Non-polymer compound and composition for film formation

Abstract

Provided is a novel non-polymer compound having useful visible light transmittance properties and excellent solubility properties in an organic solvent, the non-polymer compound being represented by formula (1). (In the formula, each Ar1 independently represents an aromatic hydrocarbon group having 6-14 carbon atoms or an aromatic heterocyclic group having 3-14 carbon atoms, which may have a substituent selected from the group consisting of a methyl group, an ethyl group, a phenyl group, and a benzyl group; Ar1s may be connected to each other through an ether bond; Et represents an ethylene group; each n independently represents 0 or 1; each R independently represents a hydrogen atom, a methyl group, an ethyl group, a phenyl group, or a naphthyl group; k represents 0 or 1; and each X independently represents a functional group having a triazine skeleton.)

Description

Nonpolymer compounds and film-forming compositions 【0001】 The present invention relates to nonpolymer compounds and film-forming compositions containing the same. 【0002】 In the field of optical components such as eyeglass lenses, Fresnel lenses, lenticular lenses, aspherical lenses, optical discs, optical fibers, and optical waveguides, transparent resins made from polymer materials with excellent transparency in the visible light range are widely used. 【0003】 In recent years, transparent resins made from polymer materials with excellent visible light transmittance have been widely used in the fields of electronic devices such as liquid crystal displays, organic electroluminescent (EL) displays, light-emitting diodes, solar cells, and CCD / CMOS image sensors, for optical components such as protective films, planarization films, insulating films, anti-reflective films, refractive index control films, microlenses, intralayer lenses, optical waveguides, and film substrates. 【0004】 In applications of such optical components, not only transparency but also a high refractive index is often required. Furthermore, from the standpoint of productivity for film-forming compositions, the raw materials must be soluble in a variety of organic solvents. In particular, during the manufacturing process of film-forming compositions, when raw materials are mixed with organic solvents other than the one in which they were dissolved, precipitation may occur depending on the combination of organic solvents. In such cases, problems such as clogging of production equipment piping may occur. 【0005】 Patent Document 1 discloses an addition polymer synthesized from a specific benzophenone derivative and a diexo compound as a novel polymer with excellent ultraviolet absorption, visible light transparency, heat resistance, and light resistance for use in optical components. However, further improvements are needed in terms of solubility in organic solvents and refractive index of the cured product. 【0006】 Japanese Patent Publication No. 2019-172846 【0007】The present invention has been made in view of the above circumstances, and aims to provide a novel nonpolymer compound that combines practical visible light transmittance with excellent solubility in organic solvents. Furthermore, it aims to provide a film-forming composition containing the above nonpolymer compound that can form a cured film possessing practical visible light transmittance and a high refractive index. 【0008】 The inventors, through diligent research to achieve the above objectives, discovered that a specific nonpolymer compound having both a fluorene skeleton and a triazine skeleton in its molecule possesses both practical visible light transmittance and excellent solubility in organic solvents. Furthermore, they found that by using this nonpolymer compound as a raw material, a film-forming composition containing the nonpolymer compound can be obtained that can form a cured film possessing both practical visible light transmittance and a high refractive index, thus completing the present invention. 【0009】 In other words, the present invention provides the following nonpolymer compounds and film-forming compositions: 1. A nonpolymer compound represented by the following formula (1). (In the formula, Ar 1 Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of methyl, ethyl, phenyl, and benzyl groups. 1 ) The groups may be linked to each other via ether bonds, where Et represents an ethylene group, n independently represents 0 or 1, R independently represents a hydrogen atom, a methyl group, an ethyl group, a phenyl group, or a naphthyl group, k represents 0 or 1, and X independently represents a functional group having a triazine skeleton. 2. One nonpolymer compound represented by the following formula (1-1). (In the formula, Ar 1, k, and X are synonymous with the definitions in the above formula (1).) 3. Each of the above aromatic hydrocarbon groups is independently a phenylene group, a naphthylene group, or a biphenylylene group, and each of the above aromatic heterocyclic groups is independently a divalent group having a furan ring, a thiophene ring, a pyridine ring, a thiazole ring, a benzothiazole ring, a quinoline ring, an isoquinoline ring, a benzofuran ring, an isobenzofuran ring, or a carbazole ring, which is a non-polymer compound of 1 or 2. 4. A non-polymer compound of 1 in which each of the functional groups having the above triazine skeleton is independently a group represented by the following formula (x0). (In the formula, Ar 2 is each independently an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may have a substituent selected from the group consisting of a hydroxy group, a methyl group, an ethyl group, and a phenyl group, and Z is each independently a single bond, an ether bond, a sulfide bond, a -O-C(=O)- group, or a -NR 3 - group, and R 3 represents a hydrogen atom, a methyl group, or an ethyl group. * represents a bond.) 5. A non-polymer compound of 4 in which each of the functional groups having the above triazine skeleton is independently a group represented by the following formula (x1). (In the formula, R a and R b each independently represent a hydrogen atom, a hydroxy group, a methyl group, or an ethyl group, R 1 and R 2 each independently represent a methyl group, an ethyl group, or a phenyl group, m1 each independently represents an integer of 0 to 3, m2 represents an integer of 0 to 2, and Z and * are synonymous with the definitions in the above formula (x0).) 6. A non-polymer compound of 5 in which each of the functional groups having the above triazine skeleton is independently a group represented by the following formula (x1-1). (In the formula, R 1,m1 and * are synonymous with the definition of formula (x1) above.) 7. Any nonpolymer compound 1 to 6 having a molecular weight of 500 to 3,500. 8. Any nonpolymer compound 1 to 7 which is a reaction product of a compound having two epoxy groups in one molecule and a fluorene skeleton and a compound having a functional group having the above triazine skeleton. 9. The nonpolymer compound 8 in which the compound having a functional group having the above triazine skeleton further has a phenolic hydroxyl group. 10. A film-forming composition comprising any nonpolymer compound represented by formula (1) of 1 to 9, a curing agent, and an organic solvent, wherein the content of the curing agent is 15 parts by mass or more per 100 parts by mass of the above nonpolymer compound. 11. The film-forming composition 10 in which the curing agent is a polyfunctional blocked isocyanate compound. 12. 11 film-forming compositions wherein the polyfunctional blocked isocyanate compound is a homopolymer of (meth)acrylate having a blocked isocyanate group, or a copolymer containing a (meth)acrylate having a blocked isocyanate group. 13. Any of the film-forming compositions from 10 to 12 further comprising a hindered amine-based light stabilizer. 14. Any of the film-forming compositions from 10 to 13 further comprising a surfactant. 15. A microlens made from a cured product of any of the film-forming compositions from 10 to 14. 16. An electronic device equipped with the microlens from 15. 