Planar plasma diagnostic device, wafer plasma diagnostic device in which a planar plasma diagnostic device is embedded, and electrostatic chuck in which a planar plasma diagnostic device is embedded
Patent Information
- Application Number
- DE602019075683
- Authority / Receiving Office
- DE · DE
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2019-03-21
- Filing Date
- 2019-04-15
- Publication Date
- 2025-09-10
- Estimated Expiration
- 2039-04-15
AI Technical Summary
Existing plasma diagnosis methods face challenges in accurately measuring plasma density due to structural interference, low signal intensity, and resonance signals caused by the insertion of frequency probes, leading to unreliable measurements.
A planar-type plasma diagnosis apparatus with insulated transmission and reception antennas, buried in a wafer-shaped circular member or electrostatic chuck, enhances capacitive coupling and minimizes structural interference, allowing for real-time plasma density measurement.
Enables reliable plasma density measurement by increasing signal intensity and preventing resonance signals, while minimizing structural changes in the plasma chamber, facilitating real-time monitoring during the plasma process at low cost.