move and block the transmission of the second laser beam b, so that only the first laser beam a is transmitted along the second direction to the surface of the product to be scribed for laser scribing; when P2 scribing and P3 scribing are required, the second shutter structure 62 is kept stationary in its initial position, and the first shutter structure 61 is controlled to move and block the transmission of the first laser beam a, so that only the second laser beam b is transmitted along the second direction to the surface of the product to be scribed for laser scribing.

[0059] Furthermore, in this embodiment, the optical system also includes a first beam expander (not shown in the figure) and a second beam expander (not shown in the figure) disposed in the second direction. The first beam expander is disposed on the transmission path of the first laser beam a reflected from the first beam splitter 3, and the second beam expander is disposed on the transmission path of the second laser beam b reflected from the second beam splitter 4. The first beam expander and the second beam expander are respectively used to adjust the spot diameter of the emitted light beams of the first laser beam a and the second laser beam b.

[0060] Specifically, both the first beam expanding unit and the second beam expanding unit are beam expanders. Depending on the specific laser scribing process, such as the need to use the first laser beam a or the second laser beam b to scribing different groove widths, a beam expander adapted to the process requirements can be used to adjust the spot diameter when the first laser beam a or the second laser beam b reaches the surface of the product to be scribed.

[0061] Furthermore, in this embodiment, the optical system also includes an image sensor 7 disposed in the second direction. The image sensor 7 is disposed on the transmission path of the first laser beam a reflected from the first beam splitter 3 and / or on the transmission path of the second laser beam b reflected from the second beam splitter 4. Of course, in practical applications, only one image sensor 7 is needed; it can be disposed only on the transmission path of the first laser beam a reflected from the first beam splitter 3, or only on the transmission path of the second laser beam b reflected from the second beam splitter 4. Figure 1The diagram illustrates the structure where the image sensor 7 is positioned solely on the transmission path of the first laser beam a reflected from the first beam splitter 3.

[0062] Specifically, a sleeve extending along a second direction can be provided on the transmission path of the first laser beam a output from the first reflecting component 51 and the transmission path of the second laser beam b output from the second reflecting component 52, respectively. This allows the first laser beam a from the first reflecting component 51 and the second laser beam b from the second reflecting component 52 to enter their respective sleeves and be transmitted within them before exiting from the bottom of the sleeves. The sleeves ensure stable beam transmission.

[0063] Of course, this utility model also requires a platform to be mounted in the second direction to place the product to be scribed, so that the product to be scribed is directly below the first laser beam a and the second laser beam b emitted from the first reflector 51 and the second reflector 52. The first laser beam a and the second laser beam b are used to scribble lines on the product to be scribed. Therefore, this utility model does not limit the length of the sleeve, as long as the light transmission quality is guaranteed and the bottom end of the sleeve does not interfere with the product to be scribed.

[0064] More specifically, the image sensor 7 can be fixed on the sleeve to position the first laser beam a or the second laser beam b on the surface of the product to be scribed, ensuring the scribing accuracy after target alignment.

[0065] Image sensor 7 can be a CCD camera.

[0066] Of course, a galvanometer scanning system can also be set on the optical path before the first laser beam a or the second laser beam b enters the image sensor 7 to achieve precise control of the laser beam scanning path.

[0067] Furthermore, in this embodiment, the optical system also includes a light collection unit 8 disposed in the first direction. The light collection unit 8 is disposed on the side of the second beam splitting unit 4 away from the first beam splitting unit 3 and is used to collect the laser beams that pass through the first beam splitting unit 3 and the second beam splitting unit 4. That is, it is used to collect the first laser beam a that is not reflected by the first beam splitting unit 3 and the second laser beam b that is not reflected by the second beam splitting unit 4.

[0068] The light collection unit 8 can be a sheet metal light storage box for collecting useless light beams transmitted in the first direction.

[0069] Of course, the light collecting unit 8 can also be other light blocking structures that can block the laser beam passing through the first beam splitting unit 3 and the second beam splitting unit 4 from continuing to propagate in the first direction.

