Air pressure control system and semiconductor production apparatus
By introducing a gas-liquid separation device and a partition structure into semiconductor manufacturing equipment, the problem of liquid and water vapor corrosion caused by actuator seal failure was solved, thus achieving the stability of the pneumatic control system and the long-term reliability of the equipment, and reducing maintenance costs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- HANGZHOU FULLSEMI SEMICON CO LTD
- Filing Date
- 2025-08-22
- Publication Date
- 2026-06-16
AI Technical Summary
In the semiconductor manufacturing process, the sealing structure of the actuator is susceptible to environmental factors such as water immersion, spraying, and water vapor, which can lead to seal failure. Liquids and water vapor can be drawn into the gas pipeline, corroding and damaging the pressure control components, affecting the stability of equipment operation and processing yield, and increasing maintenance costs.
The device employs a gas-liquid separation unit, which includes a chamber and a partition structure, to trap liquid and settle water vapor, preventing it from entering the downstream pipeline. Combined with a liquid level sensor and temperature control components, it monitors and buffers pressure fluctuations, protecting the stability of the gas pressure control system.
It effectively prevents liquids and moisture from corroding and damaging downstream pipelines and components, reduces maintenance costs, ensures process stability and processing yield, and extends the service life of equipment components.
Smart Images
Figure CN224366350U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the technical field of semiconductor production and manufacturing, and more specifically, to a pneumatic control system and semiconductor production equipment. Background Technology
[0002] In semiconductor manufacturing, pneumatic control systems are used as power sources to drive actuators such as wafer handling robots, valves, and fixtures. A negative pressure system is part of this system, and its negative pressure generator can be a vacuum pump or a negative pressure generator integrated into the equipment. This generator is connected to the actuators via controlled gas pipelines. To enable complex actions on the actuators, atmospheric pressure and even positive pressure systems are often connected in parallel or series with the gas pipelines. Components such as solenoid valves and proportional valves allow for rapid switching and fine adjustment of positive, negative, and atmospheric pressures, ensuring precise operation of the actuators according to the process cycle.
[0003] However, the actual working environment of the actuator is far from ideal. Processes such as wet wafer cleaning, chemical mechanical polishing, and chemical spraying expose the actuator to water immersion, spraying, moisture, or high humidity environments for extended periods. In addition, the actuator needs to reciprocate frequently and bear loads, making its sealing structure prone to aging, wear, or failure.
[0004] When a negative pressure system is in operation, if the seal fails, liquids, moisture, and even chemicals from the external environment surrounding the actuator will be rapidly drawn into the gas pipeline. These liquids and moisture are then carried downstream by the airflow, causing corrosion and damage to precision components such as valves and sensors related to gas pressure control. This can lead to abnormal equipment shutdowns, deviations in process parameters, and other problems, directly affecting the normal operation of the equipment and process stability, impacting semiconductor processing yield, and significantly increasing maintenance workload and costs. Utility Model Content
[0005] The purpose of this application is to provide a pneumatic control system and semiconductor manufacturing equipment, wherein when an airtightness problem occurs at the actuator, causing liquid or water vapor to be sucked in, the pneumatic control system can trap the liquid and settle the water vapor, reducing or even preventing corrosion and damage to downstream pipelines and components, and reducing maintenance costs; at the same time, the pneumatic control system can also buffer pressure fluctuations and ensure process stability.
[0006] In a first aspect, a pneumatic control system is provided, comprising a first pipeline, a second pipeline, a negative pressure generating device, and a gas-liquid separation device. The gas-liquid separation device includes a first interface, a second interface, and a disconnectable drain pipe. A chamber of predetermined volume is provided inside the gas-liquid separation device. The first and second interfaces are located near the upper part of the chamber, and the drain pipe communicates with the bottom of the chamber. The first pipeline is connected at both ends to the negative pressure port of the negative pressure generating device and the first interface of the gas-liquid separation device, respectively. One end of the second pipeline is connected to the second interface of the gas-liquid separation device, and the other end is used to connect to an actuator.
