Resist composition and method for producing resist patterns, as well as salt and acid generator

JP2026097768APending Publication Date: 2026-06-16SUMITOMO CHEM CO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
SUMITOMO CHEM CO LTD
Filing Date
2025-12-03
Publication Date
2026-06-16

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Abstract

良好なパターン倒れ耐性評価を有するレジストパターンを製造し得る塩及びレジスト組成物等を提供すること。【解決手段】式(I)で表される塩を含む酸発生剤及びレジスト組成物等。TIFF2026097768000170.tif60136[式中、Q1、Q2、R1及びR2はそれぞれ水素原子、フッ素原子、ペルフルオロアルキル基又はアルキル基を表す。zは0~6のいずれかの整数を表す。X0は、単結合、-O-、-CO-、-NR13-等又はこれらを組み合わせた基を表す。等々。]
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