3D shape measuring device

The integration of a binary phase filter in a three-dimensional shape measuring device addresses the trade-off between resolution and depth of field, enabling high-resolution, deep-depth-of-field measurements suitable for industrial applications.

JP2025508149AActive Publication Date: 2025-03-21KOHYOUNG TECH +1
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Patent Information

Application Number
JP2024554247
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2022-03-11
Filing Date
2023-03-10
Publication Date
2025-03-21
Estimated Expiration
2043-03-10

AI Technical Summary

Technical Problem

Existing three-dimensional shape measuring devices face a trade-off between resolution and depth of field, where increasing the depth of field results in lower resolution, and higher resolution leads to a shallower depth of field.

Method used

The use of a three-dimensional shape measuring device equipped with a binary phase filter, which includes a first portion with patterns extending circumferentially about the optical axis and a second portion with different thicknesses, allows for an extended depth of field without compromising resolution.

Benefits of technology

This configuration enables high-resolution three-dimensional shape measurements with a deep depth of field, allowing for non-contact measurements and real-time capture of surface changes, while maintaining high image quality over a larger area.

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Abstract

A three-dimensional shape measuring apparatus according to one embodiment includes a projector that irradiates a pattern light onto the target object; and an imaging device configured to image the target object, the imaging device including an optical system including at least one lens defining an optical axis, and a binary phase filter arranged on the optical axis of the optical system to transmit light, and configured to form an image using light that has passed through the at least one lens and the binary phase filter. The binary phase filter includes a first portion including at least one pattern extending in a circumferential direction around the optical axis, and a second portion separated from the first portion. The first portion and the second portion have different thicknesses in the optical axis direction.
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