[0007] In one feasible embodiment, the gas-liquid separation device further includes a partition structure disposed in the chamber and located between the first interface and the second interface to extend the airflow path from the first interface to the second interface.
[0008] In one feasible embodiment, the partition structure is connected to and extends downward from the top wall of the chamber, with a gap reserved between the bottom end of the partition structure and the inner bottom surface of the chamber.
[0009] In one feasible solution, the system further includes a control module and a first liquid level sensor and a second liquid level sensor electrically connected to the control module; the first liquid level sensor and the second liquid level sensor are disposed in the chamber; the first liquid level sensor is disposed at a height not higher than the bottom end of the partition structure; the second liquid level sensor is disposed at a height higher than the first liquid level sensor and lower than the height of the first interface; wherein the control module receives the liquid level signal from the first liquid level sensor and issues a first alarm message, and receives the liquid level signal from the second liquid level sensor and issues a second alarm message.
[0010] In one feasible embodiment, the partition structure includes at least an upper partition and a lower partition; the number of upper partitions is at least two, arranged along the direction from the first interface to the second interface, and the upper partitions are connected to the top wall of the chamber and extend downward from the top wall of the chamber for a predetermined length; a lower partition is provided between two adjacent upper partitions, and the lower partition is connected to the inner bottom surface of the chamber and extends upward from the inner bottom surface of the chamber for a predetermined length.
[0011] In one feasible embodiment, among the lower partition and the two upper partitions adjacent to it on both sides, the top height of the lower partition is lower than the bottom height of the upper partition near the second interface side, and the top height of the lower partition is higher than the bottom height of the upper partition near the first interface side.
[0012] In one feasible solution, the system further includes a control module and a first liquid level sensor and a second liquid level sensor electrically connected to the control module. The first liquid level sensor and the second liquid level sensor are disposed in the chamber and close to the first interface side. The first liquid level sensor is disposed at a height not higher than the bottom of all upper partitions. The second liquid level sensor is disposed at a height higher than the first liquid level sensor and lower than the first interface. The control module receives the liquid level signal from the first liquid level sensor and issues a first alarm message, and receives the liquid level signal from the second liquid level sensor and issues a second alarm message.
[0013] In one feasible embodiment, a first switching valve is installed on the connecting pipeline between the negative pressure generating device and the first pipeline; the air pressure control system also includes an atmospheric pressure pipeline, which is connected to the first pipeline through a third switching valve.
[0014] In one feasible embodiment, the pressure control system also includes a temperature control component mounted on the gas-liquid separation device to regulate the temperature inside the chamber and maintain it at the condensation temperature.
[0015] Secondly, a semiconductor manufacturing apparatus is also provided, including an actuator and the aforementioned pneumatic control system. The actuator is pneumatically driven and includes a pneumatic interface. The pneumatic interface of the actuator is connected to the second interface of the gas-liquid separation device via a second conduit of the pneumatic control system.
[0016] Compared with the prior art, the beneficial effects of this application include at least the following: the pneumatic control system of this application, by setting up a gas-liquid separation device with a chamber, can intercept the sucked liquid and settle most of the water vapor when a seal failure occurs at the actuator, so as to prevent the liquid and water vapor from being transmitted to the downstream with the airflow, reduce the risk of corrosion and damage to the precision pneumatic control components at the downstream of the first pipeline, thereby delaying the direct impact of the seal failure on the semiconductor equipment, helping to ensure process stability, ensure semiconductor processing yield, and also reduce maintenance workload and maintenance costs.
[0017] Furthermore, once the system pressure is maintained before the process begins, if a problem occurs in the system, whether it is a pressure drop caused by air leakage or a pressure rise caused by deformation of the actuator due to system vibration, the actual fluctuation will be reduced by the buffering effect of the gas-liquid separation device's chamber before being fed back to the precision air pressure control unit (such as valves) at the end of the first pipeline. This is equivalent to smoothing the system's pressure fluctuations with the help of the chamber, thereby shortening the pressure regulation range, achieving faster, more stable, and more precise maintenance of steady state, protecting the service life of components, and maintaining the stability of the product process. Attached Figure Description
[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.