【0010】 The nonpolymer compound of the present invention possesses both practical visible light transmittance and excellent solubility in organic solvents. By using this nonpolymer compound as a raw material, a film-forming composition can be obtained that can form a cured film possessing both practical visible light transmittance and a high refractive index. The cured film formed from the above film-forming composition is suitable as an optical component such as a protective film, planarization film, insulating film, anti-reflective film, refractive index control film, microlens, intralayer lens, optical waveguide, and film substrate. 【0011】The present invention will be described in more detail below. The nonpolymer compound according to the present invention is characterized by being represented by the following formula (1). In this invention, "nonpolymer compound" means a compound that has a molecular weight of 3,500 or less and is not a polymer. 【0012】 【0013】 In the formula, Ar 1 Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of methyl, ethyl, phenyl, and benzyl groups. 1 The elements may be linked to each other via ether bonds, where Et represents an ethylene group, n independently represents 0 or 1, R independently represents a hydrogen atom, a methyl group, an ethyl group, a phenyl group, or a naphthyl group, k represents 0 or 1, and X independently represents a functional group having a triazine skeleton. 【0014】 Examples of aromatic hydrocarbon groups having 6 to 14 carbon atoms include phenylene, naphthylene, anthracenylene, phenantrenylene, fluorenylene, and biphenylylene groups. In the present invention, among these, phenylene, naphthylene, and biphenylylene groups are preferred. 【0015】 Examples of aromatic heterocyclic groups having 3 to 14 carbon atoms include divalent groups having a furan ring, thiophene ring, pyridine ring, thiazole ring, benzothiazole ring, quinoline ring, isoquinoline ring, benzofuran ring, isobenzofuran ring, or carbazole ring. More specifically, examples include aromatic heterocyclic groups containing at least one heteroatom such as a nitrogen atom, oxygen atom, or sulfur atom, such as a franziyl group, pyrrolediyl group, thiophendiyl group, pyridinediyl group, thiazolediyl group, benzothiazolediyl group, quinolinediyl group, isoquinolinediyl group, benzofranziyl group, isobenzofranziyl group, and carbazolediyl group. 【0016】The above-mentioned aromatic hydrocarbon group and aromatic heterocyclic group may have the substituents described above. If these groups have substituents, the number is not particularly limited and may be one or two or more. 【0017】 2 Ar 1 Examples of groups formed by the linkage of these elements via ether bonds include the group represented by the following formula (Ar-1). 【0018】 (In the formula, * represents a bond.) 【0019】 A preferred embodiment of the nonpolymer compound represented by formula (1) above is, for example, the one represented by the following formula (1-1). 【0020】 (In the formula, Ar 1 , k and X are equivalent to the definitions in equation (1) above. 【0021】 Examples of functional groups having a triazine skeleton represented by X above include the group represented by the following formula (x0). Examples of the group represented by the following formula (x0) include the group represented by the following formula (x1). 【0022】 (In the formula, Ar 2 Each independently represents a C6-C14 aromatic group such as a benzene ring or a C3-C14 nitrogen-containing heterocyclic group such as a pyridine ring, which may each have substituents selected from the group consisting of hydroxyl, methyl, ethyl, and phenyl groups, and each independently represents a single bond, ether bond, sulfide bond, -O-C(=O)- group, or -NR 3 - Represents the base, R a and R b Each of these independently represents a hydrogen atom, a hydroxyl group, a methyl group, or an ethyl group, and R 1 and R 2 Each independently represents a methyl group, an ethyl group, or a phenyl group; each independently represents an integer from 0 to 3; each independently represents an integer from 0 to 2; and each independently represents a single bond, an ether bond, a sulfide bond, an -O-C(=O)- group, or an -NR 3represents a - group, and R 3 represents a hydrogen atom, a methyl group or an ethyl group. * represents a bond.) 【0023】 Regarding the above R a and R b hydrogen atom, hydroxy group and methyl group are preferable. Further, when at least one of the above R a and R b is a hydroxy group (that is, an embodiment having a phenolic hydroxy group), ultraviolet absorbency can be imparted to the obtained non - polymer compound, and improvement in the light resistance of the obtained cured film is expected. In particular, the embodiment in which at least one of R b is a hydroxy group is more effective.) 【0024】 A more preferable embodiment of the functional group having the above triazine skeleton includes a group represented by the following formula (x1 - 1), and an even more preferable embodiment includes a group represented by the following formula (x1 - 1a). 【0025】 (In the formula, R 1 , m1 and * have the same meanings as defined in the above formula (x1).) 【0026】 Specific examples of the functional group having the above triazine skeleton include any of the groups represented by the following formulas (x1 - 1 - 1) to (x1 - 1 - 11), but are not limited thereto.) 【0027】 (In the formula, * represents a bond.) 【0028】 Specific examples of the above non - polymer compound include, but are not limited to, compounds represented by the following formulas (1 - 1 - 1) to (1 - 1 - 5). 【0029】 【0030】 In the formula, X 1 represents any of the groups represented by the above formulas (x1 - 1 - 1) to (x1 - 1 - 11). Note that the two X 1 may be the same or different, but are preferably the same.) 【0031】The molecular weight of the above nonpolymer compound is, from the viewpoint of solubility in organic solvents, for example, 500 to 3,500, preferably 500 to 3,000, and more preferably 1,000 to 3,000. 【0032】 The above nonpolymer compounds can be obtained by reacting a compound having two epoxy groups in one molecule and a fluorene skeleton (hereinafter sometimes referred to as "epoxy compound") with a compound having a functional group having a triazine skeleton and a phenolic hydroxyl group or a carboxyl group (hereinafter sometimes referred to as "triazine skeleton-containing compound"). Among the above triazine skeleton-containing compounds, those having a phenolic hydroxyl group can be preferably used. 【0033】 Specific examples of epoxy compounds include, but are not limited to, those represented by the following formulas (E1) to (E5). 【0034】 【0035】 Examples of triazine skeleton-containing compounds include, but are not limited to, those represented by the following formulas (X1-1) to (X1-11). 【0036】 【0037】 The method for synthesizing the above nonpolymer compounds is not particularly limited, but for example, one method involves dissolving the epoxy compound and the triazine skeleton-containing compound in an organic solvent in an appropriate ratio (molar ratio) according to the number of epoxy groups, and reacting them at 60 to 150°C for 1 to 48 hours in the presence of a catalyst. 【0038】The organic solvent used in the above reaction is not particularly limited as long as it dissolves the raw materials and catalyst used. Specific examples include those similar to the organic solvents used in the film-forming compositions described later, but from the viewpoint of solubility of the raw material compounds, tetrahydropyran, 1,4-dioxane, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclopentanone, cyclohexanone, N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-ethyl-2-pyrrolidone are preferred. These organic solvents may be used individually or in combination of two or more. 【0039】 Furthermore, while catalysts known to promote the reaction between epoxy groups and phenolic hydroxyl groups or carboxyl groups can be used as the catalyst, in the present invention, quaternary phosphonium salts and quaternary ammonium salts can be suitably used, with quaternary phosphonium salts being more preferred. 