Plasma generating electrodes, plasma generating devices, and purification equipment

Abstract

This application proposes a plasma generating electrode, a plasma generating device, and a purification device in the field of separation and purification, wherein a perforated structure is provided in at least a portion of the plasma generating electrode. According to the technical solution of this application, the covering area of ​​the plasma generated by the plasma generating device can be increased, thereby improving the purification effect.

Description

Technical Field

[0001] (Cross - reference to related applications) This application claims the priority of a Chinese patent application with an application number of 202310859027.5, filed on July 13, 2023, and incorporates all of its contents herein by reference.

[0002] This application relates to the technical field of separation and purification, and particularly relates to electrodes for plasma generation, plasma generation devices, and purification equipment.

Background Art

[0003] In related technologies, many electrodes for generating plasma are flat electrodes. In such plasma generation devices, the coverage area of the generated plasma is small, usually on the order of micrometers, and it is impossible to effectively purify air, water, or other objects.

Summary of the Invention

Problems to be Solved by the Invention

[0004] The main object of this application is to provide an electrode for plasma generation, a plasma generation device, and a purification device that can increase the coverage area of the plasma generated by the plasma generation device and improve the purification effect.

Means for Solving the Problems

[0005] To achieve the above object, this application proposes an electrode for plasma generation, and a watermark structure is provided in at least a part of the area of the electrode for plasma generation.

[0006] In one embodiment of this application, the minimum distance between any point within a part of the watermark position of the electrode for plasma generation and the watermark edge is d, and d satisfies d ≤ 2.5 mm.

[0007] In one embodiment of this application, the watermark structure is formed on the entire electrode for plasma generation.

[0008] In one embodiment of the present invention, the plasma generating electrode is provided as a cylindrical structure with a perforated surface, and a mounting space is formed within the cylindrical structure.

[0009] In one embodiment of the present invention, the plasma generating electrode includes at least one helical electrode.

[0010] In one embodiment of the present invention, the plasma generating electrode includes two helical electrodes that intersect each other and rotate in opposite directions. And / or, the helical electrode is a metal wire or metal flat bar extending in a spiral shape.

[0011] In one embodiment of the present invention, the plasma generating electrode includes at least two strip electrodes arranged in parallel.

[0012] In one embodiment of the present invention, the plasma generating electrode further includes a connecting electrode, the connecting electrode is provided at an angle to the strip electrode and is connected to each of the strip electrodes. And / or, the strip electrode is a metal wire or a metal flat bar.

[0013] In one embodiment of the present invention, the plasma generating electrode is a plate-shaped electrode having a plurality of perforations formed therein. Alternatively, the plasma generating electrode is a mesh electrode.

[0014] In one embodiment of the present invention, the plasma generating electrode includes a plurality of dot-shaped electrodes arranged in a dot matrix, And / or, the plasma generating electrode includes a plurality of block-shaped electrodes arranged in a dot matrix pattern.

[0015] This application further proposes a plasma generator, the plasma generator being: The first electrode and A dielectric layer provided on the surface of the first electrode, The device includes a second electrode which is provided on the side of the dielectric layer away from the first electrode and covers at least a portion of the dielectric layer, and is one of the plasma generating electrodes described above.

[0016] In one embodiment of the present invention, the first electrode is a linear electrode, and the second electrode is provided in the circumferential direction of the first electrode so as to surround the first electrode.

[0017] In one embodiment of the present invention, the voltage U applied by the plasma generator to the second electrode satisfies U ≤ 3kV.

[0018] This application further proposes a purification device including the plasma generator described above.

[0019] (Beneficial effects) According to the technical solution of the present invention, a plasma generating electrode having a perforated structure is provided and the plasma generating electrode is exposed to the environment to be purified, and this can be applied to a plasma generating device. By making a portion of the plasma generating electrode exposed to the environment to be purified perforated, the external extension length of the electrode is equivalently increased assuming the same amount of material is used, and at the location of the perforated structure, the plasma covering areas generated by the portion of the electrode that surrounds and forms the perforated area are connected to each other, reducing the overlapping plasma covering areas. As a result, the plasma generating device can achieve a larger plasma covering area when the same discharge voltage is applied. Sufficient contact between the generated plasma and substances such as external air and water is ensured, effectively purifying and disinfecting air, water, textiles, skin, material surfaces, etc., and improving the purification effect.

[0020] To more clearly illustrate the embodiments of the present application and the technical solutions of the prior art, the accompanying drawings required for the description of the embodiments or the prior art will be briefly described below. It is clear that the accompanying drawings in the following description are only some embodiments of the present application, and those skilled in the art can obtain other accompanying drawings based on the structures shown in these accompanying drawings without creative labor.

