Polishing composition of oxide-based substrate containing chelate agent

JP2023156721A5Active Publication Date: 2025-03-28NISSAN CHEM CORP
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Patent Information

Application Number
JP2022066245
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2022-04-13
Publication Date
2025-03-28
Estimated Expiration
2042-04-13

AI Technical Summary

Technical Problem

Existing polishing compositions for lithium tantalate and lithium niobate substrates have slow polishing rates due to their high hardness and chemical stability, leading to low productivity and sustainability issues in achieving thin films for high-performance surface acoustic wave devices.

Method used

A polishing composition comprising silica particles, a chelating agent with acidic OH groups or its salt, and an alkaline substance, with controlled ratios of sodium ions to acidic OH groups, and specific particle size distributions of silica particles, is used to enhance polishing efficiency.

Benefits of technology

The composition achieves a high polishing rate and sustainability, ensuring smooth polishing without surface irregularities, thereby improving productivity and film thickness for enhanced device performance.

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Abstract

To provide a polishing composition for polishing, at a high polishing speed, an oxide-based substrate having high hardness such as lithium tantalate or lithium niobate and a polishing method thereof.SOLUTION: A composition for polishing an oxide-based substrate containing silica particles, a chelating agent, an alkaline substance, and water, wherein the chelating agent has an acidic OH group or a salt thereof, and the ratio of the OH group or the salt thereof and sodium ions (Na): (number of moles of Na ions) / (number of moles of acidic OH groups or their salts) is 0 to 1.10. The proportion of silica particles having an equivalent circle diameter of 1 nm or more and less than 50 nm as determined by transmission electron microscope image analysis is 5 to 45 vol.%, and the proportion of silica particles having an equivalent circle diameter of 50 nm or more and 250 nm or less is 55 to 95 vol.%. The chelating agent is a compound containing 2 to 12 acidic OH groups or salts thereof in the molecule. The oxide-based substrate is a lithium tantalate substrate or a lithium niobate substrate.SELECTED DRAWING: None
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