【0040】 Examples of quaternary phosphonium salts include methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, butyltriphenylphosphonium bromide, hexyltriphenylphosphonium bromide, tetrabutylphosphonium bromide, benzyltriphenylphosphonium bromide, methyltriphenylphosphonium chloride, ethyltriphenylphosphonium chloride, butyltriphenylphosphonium chloride, hexyltriphenylphosphonium chloride, tetrabutylphosphonium chloride, benzyltriphenylphosphonium chloride, methyltriphenylphosphonium iodide, ethyltriphenylphosphonium iodide, butyltriphenylphosphonium iodide, hexyltriphenylphosphonium iodide, tetrabutylphosphonium iodide, and benzyltriphenylphosphonium iodide. In the present invention, ethyltriphenylphosphonium bromide and tetrabutylphosphonium bromide can be suitably used. 【0041】Examples of quaternary ammonium salts include tetramethylammonium fluoride, tetramethylammonium chloride, tetramethylammonium bromide, tetramethylammonium nitrate, tetramethylammonium sulfate, tetramethylammonium acetate, tetraethylammonium chloride, tetraethylammonium bromide, tetrapropylammonium chloride, tetrapropylammonium bromide, tetrabutylammonium fluoride, tetrabutylammonium chloride, tetrabutylammonium bromide, benzyltrimethylammonium chloride, phenyltrimethylammonium chloride, benzyltriethylammonium chloride, methyltributylammonium chloride, benzyltributylammonium chloride, and methyltrioctylammonium chloride. In the present invention, benzyltriethylammonium chloride can be preferably used. 【0042】 The film-forming composition of the present invention is characterized by containing the above-mentioned nonpolymer compound, a curing agent, and an organic solvent. In the following description, "solid content" refers to components other than the organic solvent that constitute the film-forming composition. 【0043】 <Curing Agent> The curing agent is a component included for the purpose of improving the chemical resistance (solvent resistance) of the cured film formed from the film-forming composition of the present invention. 【0044】 Examples of the curing agents mentioned above include polyfunctional (meth)acrylate compounds, hydroxymethyl or alkoxymethyl group-substituted phenol compounds, compounds having alkoxyalkylated amino groups, and polyfunctional blocked isocyanate compounds. In this specification, (meth)acrylate means methacrylate and acrylate. These curing agents may be used individually or in combination of two or more. 【0045】The curing agent content varies depending on the coating solvent used, the substrate used, the required solution viscosity, the required film shape, etc., but is 15 parts by mass or more per 100 parts by mass of the nonpolymer compound, preferably 15 to 80 parts by mass, more preferably 15 to 70 parts by mass, and even more preferably 20 to 60 parts by mass. These curing agents can undergo a crosslinking reaction with the crosslinkable substituents present in the nonpolymer compound of the present invention. 【0046】Examples of the above polyfunctional (meth)acrylate compounds include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, and polypropylene glycol di(meth)acrylate. , 1,4-butanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, tricyclodecanedimethanol di(meth)acrylate, dicyclopentanyl di(meth)acrylate, bisphenol A di(meth)acrylate, ethoxylated bisphenol A di(meth)acrylate, propoxylated bisphenol A di(meth)acrylate, bisphenol S di(meth)acrylate, phthalate di(meth)acrylate, 9,9 - Bis[4-(2-(meth)acryloyloxyethoxy)phenyl]fluorene, glycerin di(meth)acrylate, glycerin tri(meth)acrolate, glycerin ethoxytri(meth)acrylate, glycerin propoxytri(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolpropane ethoxytri(meth)acrylate, trimethylolpropane propoxytri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, penta Examples include erythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol ethoxytetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, sorbitol hexa(meth)acrylate, tris(2-(meth)acryloyloxyethyl) isocyanurate, and ε-caprolactone-modified tris-(2-(meth)acryloyloxyethyl) isocyanurate. 【0047】Furthermore, the above-mentioned polyfunctional (meth)acrylate compounds include hydroxyl group-containing (meth)acrylates or polyfunctional (meth)acrylates containing hydroxyl groups, such as 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, glycerin di(meth)acrylate, pentaerythritol tri(meth)acrylate, and dipentaerythritol penta(meth)acrylate, as well as 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylene diisocyanate, 1,4-xylene diisocyanate, xylylene diisocyanate, 1,5-naphthalene diisocyanate, and m-phenylene Examples include polyfunctional urethane (meth)acrylates obtained by reacting diisocyanate compounds such as diisocyanate, p-phenylenediisocyanate, diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 4,4'-dibenzyle diisocyanate, isophorone diisocyanate, 1,6-hexamethylene diisocyanate, dicyclohexylmethane diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, 1,3-bis(isocyanatomethyl)benzene, and 1,3-bis(isocyanatomethyl)cyclohexane. 【0048】 Furthermore, as the above-mentioned polyfunctional (meth)acrylate compounds, polyfunctional epoxy (meth)acrylates can also be mentioned, which are synthesized by reacting (meth)acrylic acid with homopolymers or copolymers obtained by radical polymerization of epoxy group-containing (meth)acrylate monomers such as glycidyl (meth)acrylate, glycidyloxybutyl (meth)acrylate, and 3,4-epoxycyclohexylmethyl (meth)acrylate. Here, copolymer means a polymer obtained by polymerizing two or more monomers. The copolymer may be a copolymer obtained by polymerizing two or more epoxy group-containing (meth)acrylates, or it may be a copolymer obtained by polymerizing epoxy group-containing (meth)acrylate and other (meth)acrylates. 【0049】The above-mentioned polyfunctional (meth)acrylate compounds are also available commercially. Examples of such commercially available products include the following: Arronix® M-208, M-210, M-211B, M-215, M-220, M-225, M-233, M-240, M-245, M-260, M-270, M-303, M-305, M-306, M-309, M-310, M-313, M-315, M-321, M-350, M-360, M-400, M-402, M-403, M-404, M-405, and M-406. , M-408, M-450, M-452, M-460, M-510, M-520, M-1100, M-1200, M-1210, M-1310, M-1600, M-1960, M-6100, M-6200, M-6250, M-6500, M-7100, M-7300K, M-8030, M-8060, M-8100, M-8530, M-8560, M-9050 (all manufactured by Toagosei Co., Ltd.); KAYARAD® NPGDA, PEG400DA, FM-400, R-167, HX-220, HX-620, R-526, R-551, R-712, R-604, R-684, GPO-303, TMPTA, HDDA, TPGDA, KS-HDD A, KS-TPGDA, MANDA, THE-330, TPA-320, TPA-330, PET-30, T-1420, T-1 420(T), RP-1040, DPHA, DPEA-12, D-310, D-330, DPCA-20, DPCA-30, DP CA-60, DPCA-120, FM-700, DN-0075, DN-2475, TC-120S, R-115, R-130, R-381, EAM-2160, CCR-1291H, CCR-1235, ZAR-1035, ZAR-2000, ZFR-1401 H, ZFA-1491H, ZCR-1569H, ZCR-1601H, ZCR-1797H, ZCR-1798H, UXE-3000 , UXE-3024, UX-3204, UX-4101, UXT-6100, UX-6101, UX-7101, UX-8101,Same as UX-0937, UXF-4001-M35, UXF-4002, DPHA-40H, UX-5000, UX-5102D-M20, UX-5103D, UX-5005 (all manufactured by Nippon Pharmaceutical Co., Ltd.); NKエステルA200, same as A-400, same as A-600, same as A-1000, same as A-1500, same as A-2000, same as A BE-300, same as A-BPE-4, same as A-BPE-6, same as A-BPE-10, same as A-BPE-20, same as A-BPE- 30. The same as A-BPEF, the same as A-BPP-3, the same as A-DCP, the same as A-DOD-N, the same as A-HD-N, the same as A-NOD, the same as A-GLY-3E, same as A-GLY-9E, same as A-GLY-20E, same as A-TMPT, same as A-TMPT-3EO, same as A- TMPT-9EO, same as ATM-4E, same as ATM-35E, same as APG-100, same as APG-200, same as APG-400, same as APG-700, same as A-PTMG-65, same as A-1000PER, same as A-B1206PE, same as 701A, same as A-9300, same as A-9300-1CL, same as A-9300-6CL, same as A-9530, same as ADP-51EH, same as ATM-31EH, same as A-TMM-3, same as A-TMM-3L, same as A-TMM-3LM-N, same as AD-TMP, same as A-TMMT, same as A-9550, same as A-DPH, same as A-DPH-12E, same as 1G, same as 2G, same as 3G, same as 4G, same as 9G, same as 14G, same as 23G, same as BPE-80N, same as BPE-100, same as BPE-100N, same as BPE-200, same as BPE-500, same as BPE-900, same as BPE-1300N, same as DCP, same as DOD-N, same as HD-N, same as NOD-N, same as NPG, same as 1206PE, same as 701, same as 3PG, same as 9PG, same as TMPT, NK Economizer A-PG5009E, same as A-PG5027E, same as A -PG5054E, NK Origo U-2PPA, same as U-6LPA, same as U-10HA, same as U-10PA, same as UA-1100H, same as U-4H, same as U-6H, same as U-4HA, same as U-6HA, same as U-15HA, same as UA-32P, same