Process management system

Abstract

In order to easily verify whether input information is correct even for processing parameters that must be sequentially changed among recipes that are set in a processing device, when verifying whether the processing parameters of a recipe (R) that is stored in a processing device (2) matches the processing parameters of a standard recipe (R), a recipe management device (5) reads the processing parameters of the recipe (R) that is stored in the processing device (2) to be verified, reads a fixed parameter (FP) that is stored in a database (3) and a variable parameter (VP) that is stored in an electronic record book (4) that is associated with matrix data (MD), and compares these processing parameters to verify whether the processing parameters match.

Description

Process Management System 【0001】 The present invention relates to a process management system having a recipe management function. 【0002】 Process management systems such as semiconductor device manufacturing systems are configured to execute processes according to recipes in order to produce semiconductor device products. A recipe refers to device-specific processing conditions regarding a process sequence and control parameters. A recipe prepared in advance by a designer or the like of a semiconductor device product is stored in the process management system, and subsequent process control is executed according to the stored recipe. 【0003】 In order to improve the efficiency of recipe creation work, when creating a new recipe or editing an existing recipe, recipe setting information highly relevant to specified conditions is retrieved from information in an existing recipe file and know-how information on accumulated recipe settings, and recipe file creation and editing are performed based on the retrieved recipe file information and recipe setting know-how information. A recipe setting support method for a semiconductor inspection device is known (Patent Document 1). 【0004】 Japanese Patent Application Laid-Open No. 2011-134931 【0005】 In the above conventional technology, existing recipe file information can be quickly grasped, and creation of a new recipe and editing of an existing recipe can be performed efficiently. Here, among the recipes set in a processing device such as a semiconductor inspection device, there are processing parameters that must be sequentially changed due to differences between machines, maintenance, or other condition changes. However, in the above conventional technology, it is not possible to verify whether the input parameters are the latest and correct information. Therefore, there is a problem that uniform products cannot be mass-produced due to differences between machines or variations in the conditions of the processing device. 【0006】 The problem to be solved by the present invention is to provide a process management system having a recipe management function that can easily verify whether the input information is correct for the processing parameters that must be sequentially changed as described above among the recipes set in the processing device. 【0007】The present invention solves the above problem by a process management system comprising: a plurality of processing devices; a database; an electronic form whose latest information can be changed within a predetermined range; a recipe management device; which controls the operation of each of the plurality of processing devices based on a recipe that defines the processing parameters of each of the plurality of processing devices; which classifies the processing parameters of the recipe into either fixed parameters that cannot be changed or variable parameters whose information can be changed within a predetermined range; which associates processing items corresponding to the variable parameters stored in the database with the variable parameters of the electronic form; which reads each processing parameter of the recipe stored in the processing device to be compared, compares the fixed parameters stored in the database with the processing parameters classified as fixed parameters to check whether they match; and which reads the variable parameters of the electronic form and compares them with the processing parameters classified as variable parameters stored in the database to check whether they match. 【0008】 In the above invention, matrix data of processing parameters, including the fixed parameters and the variable parameters, can be stored in the database. 【0009】 In the above invention, the variable parameter can be modified to change information within a predetermined numerical range. 【0010】 In the above invention, it is more preferable that, if the processing parameters classified as fixed parameters in the recipe stored in the processing device to be compared do not match the fixed parameters stored in the database, the processing device sets the fixed parameters stored in the processing device to be compared to the fixed parameters stored in the database, and if the processing parameters classified as variable parameters in the recipe stored in the processing device to be compared do not match the variable parameters stored in the electronic form, the processing device sets the variable parameters stored in the processing device to be compared to the fixed parameters stored in the electronic form. 【0011】In the above invention, it is more preferable that the recipe management device performs a matching process until the processing parameters classified as fixed parameters of the recipe stored in the processing device to be matched match the fixed parameters stored in the database. 【0012】 In the above invention, it is more preferable that the recipe management device performs a matching process until the processing parameters classified as variable parameters of the recipe stored in the processing device to be matched match the variable parameters stored in the electronic form. 【0013】 The above problems can also be solved by a semiconductor process management method that manages a semiconductor process using the process management system according to the above invention. 【0014】 The above problem can also be solved by a method for manufacturing epitaxial wafers using the process management system according to the above invention. 【0015】 According to the present invention, processing parameters that must be changed sequentially due to differences between machines or changes in conditions caused by maintenance, etc., within the recipe set in the process management system can be easily verified as correct or not. Therefore, it is possible to suppress differences between machines and variations in the condition of the processing equipment and mass-produce uniform products. 【0016】 This is a block diagram showing a process management system according to one embodiment of the present invention. This is a diagram showing a recipe for a processing device according to one embodiment of the present invention. This is a diagram showing matrix data of recipes stored in a database according to one embodiment of the present invention. This is a diagram showing variable parameters of recipes stored in an electronic form according to one embodiment of the present invention. This is a diagram showing a screen displayed on a terminal device during a matching process performed by a recipe management device according to one embodiment of the present invention. This is a conceptual diagram for explaining the matching process performed by a recipe management device according to one embodiment of the present invention. 