Brief Description of the Drawings

[0021] [Figure 1] It is a structural diagram of the first embodiment of the plasma generation device of the present application. [Figure 2] It is a structural diagram of the second embodiment of the plasma generation device of the present application. [Figure 3] It is a structural diagram of an embodiment in which the plasma generation electrode of the present application has a strip mesh structure. [Figure 4] It is a structural diagram of the third embodiment of the plasma generation device of the present application. [Figure 5] It is a structural diagram of an embodiment in which the plasma generation electrode of the present application has a plate structure with holes. [Figure 6] It is a structural diagram of the fourth embodiment of the plasma generation device of the present application. [Figure 7] It is a structural diagram of the fifth embodiment of the plasma generation device of the present application. [Figure 8] It is a structural diagram of an embodiment in which the plasma generation electrode of the present application has a mesh structure. [Figure 9] It is a structural diagram of the sixth embodiment of the plasma generation device of the present application. [Figure 10] It is a structural diagram of another embodiment in which the plasma generation electrode of the present application has a mesh structure. [Figure 11] It is a structural diagram of the seventh embodiment of the plasma generation device of the present application. [Figure 12] It is a structural diagram of an embodiment of the partial watermark structure of the plasma generation electrode of the present application. [Figure 13] It is a structural diagram of the eighth embodiment of the plasma generation device of the present application. [Figure 14] It is a structural diagram of the ninth embodiment of the plasma generation device of the present application. [Figure 15] This is a structural diagram of the tenth embodiment of the plasma generator of the present invention. [Figure 16] This is a structural diagram of the 11th embodiment of the plasma generator of the present invention. [Figure 17] This is a structural diagram of the twelfth embodiment of the plasma generator of the present invention. [Modes for carrying out the invention]

[0022] The achievement of the objectives of this application, its functional features, and advantages will be further explained in conjunction with the attached drawings and embodiments.

[0023] The following describes the technical proposal in the embodiments of this application clearly and completely, in conjunction with the drawings of the embodiments. It is clear that the embodiments described are not all embodiments of this application, but only a selection of embodiments. All other embodiments that can be obtained by a person skilled in the art without creative work based on the embodiments of this application are within the scope of protection of this application.

[0024] Furthermore, all directional indicators in the embodiments of this application (e.g., up, down, left, right, front, back, etc.) are used solely to describe the relative positional relationships and movement patterns between each component in a specific orientation (as shown in the attached drawings). If this specific orientation changes, the directional indicators will also change accordingly.

[0025] In this application, unless otherwise clearly specified or limited, terms such as "connection" and "fixed" should be understood in a broad sense. For example, "fixed" may refer to a fixed connection, a removable connection, a single unit, a mechanical connection, an electrical connection, a direct connection, an indirect connection through an intermediate mediator, or a communication between two elements or an interaction relationship between two elements. A person skilled in the art will be able to understand the specific meaning of the above terms in this application based on the specific situation.

[0026] Furthermore, in the embodiments of this application, descriptions such as "First," "Second," etc., are used solely for explanatory purposes and should not be understood as indicating or implying their relative importance, or implicitly specifying the number of technical features to be presented. For this reason, features limited to "First" and "Second" may include at least one such feature explicitly or implicitly. Also, the technical ideas of each embodiment can be combined with each other as long as they can be realized by a person skilled in the art. If a combination of technical ideas results in a contradiction or is not feasible, it should be understood that such a combination of technical ideas does not exist and is not within the scope for which this application seeks protection.

[0027] This invention proposes a plasma generating electrode 10 to be applied to a plasma generator 100. The operating principle of the plasma generator 100 is to form a positive or negative voltage between two electrodes, and the dielectric layer 50 between the two electrodes forms a dielectric to prevent discharge. When a sufficiently strong voltage is applied between the two electrodes, the air between the electrodes is ionized, generating plasma. The generated plasma propagates from the plasma generating electrode 10 along the surface of the dielectric for a certain distance, covering the area around the plasma generating electrode 10, purifying the air, water, fabric, skin, and material surfaces that come into contact with it, and removing any toxic or harmful substances it contains. Furthermore, the plasma generator 100 is applicable to purification equipment; for example, it can be applied to air conditioners, air purifiers, and floor cleaning machines to reduce toxic or harmful substances contained in the air blown out from air conditioners and air purifiers, and to purify, sterilize, and disinfect the cleaning water in floor cleaning machines. Of course, it may also be applied to other purification equipment for purifying and disinfecting fabrics, skin, or material surfaces, and is not limited thereto.