as UA-33H, Same as UA-53H, U-200PA, U-324A, UA-160TM, UA-290TM, UA-4200, UA-4400, UA-122P, UA-7100, UA-W2A (all manufactured by Shin-Nakamura Chemical Industry Co., Ltd.); Viscort #195, same as #230, same as #260, same as #310HP, same as #335HP, same as #700HV, same as #540, same as #802.Same as #295, same as #300, same as #360, same as #230D, BAC-45, SPDBA-S30, STAR-501 (all manufactured by Osaka Organic Chemical Industry Co., Ltd.); Light Ester P-2M, P-2M, P-2M, P-2M, P-3M, P-4M, P-9M, P-14M, P-14M, P-14M, P-4M, P-5M, P-6M, P-101P, P-2M, P-2EMK, P-4M, P-5M, P-6M, P-4M, P-6M, P-9M, P-14M, P-6M, P-4M, P-6M, P-6M, P-7M, P-8M, P-9M, P-4M, P-6 BP-4PA, HPP-A, G-201P, TMP-A, PE-3A, PE-4A, DPE-6A, epoxy ester 40EM, 70PA, 200PA, 80MFA, 3002M(N), 3002A(N), 3000MK, 3000A, EX-0205, AH-600, AT-600, UA-306H, UA-306T, UA-306I, UA-510H, UF-8001G, DAUA-167 (all manufactured by Kyoeisha Chemical Co., Ltd.); Art Resin® UN-333, UN-350, UN-1255, UN-2600, UN-2700, UN-5200, UN-5500, UN-5590, UN-5507, UN-6060PTM, UN-6200, UN-6202, UN-6300, UN-6301, UN-7600, UN-7700, UN-90 00H, UN-9000PEP, UN-9200A, UN-3320HA, UN-3200HB, UN-3320HC, UN-3320HS, UN-904, UN -906S, UN-901T, UN-905, UN-906, UN-952, HDP-4T, HMP-2, H-61, HDP-M20 (manufactured by Negami Kogyo Co., Ltd.); Shiko [registered trademark] UV-1400B, UV-1700B, UV-2000B, UV-2010B, UV-2750B, UV-3000B, UV-3200B, UV-3210EA, UV-3 300B, UV-3310B, UV-3500BA, UV-3520TL, UV-3610D80, UV-3630D80, UV-3640PE80, UV-3700B, UV-6100B,UV-6300B, UV-6640B, UV-7000, UV-7000B, UV-7461TE, UV-7510B, UV-7550B, UV-7600B, UV-7605B, UV-7610B, UV- 7620EA, UV-7630B, UV-7640B, UV-7650B, UV-NS001, UV-NS034, UV-NS054, UV-NS063, UV-NS077 (manufactured by Nippon Gosei Kagaku Kogyo Co., Ltd.); Beamset® 243NS, 255, 261, 271, 502H, 504H, 505A-6, 550B, 575, 577, 700, 710, 730, 750, AQ-17, EM-90, EM-92, 371, 381 (all manufactured by Arakawa Chemical Industries, Ltd.); Funcryl® FA-124AS, FA-129AS, FA-222A, FA-240A, FA-P240A, FA-P270A, FA-321A, FA-324A, FA-PTG9A, FA-731A, FA-121M, FA-124M, FA-125M, FA-220M, FA-240M, FA-320M, FA-321M, FA-3218M, FA-PTG9M, FA-137M (all manufactured by Resonac Co., Ltd.); SR212, SR213, SR230, SR238F, SR259, SR268, SR272, SR306H, SR344, SR349, SR508, CD560, CD561, CD564, SR601, SR602, SR610, SR833S , SR9003, CD9043, SR9045, SR9209, SR205, SR206, SR209, SR210, SR214, SR231, SR239, SR248, SR252, SR297, SR348, SR480, CD540, CD5 41, CD542, SR603, SR644, SR9036, SR351S, SR368, SR415, SR444, SR454, SR492, SR499, CD501, SR502, SR9020, CD9021, SR9035, SR350, SR295, SR355, SR399, SR494, SR9041, SR9041, CN929, CN961E75, CN961H81, CN962, CN963, CN963A80, CN963B80, CN963E75, CN963E80,CN963J85, CN964, CN964E75, CN964A85, CN965, CN965A80, CN966A80, CN966H90, CN966J75, C N966R60, CN968, CN980, CN981, CN981A75, CN981B88, CN982, CN982A75, CN982B88, CN982E75, CN983, CN985B88, CN996, CN9001, CN9002, CN9788, CN9893, CN970A60, CN970E60, CN971, CN97 1A80, CN972, CN973A80, CN973H85, CN973J75, CN975, CN977C70, CN978, CN9782, CN9783, CN10 4, CN104A80, CN104B80, CN111, CN112C60, CN115, CN116, CN118, CN120, CN120A60, CN120A75 , CN120B60, CN120B80, CN120C60, CN120C80, CN120D80, CN102E50, CN120M50, CN124, CNUVE15 1. CNUVE151 / 80, CN151, CN2203, CN2270, CN2271, CN2273, CN2274, CN307, CN371, CN550, CN551, SB401, SB402, SB404, SB500E50, SB500K60, SB510E35, SB520E35, SB520M35 (all manufactured by Sartmar); DPGDA, HODA, TPGDA, PEG400DA-D, HPNDA, PETIA, PETRA, TMPTA, TMPEOTA, OTA480, DPHA, IRR214-K, IRR679, IRR742, IRR793, (ACA) Z200M, (ACA) Z230AA, (ACA) Z250, (ACA) Z251, (ACA) Z300, (ACA) Z320, (ACA) Z254F, EBECRYL® 145 , same 150, same 11, same 135, same 40, same 140, same 1142, same 180, same 204, same 205, same 210, same 215, same 220, same 230, same 244, same 245, same 264, same 265, same 270, same 280 / 151B, same 284, same 285, same 294 / 25HD, same 1259, same 1290, same 4820, same 4858, same 5129, same 8210, same 8254, same 8301R, same 8307, same 8402, same 8405, same 8411,Same 8465, same 8800, same 8804, same 8807, same 9260, same 9270, same 8311, same 8701, same 9227EA, same 436, same 438, same 446, same 450, same 524, same 525, same 770, same 800, same 810, same 811, same 812, same 1830, same 846, same 851, same 852, same 853, same 1870, same 884, same 885, same 600, same 605, same 645, same 648, same 860, same 1606, same 3500, same 3603, same 3608, same 3700, same 3701, same 3702, same 37 03, 3708, 6040, 8110, 271, 1258, 1291, 4100, 4200, 4500, 4680, 4220, 4265, 4491, 4513, 4587, 4666, 4683, 4738, 4740, 4250, 4510, KRM® 8200, 8200AE, 8296, 8452, 8904, 8667, 8912, 8981, 8762, 8713B, 8528 (all manufactured by Daicel Ornex Co., Ltd.); BAEA-100, BAEM-100, BAEM-50, BEEM-50, BFEA-50, HPEA-100, CNEA-100, PNEM-50, RNEA-100, TEA-100, KUA-4I, KUA-6I, KUA-9N, KUA-10H, KUA-15N, KUA-C2I, KUA-PC2I, KUA-PEA2I, KUA-PEB2I, KUA-PEC2I, RP-274S, RP-310 (all manufactured by KSM Corporation). , 【0050】 These polyfunctional (meth)acrylate compounds may be used individually or in combination of two or more. 【0051】Examples of the hydroxymethyl group or alkoxymethyl group-substituted phenol compounds include 1,3,5-trihydroxymethylbenzene, 2,6-dihydroxymethyl-4-methylphenol, 2,4-dihydroxymethyl-6-methylphenol, bis(2-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, bis(4-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, 2,2-bis(4-hydroxy-3,5-dihydroxymethylphenyl)propane, 3,3',5,5'-tetrahydroxymethyl-4,4'-bisphenol, and compounds in which some or all of the hydroxymethyl groups in these compounds are substituted with alkoxymethyl groups such as methoxymethyl groups and butoxymethyl groups. These hydroxymethyl group or alkoxymethyl group-substituted phenol compounds may be used individually or in combination of two or more. 【0052】 Examples of compounds having the above-mentioned alkoxyalkylated amino group include nitrogen-containing compounds having multiple active methylol groups in a single molecule, such as (poly)methylolated melamine, (poly)methylolated glycoluryl, (poly)methylolated benzoguanamine, and (poly)methylolated urea, in which at least one hydrogen atom of the hydroxyl group in the methylol group is substituted with an alkyl group such as a methyl group or a butyl group. 【0053】 The above-mentioned compound having an alkoxyalkylated amino group may be a mixture of multiple substituted compounds, and some mixtures may contain oligomeric components formed by the self-condensation of the compound, but any of these mixtures can be used. 【0054】The above-mentioned compounds having alkoxyalkylated amino groups can also be obtained as commercial products. Such commercial products include, for example, hexamethoxymethylmelamine (manufactured by CYTEC, CYMEL® 303, 303LF), tetrabutoxymethylglycoluryl (manufactured by CYTEC, CYMEL® 1170), tetramethoxymethylbenzoguanamine (manufactured by CYTEC, CYMEL® 1123), and other products in the CYMEL series; tetramethoxymethylglycoluryl (manufactured by CYTEC, Examples include products in the POWDERLINK series such as POWDERLINK® 1174), and products in the Nikalac series such as methylated melamine resin (manufactured by Sanwa Chemical Co., Ltd., Nikalac® MW-30HM, MW-390, MW-100LM, MX-750LM) and methylated urea resin (manufactured by Sanwa Chemical Co., Ltd., Nikalac® MX-270, MX-280, MX-290). These compounds having alkoxyalkylated amino groups may be used individually or in combination of two or more. 【0055】 The above-mentioned polyfunctional blocked isocyanate compound has two or more isocyanate groups in one molecule, each isocyanate group blocked by an appropriate protecting group, and when exposed to the high temperature during thermal curing, the protecting group (blocking portion) thermally dissociates and detaches, and the resulting isocyanate group undergoes a crosslinking reaction with the resin. 【0056】 Such polyfunctional blocked isocyanate compounds can be obtained, for example, by reacting a suitable blocking agent with a polyfunctional isocyanate compound having two or more isocyanate groups in one molecule. 