[0019] Figure 1 This is a schematic diagram illustrating the composition of a first type of pneumatic control system according to an embodiment of this application.
[0020] Figure 2 This is a schematic diagram illustrating the composition of a second type of pneumatic control system according to an embodiment of this application.
[0021] Figure 3 and Figure 4 This is a schematic diagram of the structure of a first gas-liquid separation device shown in an embodiment of this application.
[0022] Figure 5 This is a schematic diagram of the structure of a second gas-liquid separation device shown in an embodiment of this application.
[0023] Figure 6 This is a schematic diagram of the third gas-liquid separation device shown in the embodiments of this application.
[0024] Figure 7 This is a schematic diagram of the structure of the fourth gas-liquid separation device shown in the embodiments of this application.
[0025] Figure 8 This is a schematic diagram of the structure of the fifth gas-liquid separation device shown in the embodiments of this application.
[0026] Figure 9 This is a schematic diagram of the sixth gas-liquid separation device shown in the embodiments of this application.
[0027] Figure 10 This is a schematic diagram illustrating the composition of a third type of pneumatic control system as shown in an embodiment of this application.
[0028] Figure 11 This is a schematic diagram of the structure of a semiconductor manufacturing equipment as shown in an embodiment of this application.
[0029] Figure 12 This is a schematic flowchart illustrating a control method for a pneumatic control system according to an embodiment of this application.
[0030] In the diagram: 1. First pipeline; 2. Second pipeline; 3. Negative pressure generating device; 31. First switching valve; 4. Gas-liquid separation device; 401. First interface; 402. Second interface; 403. Drain pipe; 404. Drain valve; 41. Chamber; 42. Partition structure; 421. Upper partition; 422. Lower partition; 4221. Connecting orifice; 5. Control module; 51. First liquid level sensor; 52. Second liquid level sensor; 6. Gas working fluid pipeline; 61. Second switching valve; 7. Atmospheric pressure pipeline; 71. Third switching valve; 8. Temperature control component; 9. Pressure sensor; 10. Actuator. Detailed Implementation
[0031] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.
[0032] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.
[0033] like Figure 1 As shown, this application embodiment first provides a pneumatic control system, including a first pipeline 1, a second pipeline 2, a negative pressure generating device 3, and a gas-liquid separation device 4.
[0034] The gas-liquid separation device 4 includes a first interface 401, a second interface 402, and a disconnectable drain pipe 403. The gas-liquid separation device 4 has a chamber 41 of a predetermined volume inside. The first interface 401 and the second interface 402 are located near the upper part of the chamber 41, and the drain pipe 403 is connected to the bottom of the chamber 41. The first pipe 1 is connected at both ends to the negative pressure port of the negative pressure generating device 3 and the first interface 401 of the gas-liquid separation device 4, respectively. One end of the second pipe 2 is connected to the second interface 402 of the gas-liquid separation device 4, and the other end is used to connect to the actuator 10.
[0035] The negative pressure generating device 3 can be a vacuum pump, which directly generates negative pressure. Alternatively, the negative pressure generating device 3 can be a negative pressure generator, which works in conjunction with an air compressor to create negative pressure. A drain valve 404 can be installed on the drain pipe 403, which allows the settled liquid in the chamber 41 to be drained by opening the drain valve 404. The negative pressure generating device 3 can be connected to the first pipeline 1 through the first switching valve 31. The magnitude of the negative pressure can be adjusted by changing the opening degree of the first switching valve 31, or the magnitude of the negative pressure can be directly changed by changing the operating state of the negative pressure generating device 3.