【0017】Hereinafter, examples of embodiments for carrying out the present invention will be described with reference to the drawings. Figure 1 is a block diagram showing a process management system according to one embodiment of the present invention. The process management system 1 of this embodiment comprises a plurality of processing devices 2, a database 3, an electronic form 4, and a recipe management device 5. 【0018】 Examples of the processing apparatus 2 include semiconductor device manufacturing equipment, but any equipment that controls the operation using a recipe that defines various processing parameters (information regarding processing conditions) of the processing apparatus 2 is included in the processing apparatus of the present invention. In the following embodiments, the present invention will be explained using a single-sheet vapor deposition apparatus (CVD apparatus) as an example of the processing apparatus 2. 【0019】 The single-sheet vapor phase growth apparatus for manufacturing silicon epitaxial wafers illustrated in this embodiment mounts silicon single crystal wafers one by one on susceptors provided in a reaction furnace, controls the heating of the reaction furnace so that the surface temperature of the silicon single crystal wafers is within a predetermined temperature range, rotates the silicon single crystal wafers at a constant speed via the susceptors, dilutes the silicon reaction gas such as trichlorosilane with a carrier gas such as hydrogen gas, and, if necessary, adds diborane (B ２ H ６ This apparatus uses a mixed gas containing trace amounts of dopants such as ) to be supplied into a reaction furnace to grow a silicon epitaxial layer on the surface of a silicon single crystal wafer in the vapor phase. Hereinafter, it will also be simply referred to as the processing apparatus 2. 【0020】 Figure 2 shows a recipe R for a processing apparatus 2 (a single-sheet vapor phase growth apparatus for manufacturing silicon epitaxial wafers) according to one embodiment of the present invention. In the recipe R shown in Figure 2, the first line specifies that the step numbers are 1 to 6, and the second line specifies the names of each step: purge (pre-evacuation of the reactor), ramp (startup of the heater), bake (heating and holding), deposit (vapor phase growth treatment), post-purge (post-evacuation of the reactor), and cool (cooling of the reactor). The third line specifies the processing time for each step from step 1 to 6, and the fourth line specifies the flow rate of the reaction gas in the deposit step of step 4. 【0021】 Furthermore, in the fifth row of recipe R shown in Figure 2, the flow rates of the dopant in step 3 (bake) and step 4 (deposition step) are specified, and in the sixth row, the flow rates of the hydrogen carrier gas in each step from step 1 to 6 are specified. In addition, in the seventh row, the operation of the reactor exhaust valve (vent and deposit) in each step from step 1 to 6 is specified, and in the eighth row, the rotation speed of the susceptor (i.e., the rotation speed of the wafer) in each step from step 1 to 6 is specified. Note that in the matrix data shown in the figure, the data filled in gray is called a fixed parameter FP, which is determined for each product to be manufactured and cannot be changed, while the data enclosed in a bold frame is a variable parameter VP, which is a parameter that can be changed depending on the number of the processing unit 2, or even between units or depending on the conditions of the same processing unit 2. 【0022】 For example, in the third row of recipe R shown in Figure 2, the step times for each of the following steps—purge (pre-emption of the reactor), ramp (startup of the heater), bake (heating and holding), post-purge (post-emption of the reactor), and cool (cooling of the reactor)—are fixed parameters FP that cannot be changed, while the step time for the deposition (vapor phase growth treatment) step is a variable parameter VP that can be changed only between 100 and 160 seconds. 【0023】 Similarly, the reaction gas flow rate in the deposition (vapor phase growth treatment) step in the fourth row of recipe R shown in Figure 2, the dopant flow rate in the bake (heating and holding) and deposition (vapor phase growth treatment) steps in the fifth row, the hydrogen carrier gas flow rate in the bake (heating and holding), deposition (vapor phase growth treatment), and post-purge (reactor exhaust) steps in the sixth row, and the susceptor rotation speed in the bake (heating and holding), deposition (vapor phase growth treatment), post-purge (reactor exhaust), and cool (reactor cooling) steps in the seventh row are variable parameters VP that can be changed within a predetermined range shown in the same figure. 【0024】Returning to Figure 1, the database 3 of this embodiment stores matrix data MD of processing parameters, including fixed parameters FP, for each processing device 2, which are recipes R. Furthermore, processing items corresponding to variable parameters VP among the matrix data MD stored in the database 3 are stored in the database 3 in association with the variable parameters VP described in the electronic form 4. The information in the electronic form 4 is rewritable, and the information of the variable parameters VP that is considered correct is entered when maintenance of the processing device 2 is completed or when a product is switched over. In addition, the information in the electronic form 4 can be changed even in the process of manufacturing the product due to changes in product quality, etc. Figure 3 is a diagram showing the matrix data MD of recipe R stored in the database 3 according to one embodiment of the present invention. 【0025】 As shown in Figure 3, among the matrix data MD stored in database 3, the fixed parameter FP contains specific processing conditions, such as numerical values ​​(time, flow rate, rotational speed, etc.) or specific control signals (Vent or Deps). These processing items are read directly by the controller of the corresponding processing unit 2 and set. 【0026】 In contrast, for the variable parameter VP in the matrix data MD stored in database 3, no specific numerical values ​​or specific control signals representing the processing conditions are entered. Since the specific numerical values ​​or specific control signals representing the processing conditions of the variable parameter VP are described in electronic document 4, instead of entering specific parameters for the variable parameter VP in the matrix data MD stored in database 3, keywords that associate with the variable parameter VP described in electronic document 4 are entered. 【0027】For example, as shown in the matrix data MD in Figure 3, the step time in step 4 is entered with the keyword "growth time", the reaction gas flow rate in step 4 is entered with the keyword "TCS setting", the dopant flow rates in steps 3 and 4 are entered with the keyword "Dopant setting", the hydrogen gas flow rates in steps 3 to 5 are entered with the keyword "hydrogen setting", and the susceptor rotation speed in steps 3 to 6 is entered with the keyword "rotation setting". 