[0028] Referring to Figures 1 to 13, in some embodiments of the present invention, at least a portion of the plasma generating electrode 10 is made of a perforated structure.

[0029] In this embodiment, at least a portion of the plasma generating electrode 10 is made into a perforated structure. The plasma generating electrode 10 is made of a rigid material and may be formed as a plate-shaped electrode with perforations, or as a plurality of dot-block-shaped electrodes arranged at intervals. The plasma generating electrode 10 may also be made of a metal material that is bendable and easily plastically deformable. For example, a mesh electrode may be formed by weaving together metal wires, metal strips, metal wires, etc., or a spiral structure or a structure of any shape may be formed by winding them. On the other hand, the perforated structure may be one or at least two perforations arranged at intervals. The perforations may be circular holes, square holes, or other regular or irregular shapes, and may be meshes on a mesh electrode, interlayer gaps in a spiral electrode, or the space between adjacent dot-block-shaped electrodes when the plasma generating electrode 10 includes a plurality of dot-block-shaped electrodes arranged at intervals. Alternatively, the perforated structure may be provided only in a portion of the plasma generating electrode 10, while the other portion is a complete and continuous electrode surface. In other words, the plasma generating electrode 10 has a complete electrode surface within a limited area. In this case, with the same amount of material used, the molding area or length of the plasma generating electrode 10 can be increased by providing a perforated structure. Conversely, in the same purification environment, the amount of material used for the plasma generating electrode 10 can be reduced by providing a perforated structure.

[0030] On the other hand, regarding the plasma coating region formed by the plasma generating electrode 10, when the plasma generator 100 generates plasma, the plasma propagates from the plasma generating electrode 10 along the dielectric surface for a certain distance, coating the area around the plasma generating electrode 10. Note that a planar electrode without a perforated structure corresponds to a configuration in which multiple linear electrodes or dot-block electrodes are arranged without gaps. In this case, the plasma coating region formed around each linear electrode or dot-block electrode overlaps with the plasma coating region formed by adjacent electrodes. However, in the plasma generating electrode 10 proposed in this embodiment, at the perforated structure location, adjacent linear or dot-block electrodes are arranged with the perforation location in between. Because the plasma diffuses along the dielectric surface onto the perforated region, the overlapping area of ​​adjacent plasma coating regions is reduced, and the plasma coating regions formed by adjacent electrodes can connect to each other. As a result, the plasma generator 100 can achieve a larger plasma coating area when the same discharge voltage is applied. The plasma within the plasma coating region formed around each electrode is fully utilized. By ensuring sufficient contact between the generated plasma and external materials such as air and water, the system effectively purifies and disinfects materials such as air, water, and textiles, thereby improving the purification effect.

[0031] In this embodiment, the plasma generating electrode 10 may have a perforated structure in only a portion of its area, as shown in Figures 12 and 13. Alternatively, the perforated structure may be formed over the entire plasma generating electrode 10. When the perforated structure is formed over the entire plasma generating electrode 10, the plasma covering area at each position of the plasma generating electrode 10 can be fully utilized, thereby improving the efficiency of plasma utilization. However, in some embodiments, considering factors such as the ease of connecting the plasma generating electrode 10 to an external power supply, or the ease of mounting the plasma generating electrode 10, as well as the strength and stability of the mounting, a portion of the plasma generating electrode 10 may be provided as a complete planar electrode area. This allows for a larger plasma covering area, improving the efficiency of plasma utilization while meeting other usage or mounting needs.

[0032] Therefore, according to the technical solution of the present invention, a plasma generating electrode 10 having a perforated structure is provided and the plasma generating electrode 10 is applied to the plasma generating device 100 so as to expose the plasma generating electrode 10 to the environment to be purified. By making a portion of the plasma generating electrode 10 exposed to the environment to be purified perforated, the external extension length of the electrode is equivalently increased assuming the same amount of material is used, and at the location of the perforated structure, the plasma covering areas generated by the portion of the electrode that surrounds and forms the perforated position are connected to each other, reducing the overlapping plasma covering areas. As a result, the plasma generating device 100 can achieve a larger plasma covering area when the same discharge voltage is applied. Sufficient contact between the generated plasma and substances such as external air and water is ensured, effectively purifying and disinfecting air, water, textiles, skin, material surfaces, etc., and improving the purification effect.

[0033] In one embodiment of the present invention, the minimum distance between any point within the perforation area of ​​a portion of the plasma generating electrode 10 and the perforation edge is d, satisfying the condition d ≤ 2.5 mm.