[0036] like Figure 10 As shown, if a seal failure occurs at actuator 10, under the negative pressure of negative pressure generating device 3, water vapor or liquid at actuator 10 will be drawn into the second pipe 2 and then into the chamber 41 of gas-liquid separator 4. The drawn liquid will be temporarily stored in chamber 41 to prevent it from directly entering the first pipe 1 and subsequent pipes, thus preventing corrosion and damage to the downstream precision pneumatic control components. Furthermore, the actuator 10 is used for semiconductor-related processes and is generally in a high-temperature environment, while the temperature in chamber 41 of gas-liquid separator 4 is generally much lower than that at actuator 10. Therefore, after water vapor is drawn into chamber 41, due to the relatively low temperature inside chamber 41, most of the water vapor will condense and settle at the bottom of chamber 41, thereby significantly reducing the water content of the gas drawn into the first pipe 1 and subsequent pipes, thus reducing the risk of corrosion and damage to the downstream precision pneumatic control components.
[0037] Therefore, it can be seen that the pneumatic control system of this embodiment, by setting up a gas-liquid separation device 4 with a chamber 41, can intercept the sucked liquid and settle most of the water vapor when a sealing failure occurs at the actuator 10, so as to prevent the liquid and water vapor from being transmitted to the rear end with the airflow, reduce the risk of corrosion and damage to the precision pneumatic control components at the rear end of the first pipeline 1, thereby delaying the direct impact of sealing failure on semiconductor equipment, helping to ensure process stability, ensure semiconductor processing yield, and also reduce maintenance workload and maintenance costs.
[0038] In existing technology, the vacuum generator is directly connected to the actuator via a gas pipe. If the actuator at the end fails to seal or experiences a minor failure, air leakage occurs. Since the vacuum generator and related precision air pressure control unit are connected to the actuator only by a gas pipe, leakage causes a significant drop in the negative pressure level within the pipeline, triggering rapid adjustment. This involves increasing the valve opening ratio to raise the negative pressure level within the pipeline and compensate for the lost negative pressure. However, because the negative pressure loss is relatively sudden, the valve opening of the vacuum generator and the gas pipe will increase to raise the negative pressure beyond the target pressure, and then rapidly decrease it to reach the target pressure. This process is repeated multiple times to compensate for the pressure changes caused by leakage. Therefore, in existing technology, air leakage at the actuator leads to sudden changes in the internal pressure of the pipeline, increased pressure fluctuations, longer adjustment time to the target pressure, lower efficiency, and greater difficulty in maintaining a steady state. Consequently, the downstream actuator remains in an unstable control state, affecting component lifespan and product process stability.
[0039] In the embodiments of this application, by setting up a gas-liquid separation device 4 with a chamber 41, when the entire system pressure is maintained before the process begins, if a problem occurs in the system, whether it is a pressure drop caused by air leakage or a system pressure rise caused by deformation of the actuator 10 due to system vibration, the actual fluctuation will be reduced by the buffering effect of the chamber 41 before being fed back to the precision air pressure control unit (such as valves). This is equivalent to smoothing the pressure fluctuation of the system with the help of the chamber 41, thereby shortening the pressure regulation range, achieving faster, more stable, and more precise maintenance of steady state, protecting the service life of components, and maintaining the stability of product process.
[0040] In some embodiments, such as Figures 2 to 8 As shown, the gas-liquid separation device 4 may also include a partition structure 42, which is disposed in the chamber 41 and located between the first interface 401 and the second interface 402, so as to extend the airflow path from the first interface 401 to the second interface 402, so that the liquid and water vapor can settle fully at the bottom of the chamber 41.
[0041] In some embodiments, such as Figure 3 and Figure 4 As shown, the gas-liquid separation device 4 may include a partition structure 42, which is connected to the top wall of the chamber 41 and extends downward from the top wall of the chamber 41, with a pre-reserved gap between the bottom end of the partition structure 42 and the inner bottom surface of the chamber 41. Gas containing water vapor is drawn into the chamber 41 through the second pipe 2 and will bypass the bottom of the partition structure 42, increasing the airflow path and the probability of collision between the water vapor in the gas and the partition structure 42 and the inner wall of the chamber 41, thus improving the water vapor settling effect.
