Apparatus and method for filtering measurement radiation - Patents.com

The apparatus addresses the challenges of measuring small features and structural parameters in lithographic processes by using a source assembly, a curved filter, and detectors to accurately filter and measure radiation, resulting in enhanced accuracy and sensitivity.

JP2025507847APending Publication Date: 2025-03-21ASML NETHERLANDS BV
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Patent Information

Application Number
JP2024551966
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2022-03-25
Filing Date
2023-02-06
Publication Date
2025-03-21

AI Technical Summary

Technical Problem

Existing measurement tools in lithographic processes struggle to accurately measure small features and structural parameters due to limitations in wavelength range, noise from unwanted radiation, and the inability to penetrate deep into the substrate.

Method used

An apparatus is developed that includes a source assembly for providing measurement radiation with specific wavelengths, a filter with a curved film to transmit desired wavelengths while removing unwanted radiation, and detectors to measure the filtered radiation, thereby enhancing the accuracy and sensitivity of structural parameter measurements.

Benefits of technology

The apparatus effectively measures structural parameters with high accuracy and sensitivity, reducing noise from unwanted radiation and allowing for the analysis of smaller features and deeper substrate penetration.

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Abstract

An apparatus for measuring a parameter of a structure associated with a semiconductor manufacturing process. The apparatus comprises a source assembly configured to provide measurement radiation having one or more first wavelengths for illuminating a structure on a substrate. The apparatus further comprises a filter configured to receive scattered measurement radiation scattered from the structure, the filter configured to transmit the scattered measurement radiation of the one or more first wavelengths and to reject radiation of one or more second wavelengths. The filter comprises a membrane having a curvature in at least one direction. The apparatus further comprises a plurality of detectors disposed downstream of the filter and configured to detect the filtered scattered radiation configured to measure the parameter of the structure.
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