【0057】The above polyfunctional isocyanate compounds include 1,4-tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4-trimethyl-1,6-hexamethylene diisocyanate, 1,3,6-hexamethylene triisocyanate, lysine diisocyanate, isophorone diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, and 1,3-bis(isocyanate). Anate-methyl)cyclohexane, 1,4-cyclohexyl diisocyanate, 2,6-bis(isocyanate-methyl)tetrahydrodicyclopentadiene, bis(isocyanate-methyl)dicyclopentadiene, bis(isocyanate-methyl)adamantane, 2,5-diisocyanate-methylnorbornene, norbornane diisocyanate, dicycloheptane triisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4 -Tolylene diisocyanate, 2,6-tolylene diisocyanate, xylylene diisocyanate, tetramethylxylylene diisocyanate, 1,5-naphthalene diisocyanate, p-phenylene diisocyanate, 1,3-bis(isocyanate methyl)benzene, dianisidine diisocyanate, 3,3'-dimethyldiphenyl-4,4'-diisocyanate, diphenyl ether diisocyanate, 2,6-bis(isocyanate Tomethyl)decahydronaphthalene, bis(diisocyanate tolyl)phenylmethane, 1,1'-methylenebis(3-methyl-4-isocyanate-benzene), 1,3-bis(1-isocyanate-1-methylethyl)benzene, 1,4-bis(1-isocyanate-1-methylethyl)benzene, 4,4'-biphenylenediisocyanate, 3,3'-dimethyl-4,4'-biphenylenediisocyanate, 3,3'-dimethoxy-4,Examples include 4'-biphenylenediisocyanate, bis(isocyanate-methyl)thiophene, bis(isocyanate-methyl)tetrahydrothiophene, and modified compounds thereof (e.g., isocyanurate, biuret, ethylene glycol adduct, propylene glycol adduct, trimethylolpropane adduct, ethanolamine adduct, polyester polyol adduct, polyether polyol adduct, polyamide adduct, polyamine adduct). 【0058】Examples of the above blocking agents include alcohols such as methanol, ethanol, isopropanol, n-butanol, heptanol, hexanol, 2-ethoxyhexanol, cyclohexanol, octanol, isononyl alcohol, stearyl alcohol, benzyl alcohol, 2-ethoxyethanol, methyl lactate, ethyl lactate, amyl lactate, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether), triethylene glycol monoethyl ether, N,N-dimethylaminoethanol, N,N-diethylaminoethanol, N,N-dibutylaminoethanol, phenol, ethylphenol, propylphenol, butylphenol, octylphenol, nonylphenol, nitrophenol, chlorophenol, o- Phenols such as cresol, m-cresol, p-cresol, and xylenol; lactams such as α-pyrrolidone, β-butyrolactam, β-propiolactam, γ-butyrolactam, δ-valerolactam, and ε-caprolactam; oximes such as acetone oxime, methyl ethyl ketone oxime, methyl isobutyl ketone oxime, diethyl ketone oxime, cyclohexanone oxime, acetophenone oxime, and benzophenone oxime; pyrazoles, 3,5-dimethylpyrazole, 3-methylpyrazole, and 4-methylpyrazole. Pyrazoles such as 3,5-dimethylpyrazole, 4-nitro-3,5-dimethylpyrazole, 4-bromo-3,5-dimethylpyrazole, and 3-methyl-5-phenylpyrazole; mercaptans such as butyl mercaptan, hexyl mercaptan, dodecyl mercaptan, and benzenethiol; active methylene compounds such as malonic acid diesters, acetoacetate esters, malonic acid dinitrile, acetylacetone, methylenedisulfone, dibenzoylmethane, dipivaloylmethane, and acetone dicarboxylic acid diesters;Examples include amines such as dibutylamine, diisopropylamine, di-tert-butylamine, di(2-ethylhexyl)amine, dicyclohexylamine, benzylamine, diphenylamine, aniline, and carbazole; imidazoles such as imidazole and 2-ethylimidazole; imines such as methyleneimine, ethyleneimine, polyethyleneimine, and propyleneimine; acid amides such as acetanilide, acrylamide, acetic acid amide, and dimer acid amide; acid imides such as succinimide, maleimide, and phthalimide; and urea compounds such as urea, thiourea, and ethyleneurea. Furthermore, internal block types due to uretdione bonding (dimerization of isocyanate groups) may also be present. 【0059】The above-mentioned polyfunctional blocked isocyanate compounds are also available commercially. Examples of such commercially available products include the following: Takenate® B-815N, B-830, B-842N, B-846N, B-870, B-870N, B-874, B-874N, B-882, B-882N, B-5010, B-7005, B-7030, and B-7075 (all manufactured by Mitsui Chemicals, Inc.); Duranate® ME20-B80S, MF-B60B, MF-B60X, MF-B90B, MF-K60B, MF-K60X, SBN-70D, 17B-60P, 17B-60PX, TPA-B80E, TPA-B80X, E402-B80B, E402-B80T, K6000 (all manufactured by Asahi Kasei Corporation); Coronate® 2503, 2507, 2512, 2513, 2515, 2520, 2554, BI-301, AP-M, Millionate MS-50 (all manufactured by Tosoh Corporation); Barnock® D-500, D-550, DB-980K (all manufactured by DIC Corporation); Desmodule® BL-3175, BL-4165, BL-4265, BL-1100, BL-1265, TPLS-2957, TPLS-2062, TPLS-2078, TPLS-2117, BL-3475, Desmosarm® 2170, 2265 (all manufactured by Sumika Covestro Urethane Co., Ltd.); TRIXENE BI-7641, BI-7642, BI-7986, BI-7987, BI-7950, BI-7951, BI-7960, BI-7961, BI-7963, BI-7981, BI-7982, BI-7984, BI-7986, BI-7990, BI-7991, BI-7992, BI-7770, BI-7772, BI-7779, DP9C / 214 (all manufactured by Bakusenden Chemicals Co., Ltd.); VESTANAT® B1358A, B1358 / 100, B1370, VESTAGON® B1065, B1400, B1530, BF1320, BF1540 (all manufactured by Evonik Industries). 【0060】Furthermore, examples of the polyfunctional blocked isocyanate compounds include homopolymers or copolymers obtained by radical polymerization of (meth)acrylates having blocked isocyanate groups. Here, copolymer means a polymer obtained by polymerizing two or more monomers. The copolymer may be a copolymer obtained by polymerizing two or more (meth)acrylates having blocked isocyanate groups, or a copolymer obtained by polymerizing a (meth)acrylate having blocked isocyanate groups and other (meth)acrylates. Such (meth)acrylates having blocked isocyanate groups can also be obtained as commercial products. Examples of such commercial products include Karens® MOI-BM, AOI-BM, MOI-BP, and AOI-BP manufactured by Resonaq Corporation. 【0061】 These polyfunctional block isocyanate compounds may be used individually or in combination of two or more. 【0062】 In the present invention, as a catalyst to promote the above crosslinking reaction, acidic compounds such as p-toluenesulfonic acid, trifluoromethanesulfonic acid, pyridinium-p-toluenesulfonic acid, salicylic acid, sulfosalicylic acid, citric acid, benzoic acid, hydroxybenzoic acid, and naphthalenecarboxylic acid can be incorporated; and thermoacid generators such as 2,4,4,6-tetrabromocyclohexadienone, benzoin tosylate, 2-nitrobenzyl tosylate, and other organic alkyl sulfonates can be incorporated. The above acidic compounds and thermoacid generators can also be incorporated in combination. 【0063】 The amount of catalyst added is preferably 0.0001 to 20 parts by mass, and more preferably 0.0005 to 10 parts by mass, per 100 parts by mass of the nonpolymer compound in the film-forming composition of the present invention. 【0064】<Organic Solvents> The organic solvent is not particularly limited as long as it dissolves the above-mentioned nonpolymer compounds. Specific examples include methylcyclohexane, ethylcyclohexane, n-heptane, toluene, o-xylene, m-xylene, mesitylene, chlorobenzene, o-dichlorobenzene, m-dichlorobenzene, anisole, phenethole, di-n-propyl ether, di-n-butyl ether, diisobutyl ether, di-n-pentyl ether, diisopentyl ether, di-n-hexyl ether, n-butyl ethyl ether, methyl-n-pentyl ether, cyclopentyl methyl ether, tetrahydropyran, 1,3-dioxane, 1,4-dioxane, 1-propanol, 1-butanol, 2-butanol, 2-methyl-1-propanol, 1-pentanol, 2-pentanol, 3-pentanol, cyclopentanol, benzyl alcohol, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol ethyl methyl ether, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol dimethyl ether, n-butyl formate, isobutyl formate, n-pentyl formate, isopentyl formate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, tert-butyl acetate, n-pentyl acetate, isopentyl acetate, n-hexyl acetate, isohexyl acetate, n-heptyl acetate, isoheptyl acetate, n-octyl acetate,Isooctyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol diacetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate , propylene glycol diacetate, triacetin, ethyl propionate, n-propyl propionate, isopropyl propionate, n-butyl propionate, isobutyl propionate, tert-butyl propionate, propylene glycol monomethyl ether propionate, methyl butyrate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, isobutyl butyrate, tert-butyl butyrate, methyl isobutyrate, ethyl isobutyrate, n-propyl isobutyrate, isopropyl Ropyluisobutyrate, n-butylisobutyrate, isobutylisobutyrate, tert-butylisobutyrate, methyl lactate, ethyl lactate, n-propyl lactate, isopropyl lactate, n-butyl lactate, isobutyl lactate, tert-butyl lactate, methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, tert-butyl acetate, dimethylmalonate, diethylmalonate, Methyl glycolate, ethyl glycolate, methyl pyruvate, ethyl pyruvate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, dimethyl carbonate, diethyl carbonate, 2-pentanone, 3-pentanone, cyclopentanone, 2,4-pentanedione, 4-methyl-2-pentanone, 4-hydroxy-4-methyl-2-pentanone, 2-hexanone, 3-hexanone, 3-methyl-2-hexanone, 5-methyl-2-hexanone,Examples include 2-methyl-3-hexanone, 5-methyl-3-hexanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, 2-heptanone, 3-heptanone, 4-heptanone, 2-methyl-3-heptanone, 5-methyl-3-heptanone, 2,6-dimethyl-4-heptanone, cycloheptanone, γ-butyrolactone, γ-valerolactone, γ-caprolactone, δ-valerolactone, δ-caprolactone, ε-caprolactone, N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylisobutylamide, N-methyl-2-pyrrolidone, and N-ethyl-2-pyrrolidone. These organic solvents may be used individually or in combination of two or more. 