[0042] In this embodiment, as Figures 2 to 4As shown, the air pressure control system also includes a control module 5 and a first liquid level sensor 51 and a second liquid level sensor 52 electrically connected to the control module 5; the first liquid level sensor 51 and the second liquid level sensor 52 are disposed within the chamber 41. The installation height of the first liquid level sensor 51 is not higher than the bottom end of the partition structure 42. The installation height of the second liquid level sensor 52 is higher than the first liquid level sensor 51 and lower than the height of the first interface 401. The control module 5 receives the liquid level signal from the first liquid level sensor 51 and issues a first alarm message, and receives the liquid level signal from the second liquid level sensor 52 and issues a second alarm message.
[0043] The first and second alarm messages can be displayed to staff via various types of audible and visual alarms or on a display screen. When the control module 5 receives the liquid level signal from the first liquid level sensor 51 and issues the first alarm message, it indicates that the liquid level in chamber 41 is about to approach the bottom of the partition structure 42. At this time, staff are alerted that if the liquid level in chamber 41 continues to rise, it will exceed the bottom of the partition structure 42, leading to a liquid seal. This seal would then obstruct the airflow between the first interface 401 and the second interface 402 of the gas-liquid separator 4, affecting the pressure stability within the gas pipe and causing other unpredictable consequences. In this case, staff are advised to drain the liquid from chamber 41 as quickly as possible through the drain pipe 403 to ensure the gas-liquid separator 4 can operate normally. In some embodiments, the current process generally needs to be stopped when draining the liquid from chamber 41 to prevent pressure fluctuations caused by the draining process from affecting process stability.
[0044] When the control module 5 receives the liquid level signal from the second liquid level sensor 52 and issues a second alarm message, it indicates that the liquid level in chamber 41 is almost close to the height of the first interface 401 of the gas-liquid separator 4. Further increases in liquid level may cause liquid to be drawn into the first pipeline 1 and transmitted to the downstream end. This situation may occur when the process solution at the actuator 10 is directly drawn into the gas-liquid separator 4, leading to a rapid rise in the liquid level in chamber 41. In this case, the operator needs to immediately stop the current process to prevent severe corrosion or damage to the equipment.
[0045] In some embodiments, such as Figure 5 and Figure 6 The gas-liquid separation device 4 may include multiple partition structures 42, which can further increase the airflow path and enhance the settling effect of water vapor in the chamber 41.
[0046] For example, the partition structure 42 includes at least an upper partition 421 and a lower partition 422. There are at least two upper partitions 421, arranged along the direction from the first interface 401 to the second interface 402. Each upper partition 421 is connected to the top wall of the chamber 41 and extends downwards from the top wall of the chamber 41 for a predetermined length. A lower partition 422 is provided between two adjacent upper partitions 421. The lower partition 422 is connected to the inner bottom surface of the chamber 41 and extends upwards from the inner bottom surface of the chamber 41 for a predetermined length. This arrangement allows the airflow carrying water vapor to travel in a reciprocating up-and-down path within the chamber 41, increasing the contact opportunities between water vapor and the walls of the chamber 41 and the surface of the partition structure 42. Furthermore, the relatively low temperature of the walls of the chamber 41 and the surface of the partition structure 42 allows the water vapor to condense and settle sufficiently.
[0047] In this embodiment, as Figure 5 As shown, the top height of the lower partition 422 can be higher than the bottom height of the upper partitions 421 on both sides.
[0048] In this embodiment, as Figure 6 As shown, the top height of the lower partition 422 can be lower than the bottom height of the upper partitions 421 on both sides.