[0070] Example 2

[0071] like Figure 2This is a structural diagram of the optical system of Embodiment 2 of the present invention. Unlike Embodiment 1, in this embodiment, the second beam splitting unit 4 includes a beam splitting crystal and a half-wave plate arranged sequentially along the first direction. The second beam splitting unit 4 is used to receive the second laser beam b transmitted from the first beam splitting unit 3, and to reflect part of the second laser beam b transmitted from the first beam splitting unit 3 along the second direction, while the other part of the second laser beam b continues to be transmitted along the first direction.

[0072] Specifically, in this embodiment, the laser emitting unit 1 outputs a first laser beam a with a wavelength of 1064nm. The first beam splitting unit 3 is also configured as a 1064R / 532T dichroic mirror. That is, after the first laser beam a with a wavelength of 1064nm passes through the wavelength conversion unit 2, it outputs a mixed light containing a first laser beam a with a wavelength of 1064nm and a second laser beam b with a wavelength of 532nm. After the mixed light passes through the first beam splitting unit 3, the 1064nm first laser beam a is reflected and transmitted along the second direction, while the 532nm second laser beam b is transmitted along the first direction. The transmitted 532nm second laser beam b passes through the second beam splitting unit 4. Since the second beam splitting unit 4 contains a beam splitting crystal and a half-wave plate arranged sequentially, the beam splitting crystal can be used to split the 532nm second laser beam b into two parts. One part of the 532nm laser beam is reflected and transmitted along the second direction, while the other part of the 532nm second laser beam b continues to be transmitted along the first direction. The half-wave plate is used to adjust the polarization direction of the second laser beam b transmitted from the beam splitter crystal, so that the second laser beam b transmitted along the first direction after adjustment can meet the phase matching condition of another wavelength conversion unit 91.

[0073] Furthermore, based on the optical system structure of Embodiment 1, it further includes another wavelength conversion unit 91 and a third beam splitting unit 92 arranged sequentially in the first direction. The other wavelength conversion unit 91 and the third beam splitting unit 92 are disposed on the transmission side of the second beam splitting unit 4, that is, on the side of the second beam splitting unit 4 opposite to the first beam splitting unit 3. Specifically, the other wavelength conversion unit 91 and the third beam splitting unit 92 are disposed between the second beam splitting unit 4 and the light collection unit 8.

[0074] Another wavelength conversion unit 91 is used to receive a portion of the second laser beam b transmitted from the beam splitter crystal and convert the remaining portion of the second laser beam b transmitted from the beam splitter crystal into a third laser beam c for output. A third beam splitting unit 92 is used to receive the third laser beam c and reflect the third laser beam c along a second direction. The wavelength of the third laser beam c is different from the wavelength of the second laser beam b. The third beam splitting unit 92 can be tilted at 45°.

[0075] Specifically, another wavelength conversion unit 91 is a frequency doubling crystal, used to completely convert a portion of the second laser beam b transmitted from the beam splitter crystal into a third laser beam c for output, or to convert half of the portion of the second laser beam b transmitted from the beam splitter crystal into a third laser beam c for output. This means controlling the placement, angle, and temperature of the frequency doubling crystal to adjust its conversion efficiency for the second laser beam b. Of course, in this embodiment, the laser emitting unit 1 needs to output a first laser beam a with relatively high optical power to avoid the final frequency-doubled output third laser beam c having too low an optical power, thus failing to achieve the effect of thoroughly etching the film layer.

[0076] The wavelength of the third laser beam c is half the wavelength of the second laser beam b, and the third beam splitter 92 is set as a 266R / 532T dichroic mirror.

[0077] For example, another portion of the 532nm second laser beam b transmitted from the beam splitter passes through another wavelength conversion unit 91 and outputs a mixed beam containing the 532nm second laser beam b and the 266nm third laser beam c. After passing through the third beam splitting unit 92, the 266nm third laser beam c is reflected and propagates along the second direction, while the 532nm second laser beam b continues to be transmitted along the first direction. The light collection unit 8 is used to block the laser beams transmitted from the first beam splitting unit 3, the second beam splitting unit 4, and the third beam splitting unit 92 from continuing to propagate along the first direction.