[0034] According to this invention, a perforated structure is provided on the plasma generating electrode 10 in order to reduce the overlapping portion of the plasma covering area between electrodes and to obtain a larger plasma covering area. In addition, a perforated edge is formed by the electrode at each perforated position within the perforated structure, and the plasma within the perforated position is formed to diffuse inward from the electrode at the perforated edge. In this embodiment, the distance between any point within a perforated position of a part of the perforated structure and the electrode at the nearest perforated edge is limited to d ≤ 2.5 mm, and within the range that guarantees the safety of electrical use, the maximum length over which the plasma generated when the applied voltage reaches its maximum value diffuses outward from the electrode is about 2.5 mm. Therefore, if there is a position within the perforated position where the distance to the nearest perforated edge exceeds the plasma diffusion length, the generated plasma covering area is likely to not be able to completely cover the surface of the dielectric layer 50 at the perforated position. That is, if the outer electrode volume or total covering area is the same, some of the gaps in the perforated position will not be covered by the plasma. By setting the distance d between any point within the perforation area and the electrode on the edge of the perforation closest to it to 2.5 mm or less, the generated plasma region can cover the perforation area when the maximum applied voltage does not exceed safe power usage conditions, thereby achieving a good purification effect within the range of the perforation area. Here, the value of d can be set according to the applied voltage value, for example, to 0.1 mm, 0.5 mm, 1 mm, 1.5 mm, 2 mm, or 2.5 mm, or any value within 2.5 mm. Of course, with advances in technology, those skilled in the art may adjust the value of d according to different conditions, such as the material of the plasma generating electrode 10, the material of the dielectric layer 50, the plasma generation environment, and changes in the range of applicable voltage values, and may use other sizes that have a similar effect to 2.5 mm under different conditions, or it may be larger than 2.5 mm.

[0035] When generating plasma by applying voltage to the two electrodes of the plasma generator 100, a higher voltage results in a larger plasma coverage area. However, excessively high voltage not only increases energy consumption but also significantly increases the technical risks during operation. Furthermore, there are limits to how much the plasma coverage area can be improved by increasing the voltage. On the other hand, applying a low voltage of 3kV or less to the plasma generator 100 results in lower technical risks and relatively low power consumption. By observing the surface of the plasma generator 100 during discharge, it is possible to determine whether the plasma completely covers the surface of the dielectric layer 50. If the electron density of the entire surface of the dielectric layer 50 is greater than 1.0*10¹⁸, a uniform purple light is observed on the surface of the plasma generator 100. Since the purple light can completely cover the surface of the plasma generator 100, it can be determined that the dielectric layer 50 is completely covered by plasma. If the electron density of the entire surface of the dielectric layer 50 is less than 1.0*10¹⁸, the purple light cannot uniformly cover the surface of the plasma generator 100, and dark stripes clearly extending along the external electrodes are observed. If the minimum distance between any point in the perforation position and the external electrode is less than 2.5 mm, then if a critical value of 2.5 mm is taken, the plasma can cover the entire dielectric layer 50 with a voltage of 3 kV. If it exceeds 2.5 mm, it becomes difficult for the plasma reactor to achieve complete coverage with a voltage of 3 kV or less. If the voltage is increased further, there will inevitably be a high voltage at which the dielectric layer 50 of the plasma generator 100 is completely covered by the plasma. However, if the voltage is too high, energy consumption increases, technical risks increase significantly, and serious adverse effects on manufacturing and practical applications occur. However, as technology advances, the voltage range that can be operated safely may gradually increase. In that case, the value of d in the perforation position may be appropriately increased so that the effect of complete coverage can be obtained even when d exceeds 2.5 mm. In other words, in this embodiment, by limiting the maximum value of the gap d between any point within the perforation position and the perforation edge to 2.5 mm, under the current safe voltage of 3 kV or less, the generated plasma can completely cover the surface of the plasma generator 100 in low-voltage and low-energy-consumption application environments, thereby achieving the maximum plasma coverage area.

[0036] Furthermore, when all points at each perforation position in the perforation structure of the plasma generating electrode 10 satisfy the above dimensional limitations, the perforation structure of the plasma generating electrode 10 can be completely covered with plasma, achieving a superior purification effect. However, even if only some of the perforation positions in the perforation structure satisfy the above dimensional limitations, the purification effect of the plasma generator 100 can be improved to some extent.

[0037] Referring to Figure 5, in one embodiment of the present invention, the perforated structure is formed over the entire plasma generating electrode 10.