【0028】 Returning to Figure 1, the electronic form 4 of this embodiment contains the variable parameters of the recipe R for each processing unit 2. Figure 4 is a diagram showing the variable parameters VP of the recipe R described in the electronic form 4 according to one embodiment of the present invention. The left side of Figure 4 shows the variable parameters VP of processing unit A, and the right side of Figure 4 shows the variable parameters VP of processing unit B, which is different from processing unit A. As shown in Figure 4, the variable parameters VP described in the electronic form 4 are stored with the set values ​​of the variable parameters VP for five items, that is, numerical values ​​or specific control signals that are specific processing conditions. These items, growth time, TCS set value, Dopant set value, hydrogen set value, and rotation set value, correspond to the keywords shown in Figure 3. The variable parameters VP of the recipe R stored in the electronic form 4 are not only set for each processing unit 2, but are also modified sequentially at times such as when setting manufacturing conditions after maintenance. For example, the growth time for processing unit A is entered as 120 in Figure 4, but can be modified to 118 after maintenance. 【0029】Next, the procedure for verifying processing parameters will be described. The recipe management device 5 of this embodiment can verify whether each processing parameter of recipe R stored in the processing device 2 matches each processing parameter of the regular recipe R. In this verification procedure, first, the recipe management device 5 reads each processing parameter of recipe R stored in the processing device 2 to be verified, and verifies whether the fixed parameter FP of the matrix data MD stored in the database 3 matches the value corresponding to the fixed parameter of the read recipe R. If the result of this verification does not match, the processing device 2 re-verifies recipe R and sets the correct recipe R. After setting the correct recipe R, the recipe management device 5 verifies again whether each processing parameter of recipe R stored in the processing device 2 matches each processing parameter of the regular recipe R. This verification process is carried out until the values ​​corresponding to the fixed parameters of recipe R match. 【0030】 If, as a result of the above comparison, the fixed parameter FP of the matrix data MD stored in database 3 matches the fixed parameter of recipe R read from processing unit 2, then the recipe management device 5 reads the variable parameter VP stored in electronic form 4 and associated with the same matrix data MD as the fixed parameter FP, and compares whether the variable parameter VP of matrix data MD matches the value corresponding to the variable parameter of recipe R read from processing unit 2. If, as a result of this comparison, the variable parameter VP of matrix data MD stored in database 3 matches each processing parameter of recipe R stored in processing unit 2, processing unit 2 executes processing according to the currently set processing parameters of recipe R. On the other hand, if the comparison does not result in a match, processing unit 2 replaces the value corresponding to the variable parameter of recipe R with the value of the variable parameter VP stored in electronic form 4. After replacing the value of the variable parameter VP, a re-comparison is performed. This comparison process is continued until the values ​​corresponding to the variable parameters of recipe R match. 【0031】However, due to manufacturing variations in the processing unit 2, it may be necessary to tune the variable parameters VP written in recipe R before or during operation. If the variable parameters VP of recipe R are changed from the initial settings due to maintenance or other reasons, the processing unit 2 sends the changed variable parameters VP to electronic report 4, and the electronic report 4, upon receiving it, updates the variable parameters VP along with the update date and time. 【0032】 Furthermore, the update process for the variable parameter VP of the electronic form 4 may be forgotten, and processing parameters, including the fixed parameter FP set in the processing unit 2, may be changed for some reason. Therefore, before manufacturing a product based on the recipe R in each processing unit 2, it is necessary to check whether the set processing parameters are the latest and correct parameters. For this purpose, a processing parameter verification process is performed using a terminal device such as the one shown in Figure 5. 【0033】 Figure 5 shows a screen displayed on a terminal device during a matching process performed by a recipe management device 5 according to one embodiment of the present invention, and Figure 6 is a conceptual diagram for explaining the matching process performed by a recipe management device 5 according to one embodiment of the present invention. As shown in Figure 5, when the matching function program of the recipe management device 5 is executed, a matching window 51 appears, and when the processing device 2 displayed there is selected and the recipe matching button is clicked, the matching process described above is started (matching window 52 during matching). 【0034】Specifically, as shown in Figure 6, the recipe management device 5 reads each processing parameter of recipe R1 stored in the processing device 2 to be compared, and compares whether the fixed parameters of the matrix data MD stored in the database 3 match the values ​​of the fixed parameters of recipe R1 stored in the processing device 2. Furthermore, it reads the variable parameter VP associated with the same matrix data MD as the fixed parameter FP described in the electronic form 4. Then, it compares whether the variable parameter VP of recipe R1 stored in the processing device 2 matches the regular recipe R variable parameter VP associated with the same matrix data MD as the fixed parameter FP described in the electronic form 4. 【0035】 If the processing parameters FP and VP of recipe R1 stored in the processing unit 2 perfectly match the regular processing parameters FP and VP stored in database 3 and electronic form 4, the matching window 53 will display "Match OK" and "Production Possible," as shown in Figure 5. Conversely, if the processing parameters FP and VP of recipe R1 stored in the processing unit 2 do not perfectly match the regular processing parameters FP and VP stored in database 3 and electronic form 4, that is, if even one processing parameter is different, the matching window 54 will display "Match NG" and a message prompting reconfirmation, as shown in Figure 5. 【0036】 As described above, the process management system 1 of this embodiment allows for easy verification of whether the variable parameter VP, which must be changed sequentially in response to changes in the condition of the processing device 2, is entered with the latest and correct information by comparing it with the electronic form 4. This suppresses variations in condition and enables mass production of uniform products. Furthermore, by storing the fixed parameter FP and the variable parameter VP as the same matrix data MD, the fixed parameter FP and the variable parameter VP can be managed using the same interface. 【0037】1…Process management system 2…Processing device 3…Database 4…Electronic forms 5…Recipe management device 51-54…Verification window R…Recipe FP…Fixed parameters VP…Variable parameters MD…Matrix data

