Electro-optical devices and electronic equipment
By designing a non-crossing trench structure extending along the direction of the data line and the scanning line in the electro-optical equipment, the problem of filling difficulty in the prior art is solved, and a more efficient manufacturing process and more stable capacitive element performance are achieved.
Patent Information
- Application Number
- JP2021039804
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2021-03-12
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2041-03-12
AI Technical Summary
In the prior art, in order to increase the capacitance of the capacitance element, an intersection trench structure is designed, but during the etching process, the oblique opening width of the intersection points becomes larger, resulting in increased filling difficulty, and it is impossible to easily fill the recessed area formed by the intersection trench.
An electro-optical device is designed, including a first groove extending in the direction of the data line and a second groove extending in the direction of the scanning line. The second groove does not intersect with the first groove but is parallel to the X-axis direction of the first groove, ensuring that the groove width remains narrow at the intersection point, thereby facilitating filling.
Through this design, the opening width of the trench intersection is avoided, the filling process of the capacitance element is simplified, the manufacturing complexity and cost are reduced, and the stability and performance of the capacitance element are improved.