【0065】 Among the above organic solvents, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, ethyl lactate, n-butyl lactate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, 2-heptanone, cyclopentanone, cyclohexanone, γ-butyrolactone, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-ethyl-2-pyrrolidone are preferred from the viewpoint of improving the leveling properties of the coating film formed by applying the film-forming composition of the present invention to a substrate. 【0066】<Surfactants> The film-forming composition of the present invention may also contain surfactants for the purpose of improving its applicability. Examples of such surfactants include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, and polyoxyethylene oleyl ether; polyoxyethylene alkylaryl ethers such as polyoxyethylene octylphenyl ether and polyoxyethylene nonylphenyl ether; polyoxyethylene / polyoxypropylene block copolymers; sorbitan fatty acid esters such as sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, and sorbitan tristearate; and polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, and polyoxyethylene sorbitan tristearate. Nonionic surfactants such as sorbitan fatty acid esters; F-Top® EF301, EF303, EF352 (all manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.), Megafac® F171, F173, R-30, R-30N, R-40, R-40-LM (all manufactured by DIC Corporation), Florard FC430, FC431 (all manufactured by 3M Japan Ltd.), Asahi Guard® AG710, Surflon® S-382, and the same Fluorine-based surfactants such as SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Inc.), DFX-18, FTX-206D, FTX-212D, FTX-218, FTX-220D, FTX-230D, FTX-240D, FTX-212P, FTX-220P, FTX-228P, FTX-240G, etc. (manufactured by Neos Co., Ltd.), U-275, U-291, U-253, U-405 (manufactured by Unichem Inc.);Organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow No. 7, No. 36, No. 50E, No. 75, No. 77, No. 85, No. 85HF, No. 90, No. 90D-50, No. 95, No. Examples of non-fluorinated surfactants include 99C, PW-95 (both manufactured by Kyoeisha Chemical Co., Ltd.), BYK-399, BYK-302, BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-350, BYK-354, BYK-370, BYK-375, and BYK-378 (all manufactured by BYK-Chemie). These surfactants may be used individually or in combination of two or more. 【0067】 If the above surfactant is included, its content is preferably 0.0001 to 3 parts by mass, more preferably 0.001 to 1 part by mass, and even more preferably 0.01 to 0.5 parts by mass, per 100 parts by mass of the above nonpolymer compound. 【0068】 <Other Additives> The film-forming composition of the present invention may optionally contain additives such as antioxidants, light stabilizers (HALS: hindered amine-based light stabilizers), thermobase generators, ultraviolet absorbers different from the nonpolymer compounds of the present invention (hereinafter sometimes referred to as "other ultraviolet absorbers"), adhesion aids, plasticizers, and sensitizers, as long as they do not impair the effects of the present invention. 【0069】As the light stabilizer (HALS), a hindered amine-based light stabilizer is preferred.Known hindered amine-based light stabilizers can be used, specifically bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, bis(1-methoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis(1-ethoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis(1-propoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis(1-butoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate Sebacate, Bis(1-pentyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Bis(1-hexyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Bis(1-heptyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Bis(1-octoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Bis(1-nonyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Bis(1-decanyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Bis (1-dodecyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidyl)-2-(4-methoxybenzylidene) malonate, bis(1,2,2,6,6-pentamethyl-4-piperidinyl)-[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]butyl malonate, tetrakis(2,2,6,6-pentamethyl-4-piperidyl)1,2,3,4-butanetetracarboxylate, tetrakis(1,2,2,6,6-pentamethyl-4-piperi Examples include 1,2,3,4-butanetetracarboxylate, a condensate of 1,2,3,4-butanetetracarboxylic acid, 1,2,2,6,6-pentamethyl-4-piperidinol, and β,β,β,β-tetramethyl-3,9-(2,4,8,10-tetraoxaspiro[5,5])undecane)diethanol, and a condensate of 1,2,3,4-butanetetracarboxylic acid, 2,2,6,6-pentamethyl-4-piperidinol, and β,β,β,β-tetramethyl-3,9-(2,4,8,10-tetraoxaspiro[5,5])undecane)diethanol.The UV absorbers listed above may be used individually or in combination of two or more types. 【0070】 Commercially available hindered amine light stabilizers can also be used. Examples of commercially available products include TINUVIN® 123, TINUVIN® 292, TINUVIN® 152, TINUVIN® 144, TINUVIN® 622SF, TINUVIN® 111FDL, TINUVIN® 249 (all manufactured by BASF); ADEKA STAB® LA-52, ADEKA STAB® LA-57, ADEKA STAB® LA-63P, ADEKA STAB® LA-68, ADEKA STAB® LA-72, ADEKA STAB® LA-81, ADEKA STAB® LA-82, ADEKA STAB® LA-87 (all manufactured by ADEKA Corporation). 【0071】 If the above-mentioned light stabilizer is included, its content is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 7 parts by mass, and even more preferably 0.5 to 5 parts by mass, per 100 parts by mass of the above-mentioned nonpolymer compound. 【0072】 A thermal base generator is a compound that generates a base by undergoing bond cleavage upon heating. Specific examples of thermal base generators include 1,8-diazabicyclo[5.4.0]undecene-7 2-ethylhexanoate, 1,8-diazabicyclo[5.4.0]undecene-7 phenol salt, 1,8-diazabicyclo[5.4.0]undecene-7 formate, 1,8-diazabicyclo[5.4.0]undecene-7 o-phthalate, 1,8-diazabicyclo[5.4.0]undecene-7 p-toluenesulfonate, 1,5-diazabicyclo[4.3.0]nonene-5 2-ethylhexanoate, benzyltriphenylphosphonium bromide, bis(2-morpholinoethyl) ether, and 1,1'-[[3-(dimethylamino)propyl]imino]bis(2-propanol). These compounds may be used individually or in combination of two or more. 【0073】The above-mentioned thermal base generators can also be commercially available. Commercially available products include U-CAT(registered trademark) SA1, U-CAT(registered trademark) SA102, U-CAT(registered trademark) SA102-50, U-CAT(registered trademark) SA106, U-CAT(registered trademark) SA112, U-CAT(registered trademark) SA506, U-CAT(registered trademark) SA603, U-CAT(registered trademark) 1000, U-CAT(registered trademark) 1102, U-CAT(registered trademark) 2000, U-CAT(registered trademark) 2024, U-CAT(registered trademark) 2026, U-CAT(registered trademark) 2030, U-CAT(registered trademark) Examples include 2110, U-CAT® 2313, U-CAT® 651M, U-CAT® 660M, U-CAT® 18X, U-CAT® 201G, U-CAT® 202, U-CAT® 420A, U-CAT® 130 (all manufactured by Sunapro Co., Ltd.), POLYCAT® 8, POLYCAT® 9, POLYCAT® 12, POLYCAT® 41 (all manufactured by Evonik Industries, Ltd.). 【0074】 When the above-mentioned thermobase generating agent is included, its content is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 7 parts by mass, and even more preferably 0.5 to 5 parts by mass, per 100 parts by mass of the above-mentioned nonpolymer compound. 