Method for generating an EUV light beam, EUV driver laser for generating an EUV light beam, and use
The method of generating an EUV light beam using multiple laser beams with overlapping durations and a control unit for independent laser source management addresses downtime issues in EUV driver lasers, enhancing efficiency and robustness.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING SE
- Filing Date
- 2025-11-28
- Publication Date
- 2026-06-18
AI Technical Summary
EUV driver lasers experience high downtime due to component damage or failure, leading to significant costs in complex systems, as they require stringent optical components to handle high power and pulse energy.
Generate an EUV light beam by converting target material into a plasma state using multiple laser beams with overlapping durations, allowing the use of commercially available laser sources and lower average power, and employing a control unit to manage laser beam sources independently, utilizing waveguides for beam guidance and a collector device for focusing.
Reduces downtime by enabling quick replacement of malfunctioning laser sources and reduces component requirements, resulting in a more efficient and robust EUV light beam generation process.
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