Transfer assembly and photolithography machine
By using a novel layout of pulley assemblies and suction pipes in the lithography machine, combined with precise control and sensors, the problem of creases in the mask air tubes during reciprocating motion was solved, ensuring smooth airflow and stable mask transmission, thus improving the reliability and efficiency of the lithography machine.
WO2026123985A1PCT designated stage Publication Date: 2026-06-18BEIJING IC-EAST SEMICONDUCTOR TECHNOLOGY CO LTD
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- BEIJING IC-EAST SEMICONDUCTOR TECHNOLOGY CO LTD
- Filing Date
- 2025-10-28
- Publication Date
- 2026-06-18
Smart Images
Figure CN2025130520_18062026_PF_FP_ABST
Abstract
The present application relates to the field of photolithography machines, and provides a transfer assembly and a photolithography machine. In the mask transfer assembly in the present application, by adopting a novel layout of a pulley assembly and air suction tubes, the problem of the air tubes creasing during the reciprocating motion of a mask is avoided. Such design ensures the smoothness of air paths, thereby improving the reliability of suction and transfer of the mask. By guiding the movement of the air tubes by means of the pulley assembly instead of drag chains, the direct contact and friction between the air tubes and the drag chains are reduced, and a fixed pulley assembly further comprises a first power source that can be connected to or disconnected from a fixed pulley. In this way, the connection or disconnection between the fixed pulley and the first power source can also be selectively controlled on the basis of a transfer direction of the mask, thereby protecting the air tubes to the greatest extent.
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