[0038] In this embodiment, a perforated structure is formed on the entire surface of the plasma generating electrode 10. For example, a plate-shaped electrode or cylindrical electrode with uniformly formed holes may be used, a mesh electrode or a helical electrode may be used, or a plurality of dot-block-shaped electrodes arranged in a matrix may be used. That is, the plasma generating electrode 10 is divided into multiple regions of a predetermined size so that each region has a perforated structure. This makes it possible to fully utilize the plasma-covered area at each position of the plasma generating electrode 10, and with the same voltage and materials used, the plasma generating electrode 10 can have a longer external extension length, achieve a larger plasma-covered area, and further improve the plasma utilization efficiency. Here, the perforated structure provided on the plasma generator 100 may be uniformly distributed as shown in Figures 3 to 11, or non-uniformly distributed as shown in Figures 14 to 17, and is not limited thereto.

[0039] Referring to Figures 1 and 2, in one embodiment of the present invention, the plasma generating electrode 10 is provided so as to surround the tubular structure with perforations formed on its surface, and a mounting space is formed within the tubular structure.

[0040] The plasma generator 100 includes a first electrode 30, a dielectric layer 50, and a second electrode. The plasma generating electrode 10 proposed in the embodiment of this application is used as the second electrode, and the dielectric layer 50 is provided between the first electrode 30 and the second electrode to form a dielectric and prevent discharge. In this embodiment, both the first electrode 30 and the dielectric layer 50 are provided within the second electrode, and the dielectric layer 50 is provided so as to surround the first electrode 30. The plasma generating electrode 10, which is the second electrode, is a cylindrical structure with a perforated surface that surrounds the dielectric layer 50, and its cross-section may be any external shape such as circular, elliptical, rectangular, triangular, or other polygonal. The cylindrical structure with a perforated surface may be a helical electrode made by winding a metal wire, a mesh electrode provided to surround it, a cylindrical electrode structure with holes, or a plurality of dot block-shaped electrode structures provided to surround it, and is not limited thereto. With this configuration, the plasma generator 100 forms a coaxial surrounding structure and has a three-dimensional structure. As a result, even when the volume of the first electrode 30 is constant, the surface area of ​​the first electrode 30 can be fully utilized, and the discharge region between the first electrode 30 and the second electrode can be made relatively larger. Alternatively, when the discharge region area of ​​the plasma generator 100 is constant, by fully utilizing the surface area of ​​the first electrode 30, the volume of the first electrode 30 can be made relatively small, and furthermore, the volumes of the dielectric layer 50 and the second electrode can also be made relatively small, ultimately making the volume of the plasma generator of the present invention more compact while improving its purification performance.

[0041] Furthermore, when using the plasma generating electrode 10 of this embodiment, and when it is a helical electrode, a mesh electrode, or a dot block electrode, the dielectric layer 50 can function as a mounting base for the plasma generating electrode 10, and may be made of a rigid or flexible material that is easily plastically deformable, so that the plasma generating electrode 10 can be plastically deformed into the required structural form using the dielectric layer 50 as a base.

[0042] Referring to Figure 1, in one embodiment of the present invention, the plasma generating electrode 10 includes at least one helical electrode.

[0043] This embodiment is one embodiment of the plasma generating electrode 10, in which a single helical electrode may be formed by winding a single metal wire or metal flat bar around the outside of the dielectric layer 50, or at least two helical electrodes may be wound around the outside of the dielectric layer 50, the rotation direction of the two helical electrodes may be the same, or the rotation direction may be opposite so that the two helical electrodes intersect, as in the following embodiment. A gap is formed between adjacent layers of the helical electrode. In some embodiments, the minimum distance between any point in a part of the gap of the plasma generating electrode 10 and the edge of the gap is limited as size d. In this case, for a single helical electrode, by making the pitch between adjacent layers 2d or less, it is ensured that the minimum distance between any point between adjacent layers and the helical electrode satisfies the above-mentioned dimensional limitation, thereby ensuring that the generated plasma can cover the gap between layers and improving the purification effect.

[0044] Referring to Figure 2, in one embodiment of the present invention, the plasma generating electrode 10 includes two helical electrodes that intersect each other and rotate in opposite directions.

[0045] This embodiment is one example of a plasma generation electrode 10, which has a double helix structure, with two helical electrodes intersecting each other and rotating in opposite directions. Similarly, the area not covered by the helical electrode is the perforated region, and within the perforated region, the inner dielectric layer 50 is exposed. When plasma is generated, it diffuses from the helical electrode along the surface of the dielectric layer 50 into the perforated region, covering the region, increasing the contact area between the plasma and external substances such as air or water, resulting in a good purification effect.