[0078] Furthermore, this embodiment also includes a third reflecting component 53, which is disposed on the transmission path of the third laser beam c reflected from the third beam splitter 92, and is used to adjust the collimation and elevation of the reflected third laser beam c. Specifically, the third reflecting component 53 includes a fifth reflecting mirror 531 and a sixth reflecting mirror 532 disposed along a first direction. The fifth reflecting mirror 531 and the sixth reflecting mirror 532 sequentially receive the third laser beam c reflected from the third beam splitter 92, and ensure that the third laser beam c still transmits along the second direction. The sixth reflecting mirror 532 is disposed closer to the second reflecting component 52 than the fifth reflecting mirror 531, and both the fifth reflecting mirror 531 and the sixth reflecting mirror 532 are 45° reflecting mirrors.

[0079] Thus, this invention can adjust the specific positional relationship between the third laser beam c, the second laser beam b, and the first laser beam a, which are transmitted along the second direction after passing through the third reflecting component 53, by adjusting the position of the sixth reflecting mirror 532 in the first direction. For example, the distance between the third laser beam c and the second laser beam b can be adjusted. Of course, the specific position of the third laser beam c on the surface of the product to be scribed can also be adjusted by moving the position of the product to be scribed in the first direction.

[0080] Furthermore, this embodiment also includes a third optical shutter structure 63 disposed in the second direction. The third optical shutter structure 63 is disposed on the transmission path of the third laser beam c reflected from the third beam splitter unit 92, and is used to disconnect the transmission of the third laser beam c reflected from the third beam splitter unit 92 when activated. The third optical shutter structure 63 can be disposed on the transmission path of the third laser beam c before it enters the third reflection component 53, or it can be disposed on the transmission path of the third laser beam c after it passes through the third reflection component 53.

[0081] Specifically, the third shutter structure 63 can be configured as a movable light-blocking blade. When it is necessary to disconnect the transmission of the third laser beam c reflected from the third beam splitter unit 92, the third shutter structure 63 can be controlled to move and block the transmission of the third laser beam c. Of course, if the third shutter structure 63 is controlled to return to its initial position, the third laser beam c can continue to transmit along the second direction. The third shutter structure 63 can be controlled to move and disconnect the transmission of the third laser beam c according to whether the subsequent product to be marked needs the third laser beam c for marking.

[0082] Of course, this embodiment also includes a third beam expander (not shown in the figure) disposed in the second direction. The third beam expander is disposed on the transmission path of the third laser beam c reflected from the third beam splitter 92, and is used to adjust the spot diameter of the emitted third laser beam c. Specifically, the third beam expander is a beam expander lens. Depending on the specific laser scribing process, such as the need to utilize different groove widths of the third laser beam c, a beam expander lens adapted to the process requirements can be used to adjust the spot diameter of the third laser beam c when it reaches the surface of the product to be scribed.

[0083] This invention also provides a laser scribing device, including an optical system with multi-wavelength lasers as described in Embodiment 1 or Embodiment 2 and a movable stage. The movable stage is arranged along the second direction and is used to carry the product to be scribed. The first laser beam, the second laser beam, and the third laser beam transmitted by the optical system along the second direction are used to scribing different film layers of the product to be scribed. At the same time, the movable stage allows the product to be scribed to move along the first direction. The scribing positions of the first laser beam, the second laser beam, and the third laser beam on the surface of the product to be scribed are located by combining the positional relationship between the laser beam fed back by the image sensor set on the optical system and the surface of the product to be scribed.

[0084] In summary, this invention, by incorporating an optical system, requires only one laser light source with a fixed output wavelength to output two or three different wavelengths of light in the same direction. It can be applied to laser scribing processes, with two different wavelengths of light applied to laser scribing processes on different film layers, thereby improving the processing efficiency of laser scribing and saving costs.