【0075】Specific examples of the above-mentioned other UV absorbers include 2-[4-(4,6-bis[1,1'-biphenyl]-4-yl)-1,3,5-triazine-2-yl]-3-hydroxyphenoxy-isooctylpropionate, 2-[4-[(2-hydroxy-3-dodecyloxypropyl)oxy]-2-hydroxy-phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, and 2-[4-[(2-hydroxy-3-tridecyloxypropyl [2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-[4-[(2-hydroxy-3-(2-ethyl-hexyloxy)propyl)oxy]-2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2,4-bis(2-hydroxy-4-butyroxyphenyl)-6-(2,4-bis-butyroxyphenyl)-1,3,5-triazine, 2-(2- Examples include benzotriazine-based UV absorbers such as hydroxy-4-[1-octyloxycarbonylethoxy]phenyl)-4,6-bis(4-phenylphenyl)-1,3,5-triazine; benzotriazole-based UV absorbers such as 2-(2H-benzotriazole-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol, 2-(2-hydroxy-5-tert-butylphenyl)-2H-benzotriazole, and 2-[2-hydroxy-5-(2-(meth)acryloyloxyethyl)phenyl]-2H-benzotriazole; benzophenone-based UV absorbers such as 2,4-dihydroxybenzophenone and 2-hydroxy-4-methoxybenzophenone; cyanoacrylate-based UV absorbers such as ethyl-2-cyano-3,3-diphenylacrylate and octyl-2-cyano-3,3-diphenylacrylate; and inorganic microparticles that absorb ultraviolet light such as titanium dioxide microparticles, zinc oxide microparticles, and tin oxide microparticles. The UV absorbers listed above may be used individually or in combination of two or more types. 【0076】Commercially available UV absorbers can also be used. Examples of commercially available products include TINUVIN® PS, TINUVIN® 99-2, TINUVIN® 234, TINUVIN® 326, TINUVIN® 329, TINUVIN® 900, TINUVIN® 928, TINUVIN® 360, TINUVIN® 384-2, TINUVIN® 400, TINUVIN® 405, and TINUVIN® Examples include [Registered Trademark] 460, TINUVIN [Registered Trademark] 477, TINUVIN [Registered Trademark] 479 (all manufactured by BASF); Adeka Stab [Registered Trademark] LA-46, Adeka Stab [Registered Trademark] LA-F70, Adeka Stab [Registered Trademark] LA-29, Adeka Stab [Registered Trademark] LA-31G, Adeka Stab [Registered Trademark] LA-32, Adeka Stab [Registered Trademark] LA-36 (all manufactured by ADEKA Corporation); RUVA-93 (manufactured by Otsuka Chemical Co., Ltd.), etc. 【0077】 If the above-mentioned other ultraviolet absorbers are included, their content is preferably 0.1 to 15 parts by mass, more preferably 0.5 to 10 parts by mass, and even more preferably 1 to 7 parts by mass, per 100 parts by mass of the above-mentioned nonpolymer compound. 【0078】 The method for preparing the film-forming composition of the present invention is not particularly limited, but for example, one method is to dissolve the above-mentioned nonpolymer compound and curing agent in an organic solvent to obtain a homogeneous solution. Furthermore, at an appropriate stage of this preparation method, a surfactant and other additives may be added and mixed as needed. In order to obtain a thin film with higher flatness with good reproducibility, the film-forming composition may be filtered using a sub-micrometer-order filter or the like at an intermediate stage in preparation or after all components have been mixed, as needed. 【0079】 The solid content concentration of the film-forming composition of the present invention is set appropriately considering the coating properties of the composition and the characteristics of the object to which the film is to be formed, but is usually about 0.1 to 30% by mass, preferably about 1 to 25% by mass, and more preferably about 5 to 25% by mass. 【0080】The use of the film-forming composition of the present invention will be described below. <Method for producing a cured film> A method for producing a cured film using the film-forming composition of the present invention will be described below. The film-forming composition of the present invention is applied to an organic film, a film substrate (e.g., PET film, polyimide film), or a component by an appropriate coating method such as a spinner or coater, and then baked using a heating means such as a hot plate or oven to produce a cured film. The baking conditions are appropriately selected from a baking temperature of 50 to 300°C and a baking time of 0.1 to 360 minutes. The baking process for producing the cured film may be carried out in two or more steps. The thickness of the formed cured film is, for example, 0.001 to 1,000 μm, preferably 0.01 to 100 μm, and more preferably 0.1 to 10 μm. 【0081】 The cured film produced using the film-forming composition of the present invention can be used as an optical component such as a protective film, planarization film, insulating film, anti-reflective film, refractive index control film, microlens, intralayer lens, optical waveguide, or film substrate. 【0082】 The present invention will be described in more detail below with reference to synthesis examples, examples, and comparative examples, but the present invention is not limited to the following examples. 【0083】 The compounds used in the following synthesis examples, examples, and comparative examples are as follows: [Solvents] DMF: N,N-dimethylformamide PGME: Propylene glycol monomethyl ether PGMEA: Propylene glycol monomethyl ether acetate CHN: Cyclohexanone MEK: Methyl ethyl ketone THF: Tetrahydrofuran 【0084】 [Ingredients] DBDT: 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine 【0085】 PPT: 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-phenyl)-1,3,5-triazine 【0086】BBBT: 2-(2,4-dihydroxyphenyl)-4,6-bis[1,1'-biphenyl]-4-yl)-1,3,5-triazine 【0087】 BPFG: 9,9-bis(4-glycidyloxyphenyl)fluorene 【0088】 BNFG: 9,9-bis(6-glycidyloxy-2-naphthyl)fluorene 【0089】 BPhFG: 9,9-bis(4-glycidyloxy-3-phenylphenyl)fluorene 【0090】 EX810P: Ethylene glycol diglycidyl ether (Nagase ChemteX Corporation, product name: Denacol® EX-810P) 【0091】 JER828: Bisphenol A type bifunctional epoxy resin (Mitsubishi Chemical Corporation, product name: jER® 828) 【0092】 G01100: Epoxy group-containing acrylic polymer (NOF Co., Ltd., product name: Marproof® G-01100), a polymer containing repeating units represented by the following formula, with more than 6 epoxy groups per molecule. 【0093】 24DHBP: 2,4-dihydroxybenzophenone 【0094】 244THBP: 2,4,4'-trihydroxybenzophenone 【0095】 MOI-BP: 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl methacrylate (Resonac Co., Ltd., product name: Karenz (registered trademark) MOI-BP) 【0096】 MOI-BM: 2-[O-(1'-methylpropyleneneamino)carboxyamino]ethyl methacrylate (Resonac Co., Ltd., product name: Karenz (registered trademark) MOI-BM) 【0097】 AOI-BP: 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl acrylate (Resonac Co., Ltd., product name: Karenz® AOI-BP) 【0098】 RUVA-93: 2-[2-hydroxy-5-[2-(methacryloyloxy)ethyl]phenyl]-2H-benzotriazole (Otsuka Chemical Co., Ltd., product name: RUVA-93) 【0099】 Light stabilizer (HALS) 1: Bis(1,2,2,6,6-pentamethyl-4-piperidinyl)-[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]butylmalonate 【0100】 UV absorber (UVA) 1:2-[4-(4,6-bis[1,1'-biphenyl]-4-yl)-1,3,5-triazine-2-yl]-3-hydroxyphenoxy-isooctylpropionate 【0101】 [Synthesis of raw materials for nonpolymer compounds] [Synthesis example 1] 7.5 g (21.81 mmol) of 2-([1,1'-biphenyl]-3-yl)-4-chloro-6-phenyl-1,3,5-triazine and 3.20 g (24.00 mmol) of anhydrous aluminum trichloride were mixed with 92.5 g of o-dichlorobenzene as a solvent and heated at 80°C. 3.12 g (28.37 mmol) of resorcinol was added to the resulting solution and the mixture was reacted at 100°C for 6 hours. The reaction mixture was added dropwise to a solution of 32 g of 1 M aqueous hydrochloric acid and 135 g of water, and the precipitated solid was filtered and dried to obtain 6.37 g of 2-(2,4-dihydroxyphenyl)-4-phenyl-6-([1,1'-biphenyl]-3-yl)-1,3,5-triazine:mBPPT (yield 70%). 【0102】 【0103】[Synthesis Example 2] 5.0 g (11.91 mmol) of 2-6-bis([1,1'-biphenyl]-4-yl)-4-chloro-1,3,5-triazine and 1.43 g (13.10 mmol) of 3-aminophenol were dissolved in 46.0 g of DMF and reacted at 80°C for 6 hours. 1.69 g (13.10 mmol) of diisopropylethylamine was added dropwise to the reaction mixture, and the precipitated solid was filtered and dried to obtain 4.58 g of 3-((4,6-di([1,1-biphenyl]-4-yl)1,3,5-triazine-2-yl)amino)phenol:triazine compound T (yield 78%). 【0104】 【0105】 Furthermore, the weight-average molecular weight (Mw) and number-average molecular weight (Mn) of the polymers were measured using a GPC instrument manufactured by Shimadzu Corporation (columns: Shodex® KF803L and KF804L (manufactured by Resonac Corporation); eluent: THF, flow rate: 1.0 mL / min, column temperature: 40°C, Mw and Mn: values ​​equivalent to standard polystyrene). 