[0046] In one embodiment of the present invention, the helical electrode is a metal wire or metal flat bar extending in a spiral shape. Of these, the helical electrode formed using a metal wire requires less material, and under the same discharge voltage conditions, it is possible to achieve a better plasma coating effect while significantly reducing the amount of material used. On the other hand, by winding a metal flat bar to form the helical electrode 11, the contact area between the plasma generating electrode 10 and the dielectric layer 50 is increased, improving the structural strength and stability when the plasma generating electrode 10 is wound around the dielectric layer 50, preventing slippage of the plasma generating electrode 10, and ensuring the performance stability of the plasma generator.

[0047] Referring to Figures 3 and 4, in one embodiment of the present invention, the plasma generating electrode 10 includes at least two strip electrodes 11 arranged in parallel.

[0048] This embodiment is another embodiment of the plasma generating electrode 10, comprising at least two strip electrodes 11 arranged in parallel, with the gap between two adjacent strip electrodes 11 being a gap. The at least two strip electrodes 11 may be arranged in parallel on a planar or curved surface, depending on the practical needs, and can have high flexibility in plastic processing and be suitable for the needs of various environmental purification structural arrangements. When applying voltage to the plasma generating electrode 10, the voltage may be applied to each strip electrode 11 individually, or it may be applied via a connecting electrode 13, as in the following embodiment, but is not limited thereto.

[0049] Referring to Figures 3 and 4, in one embodiment of the present invention, the plasma generating electrode 10 further includes a connecting electrode 13, the connecting electrode 13 is provided at an angle to the strip electrode 11 and is connected to each of the strip electrodes 11.

[0050] In this embodiment, the plasma generating electrode 10 further includes a connecting electrode 13, which is connected to each strip electrode 11 at an angle. By connecting each strip electrode 11 via the connecting electrode 13, the structure of the plasma generating electrode 10 is continuously integrated, preventing electrode detachment or loss. Furthermore, by connecting the connecting electrode 13 to an external power supply and applying an external voltage to the connecting electrode 13 and each strip electrode 11, the connection of the plasma generating electrode 10 is facilitated. Additionally, by arranging each strip electrode 11 in a roughly parallel connection structure and setting the voltage of each strip electrode 11 to be the same, the amount and reach of the generated plasma are roughly the same, improving the uniformity of the purification effect at each position of the plasma generator 100.

[0051] In one embodiment of the present invention, the strip electrode 11 is a metal wire or a metal flat bar. Of these, the strip electrode 11 formed using a metal wire uses less material, and under the same discharge voltage conditions, it is possible to achieve a better plasma coating effect while significantly reducing the amount of material used. On the other hand, by forming the strip electrode 11 using a metal flat bar, the contact area between the plasma generating electrode 10 and the dielectric layer 50 is increased, improving the structural strength and stability when the plasma generating electrode 10 is provided in the dielectric layer 50, preventing slippage of the plasma generating electrode 10, and ensuring the performance stability of the plasma generator.

[0052] Referring to Figures 5, 6, 12, and 13, in one embodiment of the present invention, the plasma generating electrode 10 is a plate-shaped electrode with a plurality of perforations formed therein.

[0053] This embodiment is another embodiment of the plasma generation electrode 10, namely, a perforated structure is formed by processing a perforated hole in a plate-shaped electrode. The shape of the perforated hole may be circular, square, or other regular or irregular shapes. The plate-shaped electrode may be a flat plate or a curved plate, and may be enclosed to form a cylindrical structure, but is not limited thereto. By processing a perforated hole in a plate-shaped electrode to form the plasma generation electrode 10, the structural strength of the plasma generation electrode 10 is increased, making it less susceptible to deformation and damage, and protecting the dielectric layer 50 and the first electrode that it covers. This makes it possible to effectively ensure the performance stabilization of the plasma generation electrode 10 and the plasma generator 100.

[0054] Referring to Figures 8 to 11, in one embodiment of the present invention, the plasma generating electrode 10 is a mesh electrode.

[0055] This embodiment is another embodiment of the plasma generating electrode 10, in which the plasma generating electrode 10 is provided as a mesh structure, where the mesh positions are the open positions, and the mesh structure may be a chain net, a woven net, or other mesh form, and is not limited thereto. By providing the plasma generating electrode 10 as a mesh structure, the plastic deformation of the plasma generating electrode 10 becomes easier, and it can be bent so as to tightly wrap around the dielectric layer 50. On the other hand, compared to a helical electrode, the mesh electrode has higher structural strength, all the intersection positions of each mesh are interconnected, the structure is less prone to disorder, and it has high stability.