[0049] Preferably, in this embodiment, such as Figure 7 As shown, in the lower partition 422 and the two adjacent upper partitions 421 on both sides, the top height of the lower partition 422 is lower than the bottom height of the upper partition 421 near the second interface 402, and the top height of the lower partition 422 is higher than the bottom height of the upper partition 421 near the first interface 401. See also Figure 7 The side of the lower partition 422 closest to the second interface 402 is called the right side, and the side of the lower partition 422 closest to the first interface 401 is called the left side. Thus, when the space on the right side of the lower partition 422 is filled with liquid, the liquid will overflow from the lower partition 422 to the left side. Since the top of the lower partition 422 is lower than the bottom of the upper partition 421 on the right side, there will be no liquid seal problem on the right side of the lower partition 422. Therefore, only the potential liquid seal problem on the left side of the lower partition 422 needs to be addressed. Furthermore, the larger volume on the right side of the lower partition 422 enhances its liquid storage capacity, and the longer extension of the upper partition 421 on the left side of the lower partition 422 further increases the airflow path and strengthens the water vapor settling capacity.
[0050] In this embodiment, as Figure 7As shown, the first liquid level sensor 51 and the second liquid level sensor 52 are disposed within the chamber 41 and near the first interface 401. The first liquid level sensor 51 is disposed at a height not higher than the bottom of all upper partitions 421. The second liquid level sensor 52 is disposed at a height higher than the first liquid level sensor 51 and lower than the first interface 401. The control module 5 receives the liquid level signal from the first liquid level sensor 51 and issues a first alarm message, and receives the liquid level signal from the second liquid level sensor 52 and issues a second alarm message.
[0051] When the first alarm is issued, it indicates that the liquid level on the far left of chamber 41 is about to approach the bottom of the upper left partition 421. This alerts the operator that if the liquid level in chamber 41 continues to rise, it will exceed the bottom of the upper partition 421, leading to a liquid seal. This seal would obstruct the smooth flow of air between the first interface 401 and the second interface 402 of the gas-liquid separator 4, affecting the pressure stability within the gas pipe and causing other unpredictable consequences. In this case, the operator is advised to drain the liquid from chamber 41 as quickly as possible using the drain pipe 403 to ensure the gas-liquid separator 4 can function normally. To ensure smooth drainage from both sides of the lower partition 422, drain pipes 403 and drain valves 404 are installed at the bottom of the spaces on both sides separated by the lower partition 422. When the second alarm is issued, it indicates that the liquid level in chamber 41 is almost at the height of the first interface 401 of the gas-liquid separator 4. At this point, the operator needs to immediately stop the current process to prevent severe corrosion or damage to the equipment.
[0052] In some embodiments, such as Figure 8 As shown, in the scheme where an upper partition 421 and a lower partition 422 are alternately arranged in the chamber 41, a connecting hole 4221 can be opened at the bottom of the lower partition 422 to allow the liquid holding spaces on the left and right sides of the lower partition 422 to be connected, thereby increasing the maximum liquid holding capacity of the chamber 41.
[0053] In some embodiments, such as Figure 9 As shown, the air pressure control system may further include a temperature control component 8, installed on the gas-liquid separation device 4, for regulating the temperature inside the chamber 41 to maintain it at the condensation temperature. The temperature control component 8 may be installed within the wall of the chamber 41 (e.g., bottom wall, side wall, etc.) and / or installed in a sandwich structure within the partition structure 42. The temperature control component 8 may be an array of pipe assemblies through which a refrigerant (e.g., low-temperature water or low-temperature gas) can be introduced. The refrigerant lowers the temperature of the temperature control component 8, thereby lowering the temperature of the inner wall of the chamber 41 and / or the partition structure 42. When water vapor contacts the inner wall of the chamber 41 and / or the surface of the partition structure 42, the low temperature accelerates water vapor deposition.
