Tunable electron transparent substrates for high-resolution characterization

Tunable electron transparent substrates with large-area windows and sectioning trenches address the size limitations of conventional substrates, enabling high-resolution characterization of materials beyond the conventional substrate size, facilitating the analysis of larger-area samples and nanomaterial libraries.

WO2025064959A1 Publication Date: 2025-03-27MATTIQ INC
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Patent Information

Application Number
PCT/US2024/047884
Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Priority Date
2023-09-22
Filing Date
2024-09-21
Publication Date
2025-03-27

AI Technical Summary

Technical Problem

Existing electron transparent substrates for high-resolution characterization, such as those used in transmission electron microscopy (TEM), are limited by their small size, which restricts the fabrication of micro- and nanostructured materials and the analysis of larger-area samples or materials with dimensions exceeding the substrate size.

Method used

The development of tunable electron transparent substrates with large-area electron transparent windows and trenches for sectioning, allowing for the fabrication of nanomaterial libraries and high-resolution characterization of materials with dimensions beyond the limits of conventional substrates.

Benefits of technology

The proposed solution enables the fabrication of large-area electron transparent substrates that are compatible with high-resolution characterization techniques, allowing for the analysis of materials with dimensions exceeding conventional substrate sizes, thus overcoming the limitations of existing technologies.

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Abstract

Devices, systems, and methods for electron transparent substrates can include electron transparent windows comprising thin film. Trenches can be defined for sectioning areas, and further sub-areas. Different trench characteristics can permit desirable cleaving by areas, and further by sub-areas to support ease of use.
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