[0056] Referring to Figure 7, in one embodiment of the present invention, the plasma generating electrode 10 includes a plurality of dot-shaped electrodes arranged in a dot matrix, And / or, the plasma generating electrode 10 includes a plurality of block-shaped electrodes arranged in a dot matrix pattern.

[0057] In this embodiment, multiple dot-shaped electrodes or block-shaped electrodes are attached to the surface of the dielectric layer 50 to form a second electrode, and the gap between two adjacent electrodes is the perforation position. By using a combined electrode structure of separate dot-shaped electrodes and block-shaped electrodes, the scene applicability of the plasma generation electrode 10 can be further increased. By freely combining and setting the positions and gaps of each dot electrode and block electrode according to the purification environment, the dielectric layer 50, or the structural form of the first electrode 30, the applicability of the plasma generation electrode 10 can be further improved.

[0058] Referring to Figures 1 and 2, the present invention further proposes a plasma generator 100, the plasma generator 100 comprising a first electrode 30, a dielectric layer 50, and a second electrode, wherein the dielectric layer 50 is provided on the surface of the first electrode 30, and the second electrode is provided on the side of the dielectric layer 50 away from the first electrode 30 and covers at least a portion of the dielectric layer 50, and any one of the above-described plasma generating electrodes 10 is used. In the plasma generator 100, a positive or negative voltage is formed between the first electrode 30 and the second electrode, and the dielectric layer 50 between the two electrodes forms a dielectric to prevent discharge. When a voltage of sufficient strength is applied between the two electrodes, the air between the two electrodes is ionized and plasma is generated. The generated plasma propagates from the plasma generating electrode 10 along the surface of the dielectric material for a certain distance, covering the area around the plasma generating electrode 10, purifying the air, water, fabric, skin, and material surfaces that come into contact with it, and removing any toxic or harmful substances they contain.

[0059] Here, the second electrode is the plasma generating electrode 10 proposed in any one of the embodiments described above, and is exposed to the environment to be purified. By making at least a portion of the plasma generating electrode 10 perforated, the external extension length of the electrode is equivalently increased assuming the same amount of material is used, and at the location of the perforated structure, the plasma covering areas generated by some electrodes that surround and form the perforated position are connected to each other, reducing the overlapping plasma covering areas. As a result, the plasma generator 100 can achieve a larger plasma covering area when the same discharge voltage is applied. Sufficient contact between the generated plasma and substances such as air and water is ensured, thereby effectively purifying and disinfecting the air, water, and other substances, and improving the purification effect.

[0060] In one embodiment of the present invention, the first electrode 30 is a linear electrode, and the second electrode is provided in the circumferential direction of the first electrode 30 so as to surround the first electrode 30.

[0061] In this embodiment, the first electrode 30 is a linear electrode, the dielectric layer 50 is wound around the outside of the first electrode 30, and the second electrode is wound around the outside of the dielectric layer 50. That is, the plasma generating electrode 10, which is the second electrode, is a cylindrical structure with perforations formed on its surface and provided to surround the dielectric layer 50, and its cross-section may be any external shape such as circular, elliptical, rectangular, triangular, or other polygon. The cylindrical structure with perforations formed on its surface may be a helical electrode made by winding a metal wire, a mesh electrode provided to surround it, a cylindrical electrode structure with holes, or a structure in which multiple dot block-shaped electrode structures are provided to surround it, and is not limited thereto. With such a configuration, the plasma generator 100 forms a coaxial surrounding structure and has a three-dimensional structural form. As a result, even if the volume and size of the first electrode 30 are constant, the surface area of ​​the first electrode 30 can be fully utilized, and the discharge region between the first electrode 30 and the second electrode can be made relatively larger. Alternatively, if the discharge area of ​​the plasma generator 100 is constant, the volume of the first electrode 30 can be made relatively small by making full use of the surface area of ​​the first electrode 30. Furthermore, the volumes of the dielectric layer 50 and the second electrode can also be made relatively small, ultimately making the volume and dimensions of the plasma generator of the present invention more compact while improving its purification performance.

[0062] In this embodiment, if the plasma generating electrode 10 is a helical electrode, a mesh electrode, or a dot-block electrode, the dielectric layer 50 can function as a mounting base for the plasma generating electrode 10, and may be made of a rigid or flexible material that is easily plastically deformable, so that the plasma generating electrode 10 can be plastically deformed into the required structural form using the dielectric layer 50 as a base.