Claims

1. A process management system comprising: a plurality of processing units, a database, an electronic form whose latest information can be changed within a predetermined range, and a recipe management device, wherein the operation of each of the plurality of processing units is controlled based on a recipe that defines the processing parameters of each of the plurality of processing units, wherein the processing parameters of the recipe are classified into fixed parameters that cannot be changed and variable parameters whose information can be changed within a predetermined range, and the processing items corresponding to the variable parameters stored in the database are associated with the variable parameters of the electronic form, and the recipe management device reads each processing parameter of the recipe stored in the processing unit to be compared, and compares the fixed parameters stored in the database with the processing parameters classified as fixed parameters to check whether they match, and reads the variable parameters of the electronic form, and compares them with the processing parameters classified as variable parameters stored in the database to check whether they match.

2. The process management system according to claim 1, wherein a matrix data of processing parameters, including the fixed parameters and the variable parameters, is stored in the database.

3. The process management system according to claim 1, wherein the variable parameters are capable of changing information within a predetermined numerical range.

4. The process management system according to claim 1, wherein if the processing parameters classified as fixed parameters in the recipe stored in the processing device to be compared do not match the fixed parameters stored in the database, the processing device sets the fixed parameters stored in the processing device to be compared to the fixed parameters stored in the database; and if the processing parameters classified as variable parameters in the recipe stored in the processing device to be compared do not match the variable parameters stored in the electronic form, the processing device sets the variable parameters stored in the processing device to be compared to the fixed parameters stored in the electronic form.

5. The process management system according to claim 4, wherein the recipe management device performs a matching process until the processing parameters classified as fixed parameters of the recipe stored in the processing device to be matched match the fixed parameters stored in the database.

6. The process management system according to claim 4, wherein the recipe management device performs a matching process until the processing parameters classified as variable parameters of the recipe stored in the processing device to be matched match the variable parameters stored in the electronic form.

7. A method for managing a semiconductor process, comprising managing a semiconductor process using the process management system described in any one of claims 1 to 6.

8. A method for manufacturing an epitaxial wafer, comprising manufacturing an epitaxial wafer using a process management system according to any one of claims 1 to 6.

Images