Method for manufacturing resist compositions and resist patterns

JP7879031B2Active Publication Date: 2026-06-23SUMITOMO CHEM CO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
SUMITOMO CHEM CO LTD
Filing Date
2022-12-28
Publication Date
2026-06-23

AI Technical Summary

Benefits of technology

【0008】 本発明の塩を使用したレジスト組成物を用いることにより、良好なCD均一性(CDU)でレジストパターンを製造することができる。

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Patent Text Reader

Abstract

To provide a resist composition from which a resist pattern having good CD uniformity can be produced.SOLUTION: The resist composition contains a resin (A1) containing a structural unit represented by formula (I1) and a resin (A2) containing a structural unit represented by formula (I2).SELECTED DRAWING: None
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