[0054] In some embodiments, such as Figure 10As shown, a first switching valve 31 is installed on the connecting pipeline between the negative pressure generating device 3 and the first pipeline 1. The pneumatic control system may also include a gas working fluid pipeline 6 and an atmospheric pressure pipeline 7. The gas working fluid pipeline 6 is connected to the first pipeline 1 through a second switching valve 61. For example, by opening the second switching valve 61, nitrogen gas can be input through the gas working fluid pipeline 6 to perform a leak test on the actuator 10. The atmospheric pressure pipeline 7 is connected to the first pipeline 1 through a third switching valve 71. By opening the third switching valve 71, the pressure between the first pipeline 1 and the second pipeline 2 can be rapidly depressurized.
[0055] In addition, a pressure sensor 9 can be connected to the first pipeline 1 to monitor the internal pressure of the pipeline. The signal from the pressure sensor 9 can be sent to relevant control components to control the opening and closing of valves and related processes.
[0056] like Figure 11 As shown, this application embodiment also provides a semiconductor manufacturing apparatus, including an actuator 10 and the aforementioned pneumatic control system. The actuator 10 is pneumatically driven and includes a pneumatic interface. The pneumatic interface of the actuator 10 is connected to the second interface 402 of the gas-liquid separation device 4 through the second pipeline 2 of the pneumatic control system.
[0057] like Figure 12 As shown in the embodiments of this application, a control method utilizing the aforementioned pneumatic control system is also provided, comprising:
[0058] S1. First, determine the trigger state of the second liquid level sensor 52, that is, determine whether the control module 5 receives the liquid level signal from the second liquid level sensor 52.
[0059] If the second liquid level sensor 52 is in the triggered state, the liquid level in the chamber 41 of the gas-liquid separator 4 is high, and an alarm signal to stop the process is directly issued, thereby stopping the relevant actions of the actuator 10 and ending the liquid level monitoring process to prevent leakage from being sucked into the downstream pipeline.
[0060] If the second liquid level sensor 52 is not triggered, that is, the control module 5 does not receive the liquid level signal from the second liquid level sensor 52, then proceed to the next step;
[0061] S2. Next, determine the trigger state of the first liquid level sensor 51, that is, determine whether the control module 5 has received the liquid level signal from the first liquid level sensor 51.
[0062] If the first liquid level sensor 51 is not triggered, that is, the control module 5 does not receive the liquid level signal from the first liquid level sensor 51, it sends a signal to continue monitoring and re-enters step S1 after a preset time interval.
[0063] If the first liquid level sensor 51 is in the triggered state, there is already a certain amount of liquid in the chamber 41 of the gas-liquid separator 4. If the liquid level continues to rise, there is a risk. At this time, an alarm signal is sent to the staff to ask whether to stop the process and proceed to the next step.
[0064] S3. Upon receiving the alarm signal asking "Stop the process?", and based on the actual situation, select one of the following three operating modes:
[0065] First, if it is determined that the airtightness problem at the actuator 10 will not affect the process stability, the alarm can be ignored and the process can continue. That is, the first liquid level sensor 51 is reset to the non-triggered state, and a signal to continue monitoring is issued. After a preset time interval, the process re-enters step S1.
[0066] Second, if it is determined that the airtightness problem at the actuator 10 will seriously affect the stability of the process, the current process can be terminated directly, thereby stopping the relevant actions of the actuator 10 and ending the liquid level monitoring process.
[0067] Third, if it is determined that the airtightness problem at the actuator 10 will affect the stability of the process, but is sufficient to complete the current process, then the actuator 10 can be stopped after the current process is completed, and the liquid level monitoring process can be terminated.
[0068] The above description is only a partial embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.
Claims
1. A pneumatic control system, characterized in that, It includes a first pipeline (1), a second pipeline (2), a negative pressure generating device (3), and a gas-liquid separation device (4); The gas-liquid separation device (4) includes a first interface (401), a second interface (402), and a drain pipe (403) that can be switched on and off. The gas-liquid separation device (4) has a chamber (41) of a predetermined volume inside. The first interface (401) and the second interface (402) are close to the upper part of the chamber (41), and the drain pipe (403) is connected to the bottom of the chamber (41). The first pipeline (1) is connected at both ends to the negative pressure port of the negative pressure generating device (3) and the first interface (401) of the gas-liquid separation device (4); One end of the second pipeline (2) is connected to the second interface (402) of the gas-liquid separation device (4), and the other end is used to connect to the actuator (10).
