SUBSTRATE PROCESSING APPARATUS AND ABNORMALITY DETECTION METHOD
JP7652485B2Active Publication Date: 2025-03-27TOKYO ELECTRON LTD
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Patent Information
- Application Number
- JP2021036649
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2021-03-08
- Publication Date
- 2025-03-27
- Estimated Expiration
- 2041-03-08
Abstract
To provide a technique for monitoring whether the processed substrate is being adsorbed to the mounting table by means of an electrostatic chuck.SOLUTION: In a semiconductor manufacturing equipment, the substrate processing system 5 comprises a mounting table 60 having an electrostatic chuck 65 that adsorbs substrates, a measurement unit such as a temperature sensor 64 that measures the temperature of the mounting table, and a control unit 4 that is a detection unit that detects abnormalities caused by the adsorption of substrates by the electrostatic chuck based on an integral value that integrates the difference between the variation of the temperature of the mounting table, for example, a reference standard temperature value and a temperature value of the mounting table during a step of processing a substrate.SELECTED DRAWING: Figure 3
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