[0063] In one embodiment of the present invention, the voltage U applied by the plasma generator 100 to the second electrode satisfies U ≤ 3kV.

[0064] In this embodiment, the voltage U applied to the second electrode in the plasma generator 100 satisfies the requirement that U is 3kV or less in short-time commercial frequency withstand voltage, so that it is within a safe electrical usage range. At this time, with respect to the perforation structure on the plasma generating electrode 10, i.e., the second electrode, if the minimum distance d between any point in the perforation position and the edge of the perforation is 2.5 mm or less, the plasma generated at an applied voltage of 3kV already completely covers the surface of the dielectric layer. Of course, the smaller the minimum distance between any point in the perforation position and the edge of the perforation, the more the applied voltage can be appropriately reduced to reduce the output power. Furthermore, with advances in technology, those skilled in the art may use other voltage values ​​that have a similar effect to 3kV, including but not limited to voltage values ​​greater than 3kV, depending on different conditions such as the material of the plasma generating electrode 10, the material of the dielectric layer 50, the plasma generation environment, and changes in the range of safe voltage values ​​that can be applied.

[0065] This application further proposes a purification device including the plasma generator 100 described above. The purification device proposed in this application may be an air conditioner, an air purifier, a floor cleaning machine, etc., but is not limited to these. The plasma generator 100 provided in the purification device can reduce toxic and harmful substances contained in the air blown out from the air purifier and purify, sterilize, and disinfect the clean water in the floor cleaning machine by generating plasma during operation. Of course, other purification devices may also be used and are not limited here. Since all the technical solutions of all embodiments of the plasma generating electrode 10 and plasma generator 100 described above are applied to the purification device proposed in this application, it has at least all the advantages brought about by all the technical solutions described above, and is therefore omitted from further explanation.

[0066] The foregoing describes only preferred embodiments of the present application and does not thereby limit the scope of the patent. Any equivalent structural transformations or direct / indirect applications to other related technical fields made using the contents of the specification and accompanying drawings of the present application under the inventive concept of the present application are all within the scope of the patent protection of the present application. [Explanation of Symbols]

[0067] 100 Plasma Generator 10 Electrodes for plasma generation 11 strip electrodes 13 Connecting electrodes 30 First electrode 50 Dielectric layer

Claims

1. A watermark structure is provided in at least some areas. Plasma generation electrode.

2. The minimum distance between any point within the perforated area of ​​the plasma generating electrode and the perforated edge is d, satisfying the condition d ≤ 2.5 mm. The electrode for generating plasma according to claim 1.

3. The aforementioned perforated structure is formed on the entire surface of the plasma generating electrode. The electrode for generating plasma according to claim 1.

4. The plasma generating electrode is provided as a cylindrical structure with a perforated surface, and a mounting space is formed within the cylindrical structure. The electrode for generating plasma according to claim 1.

5. The plasma generating electrode includes at least one helical electrode. The electrode for generating plasma according to claim 4.

6. The plasma generating electrode includes two helical electrodes that intersect each other and rotate in opposite directions. And / or, the helical electrode is a metal wire or metal flat bar extending in a spiral shape. Plasma generating electrode according to claim 5.

7. The plasma generating electrode includes at least two strip electrodes arranged in parallel. A plasma generating electrode according to any one of claims 1 to 4.

8. The plasma generating electrode further includes a connecting electrode, The connecting electrode is provided so as to be at an angle to the strip electrode and is connected to each of the strip electrodes. And / or, the strip electrode is a metal wire or a metal flat bar. Plasma generating electrode according to claim 7.

9. The plasma generating electrode is a plate-shaped electrode with multiple perforations formed therein. Alternatively, the plasma generating electrode is a mesh electrode. A plasma generating electrode according to any one of claims 1 to 4.

10. The plasma generating electrode includes a plurality of dot-shaped electrodes arranged in a dot matrix, And / or, the plasma generating electrode includes a plurality of block-shaped electrodes arranged in a dot matrix pattern. A plasma generating electrode according to any one of claims 1 to 4.

11. The first electrode and A dielectric layer provided on the surface of the first electrode, A second electrode, which is a plasma generating electrode according to any one of claims 1 to 6, is provided on the side of the dielectric layer away from the first electrode and covers at least a portion of the dielectric layer. A plasma generator that includes [this component].

12. The first electrode is a linear electrode, and the second electrode is provided circumferentially around the first electrode so as to surround it. The plasma generator according to claim 11.

13. The voltage U applied by the plasma generator to the second electrode satisfies U ≤ 3kV. The plasma generator according to claim 12.

14. A plasma generator according to claim 11, Purification equipment.

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