2. The pneumatic control system according to claim 1, characterized in that, The gas-liquid separation device (4) further includes a partition structure (42), which is disposed in the chamber (41) and located between the first interface (401) and the second interface (402) to extend the airflow path from the first interface (401) to the second interface (402).
3. The pneumatic control system according to claim 2, characterized in that, The partition structure (42) is connected to the top wall of the chamber (41) and extends downward from the top wall of the chamber (41), and a gap is reserved between the bottom end of the partition structure (42) and the inner bottom surface of the chamber (41).
4. The pneumatic control system according to claim 3, characterized in that, It also includes a control module (5) and a first liquid level sensor (51) and a second liquid level sensor (52) electrically connected to the control module (5); the first liquid level sensor (51) and the second liquid level sensor (52) are disposed in the chamber (41); The first liquid level sensor (51) is installed at a height not higher than the bottom end of the partition structure (42); The second liquid level sensor (52) is set at a height higher than the first liquid level sensor (51) and lower than the height of the first interface (401); The control module (5) receives the liquid level signal from the first liquid level sensor (51) and issues a first alarm message, and receives the liquid level signal from the second liquid level sensor (52) and issues a second alarm message.
5. The pneumatic control system according to claim 2, characterized in that, The partition structure (42) includes at least an upper partition (421) and a lower partition (422); The number of the upper partition (421) is at least two, arranged along the direction from the first interface (401) to the second interface (402), and the upper partition (421) is connected to the top wall of the chamber (41) and extends downward from the top wall of the chamber (41) for a predetermined length; A lower partition (422) is provided between two adjacent upper partitions (421), the lower partition (422) is connected to the inner bottom surface of the chamber (41) and extends upward from the inner bottom surface of the chamber (41) by a predetermined length.
6. The pneumatic control system according to claim 5, characterized in that, In the lower partition (422) and the two upper partitions (421) adjacent to it on both sides, the top height of the lower partition (422) is lower than the bottom height of the upper partition (421) near the second interface (402), and the top height of the lower partition (422) is higher than the bottom height of the upper partition (421) near the first interface (401).
7. The pneumatic control system according to claim 5, characterized in that, It also includes a control module (5) and a first liquid level sensor (51) and a second liquid level sensor (52) electrically connected to the control module (5); the first liquid level sensor (51) and the second liquid level sensor (52) are disposed in the chamber (41) and close to the first interface (401); The first liquid level sensor (51) is installed at a height not higher than the bottom of all the upper partitions (421); The second liquid level sensor (52) is positioned at a height higher than the first liquid level sensor (51) and lower than the first interface (401); The control module (5) receives the liquid level signal from the first liquid level sensor (51) and issues a first alarm message, and receives the liquid level signal from the second liquid level sensor (52) and issues a second alarm message.
8. The pneumatic control system according to claim 1, characterized in that, A first switching valve (31) is installed on the connecting pipe between the negative pressure generating device (3) and the first pipeline (1); The air pressure control system also includes an atmospheric pressure pipeline (7), which is connected to the first pipeline (1) through a third switching valve (71).
9. The pneumatic control system according to any one of claims 1 to 8, characterized in that, The air pressure control system also includes a temperature control component (8), which is installed on the gas-liquid separation device (4) and is used to regulate the temperature inside the chamber (41) to maintain it at the condensation and liquefaction temperature.
10. A semiconductor manufacturing apparatus, characterized in that, Includes an actuator (10) and a pneumatic control system as described in any one of claims 1 to 9; The actuator (10) is pneumatically driven and includes a pneumatic interface; The pneumatic interface of the actuator (10) is connected to the second interface (402) of the gas-liquid separator (4) through the second pipeline (2) of the pneumatic control system.