Salt, acid generator, resist composition, and method for producing resist patterns
JP7875065B2Active Publication Date: 2026-06-17SUMITOMO CHEM CO LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- SUMITOMO CHEM CO LTD
- Filing Date
- 2022-07-29
- Publication Date
- 2026-06-17
AI Technical Summary
Benefits of technology
【0006】 本発明の塩を含有するレジスト組成物を用いることにより、良好なラインエッジラフネス(LER)でレジストパターンを製造することができる。
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Abstract
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.SOLUTION: There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, X1 represents *-CO-O-, *-O-CO- or the like; RA represents a saturated hydrocarbon group; u1 represents an integer of 0-2; s1 represents 1 or 2 and t1 represents 0 or 1, provided that s1+t1=1 or 2; L12 represents a single bond or an optionally substituted hydrocarbon group, provided that -CH2- contained in the group may be substituted with -O-, -S-, -CO- or -SO2-; m1 represents an integer of 1-5; R2 represents a halogen atom, a haloalkyl group or the like; m2 represents an integer of 0-4; and Z+ represents an organic cation.]SELECTED DRAWING: None
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