[0085] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and alterations to the above embodiments within the scope of the present invention without departing from the principles and spirit of the present invention, and all such changes should fall within the protection scope of the claims of the present invention.

Claims

1. An optical system with multi-wavelength laser, characterized in that, Along the first direction, it includes in sequence: A laser emitting unit is used to output a first laser beam along the first direction; A wavelength conversion unit is used to convert a portion of the first laser beam into a second laser beam and output a mixed light containing the first laser beam and the second laser beam, wherein the wavelength of the second laser beam is different from the wavelength of the first laser beam. The first beam splitter is used to transmit the second laser beam along the first direction and to reflect the first laser beam along the second direction. The second beam splitter is used to reflect the second laser beam along the second direction; The first direction and the second direction intersect.

2. The optical system with multi-wavelength laser according to claim 1, characterized in that, The wavelength conversion unit includes a frequency doubling crystal.

3. The optical system with multi-wavelength laser according to claim 2, characterized in that, The wavelength conversion unit further includes a heating device connected to the frequency doubling crystal, the heating device being used to heat the frequency doubling crystal to control the conversion efficiency of the frequency doubling crystal for the received first laser beam.

4. The optical system with multi-wavelength laser according to claim 1, characterized in that, It also includes a first reflection component and a second reflection component disposed in the second direction. The first reflection component is disposed on the transmission path of the reflected first laser beam and is used to adjust the collimation and pitch of the first laser beam. The second reflection component is disposed on the transmission path of the reflected second laser beam and is used to adjust the collimation and pitch of the second laser beam.

5. The optical system with multi-wavelength laser according to claim 1, characterized in that, It also includes a first optical shutter structure and a second optical shutter structure disposed in the second direction. The first optical shutter structure is disposed on the transmission path of the reflected first laser beam and is used to disconnect the transmission of the first laser beam when activated. The second optical shutter structure is disposed on the transmission path of the reflected second laser beam and is used to disconnect the transmission of the second laser beam when activated.

6. The optical system with multi-wavelength laser according to claim 1, characterized in that, It also includes a first beam expanding unit and a second beam expanding unit disposed in the second direction, wherein the first beam expanding unit is disposed on the transmission path of the reflected first laser beam and the second beam expanding unit is disposed on the transmission path of the reflected second laser beam; The first beam expanding unit and the second beam expanding unit are respectively used to adjust the spot diameter of the first laser beam and the second laser beam.

7. The optical system with multi-wavelength laser according to claim 1, characterized in that, It also includes an image sensor disposed in the second direction, the image sensor being disposed on the transmission path of the reflected first laser beam and / or the transmission path of the reflected second laser beam.

8. The optical system with multi-wavelength laser according to claim 1, characterized in that, The wavelength of the second laser beam is half the wavelength of the first laser beam; And / or, the wavelength of the first laser beam is 1064nm, the wavelength of the second laser beam is 532nm, the first beam splitting unit is set as a 1064R / 532T dichroic mirror, and the second beam splitting unit is set as a 532R / 1064T dichroic mirror; And / or, the first direction and the second direction are perpendicular.

9. The optical system with multi-wavelength laser according to claim 1, characterized in that, The second beam splitting unit includes a beam splitting crystal and a half-wave plate arranged sequentially along the first direction. The second beam splitting unit is used to reflect a portion of the second laser beam along the second direction and transmit another portion of the second laser beam along the first direction. It also includes another wavelength conversion unit and a third beam splitting unit sequentially disposed on the transmission side of the second beam splitting unit. The other wavelength conversion unit is used to convert the other part of the second laser beam into a third laser beam for output. The third beam splitting unit is used to reflect the third laser beam along the second direction. The wavelength of the third laser beam is different from the wavelength of the second laser beam.

10. A laser marking device, characterized in that, The system includes an optical system with multi-wavelength lasers as described in any one of claims 1-9 and a mobile stage, wherein the mobile stage is arranged along the second direction and is used to carry the product to be scribed, and the first laser beam and the second laser beam transmitted by the optical system along the second direction are used to scribing the product with laser.

Images