Apparatus for producing cleaning water for electronic devices and method for producing said cleaning water
The apparatus addresses the need for high flow rates of cleaning water in electronic device manufacturing by integrating pH adjustment, degassing, and gas dissolution processes, ensuring efficient production and reduced waste.
JP7764927B1Active Publication Date: 2025-11-06KURITA WATER INDUSTRIES LTD
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Patent Information
- Application Number
- JP2024111844
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2024-07-11
- Publication Date
- 2025-11-06
- Estimated Expiration
- 2044-07-11
AI Technical Summary
Technical Problem
The increasing demand for high flow rates of cleaning water in electronic device manufacturing due to miniaturization and the need to minimize contaminants requires an apparatus capable of producing cleaning water efficiently.
Method used
A manufacturing apparatus comprising a pH adjusting device, degassing device, and gas-dissolving membrane type device, along with transfer lines, to produce cleaning water at a flow rate of 25 L/min or more, using ultrapure water and functional gases.
Benefits of technology
The apparatus effectively produces cleaning water at large flow rates, reducing waste and meeting the demands of modern electronic device manufacturing processes while minimizing contaminants.
✦ Generated by Eureka AI based on patent content.
Abstract
To provide a manufacturing apparatus capable of producing cleaning water for electronic devices at a large flow rate. [Solution] An apparatus for producing cleaning water for electronic devices, comprising: a pH adjusting apparatus that adds a pH adjuster to ultrapure water to prepare pH-adjusted water; a degassing apparatus that degasses the pH-adjusted water; a gas-dissolving membrane type apparatus that dissolves a functional gas in the degassed pH-adjusted water via a gas-permeable membrane to prepare cleaning water; and transfer lines that can transport the ultrapure water, the pH-adjusted water, and the cleaning water at a flow rate of 25 L / min or more.
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