【0106】 [1] Synthesis of Nonpolymer Compounds [Example 1-1] 3.27 g of BPFG (260 g epoxy equivalent), 5.00 g of DBDT (12.58 mmol), and 0.19 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 19.7 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 197 g of methanol, and the precipitated solid was filtered and dried to obtain 8.02 g of powder of the nonpolymer compound (A-1) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 97%). 【0107】 【0108】[Example 1-2] 3.89 g of BNFG (293 g epoxy equivalent), 5.00 g of DBDT (12.58 mmol), and 0.19 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 21.1 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 211 g of methanol, and the precipitated solid was filtered and dried to obtain 8.71 g of powder of the nonpolymer compound (A-2) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 98%). 【0109】 【0110】 [Examples 1-3] 3.81 g of BPFG (260 g epoxy equivalent), 5.00 g of PPT (14.65 mmol), and 0.22 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 21.1 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 211 g of methanol, and the precipitated solid was filtered and dried to obtain 8.54 g of powder of the nonpolymer compound (A-3) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 98%). 【0111】 【0112】 [Examples 1-4] 4.29 g of BNFG (293 g epoxy equivalent), 5.00 g of PPT (14.65 mmol), and 0.22 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 22.2 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 222 g of methanol, and the precipitated solid was filtered and dried to obtain 9.01 g of powder of the nonpolymer compound (A-4) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 97%). 【0113】 【0114】[Examples 1-5] 3.11 g of BPFG (260 g epoxy equivalent), 5.00 g (11.98 mmol) of mBPPT obtained in Synthesis Example 1, and 0.18 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 19.3 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 193 g of methanol, and the precipitated solid was filtered and dried to obtain 7.78 g of powder of the nonpolymer compound (A-5) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 96%). 【0115】 【0116】 [Examples 1-6] 2.17 g of BNFG (293 g epoxy equivalent), 3.00 g (7.19 mmol) of mBPPT obtained in Synthesis Example 1, and 0.11 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 21.1 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 211 g of methanol, and the precipitated solid was filtered and dried to obtain 5.01 g of powder of the nonpolymer compound (A-6) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 97%). 【0117】 【0118】 [Examples 1-7] 2.63 g of BPFG (260 g epoxy equivalent), 5.00 g of BBBT (10.13 mmol), and 0.18 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 18.2 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 182 g of methanol, and the precipitated solid was filtered and dried to obtain 7.47 g of powder of the nonpolymer compound (A-7) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 97%). 【0119】 【0120】[Examples 1-8] 1.58 g of BPFG (260 g epoxy equivalent), 3.00 g (6.09 mmol) of the triazine compound T obtained in Synthesis Example 2, and 0.11 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 21.1 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 211 g of methanol, and the precipitated solid was filtered and dried to obtain 4.40 g of powder of the nonpolymer compound (A-8) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 96%). 【0121】 【0122】 [Examples 1-9] 1.75 g of BNFG (293 g epoxy equivalent), 3.00 g (6.09 mmol) of the triazine compound T obtained in Synthesis Example 2, and 0.10 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 20.0 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 200 g of methanol, and the precipitated solid was filtered and dried to obtain 4.69 g of powder of the nonpolymer compound (A-9) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 98%). 【0123】 【0124】 [Examples 1-10] 4.00 g of BPhFG (310 g epoxy equivalent), 5.00 g of DBDT (12.58 mmol), and 0.19 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 32.0 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 300 g of methanol, and the precipitated solid was filtered and dried to obtain 8.96 g of powder of a nonpolymer compound (A-10) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 96%). 【0125】 【0126】[Example 1-11] 4.54 g of BPhFG (310 g epoxy equivalent), 5.00 g of PPT (14.65 mmol), and 0.22 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 35.0 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 320 g of methanol, and the precipitated solid was filtered and dried to obtain 9.25 g of powder of a nonpolymer compound (A-11) represented by the following formula, which corresponds to the nonpolymer compound represented by formula (1) above (yield 97%). 【0127】 【0128】 [Comparative Example 1-1] 2.00 g of EX810P (epoxy equivalent 95), 8.39 g of DBDT (21.05 mmol), and 0.16 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 42.1 g of CHN and reacted at 120°C for 20 hours to obtain a solution with a solid content of 20% by mass containing a nonpolymer compound (A-12) represented by the following formula, which does not fall under the nonpolymer compound represented by formula (1) above. 【0129】 【0130】 [Comparative Example 1-2] 2.39 g of JER828 (epoxy equivalent 190), 5.00 g of DBDT (12.58 mmol), and 0.19 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 18.0 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 180.0 g of methanol, and the precipitated solid was filtered and dried to obtain 7.02 g of powder of a nonpolymer compound (A-13) represented by the following formula, which does not fall under the nonpolymer compound represented by formula (1) above (yield 95%). 【0131】 【0132】[Comparative Example 1-3] 3.61 g of BPFG (260 g epoxy equivalent), 2.00 g of 1-naphthol (13.87 mmol), and 0.21 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 23.4 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 234.0 g of methanol, and the precipitated solid was filtered and dried to obtain 5.04 g of powder of a nonpolymer compound (A-14) represented by the following formula, which does not fall under the nonpolymer compound represented by formula (1) above (yield 90%). 【0133】 【0134】 [Comparative Example 1-4] 3.06 g of BPFG (260 g epoxy equivalent), 2.00 g of o-hydroxybiphenyl (11.75 mmol), and 0.18 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 20.9 g of CHN and reacted at 120°C for 20 hours. The reaction solution was added dropwise to 209.0 g of methanol, and the precipitated solid was filtered and dried to obtain 4.67 g of powder of a nonpolymer compound (A-15) that does not correspond to the nonpolymer compound represented by formula (1) above (yield 92%). 【0135】 【0136】 [Comparative Example 1-5] 4.85 g of BPFG (260 g epoxy equivalent), 4.00 g of 24DHBP (18.67 mmol), and 0.27 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 21.3 g of CHN and reacted at 120°C for 20 hours to obtain a solution with a solid content of 30% by mass containing a nonpolymer compound represented by the following formula (A-16), which does not fall under the nonpolymer compound represented by formula (1) above. 【0137】 【0138】[Comparative Example 1-6] 3.00 g of JER828 (epoxy equivalent 190), 2.73 g of 244THBP (11.84 mmol), and 0.12 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 23.4 g of CHN and reacted at 120°C for 20 hours to obtain a polymer solution with a solid content of 20% by mass containing a polymer (A-17) having repeating units represented by the following formula, which does not fall under the nonpolymer compound represented by formula (1) above. The obtained polymer had a Mw of 5,300 and a Mn of 3,300. 【0139】 【0140】 [Comparative Example 1-7] 2.15 g of G01100 (epoxy equivalent 170), 5.00 g of DBDT (12.58 mmol), and 0.17 g of ethyltriphenylphosphonium bromide as a catalyst were dissolved in 29.3 g of CHN and reacted at 120°C for 20 hours to obtain a polymer solution with a solid content of 20% by mass containing a polymer (A-18) having repeating units represented by the following formula, which does not fall under the nonpolymer compound represented by formula (1) above. The obtained polymer had a Mw of 23,000 and a Mn of 12,000. 【0141】 【0142】 [2] Synthesis of curing agent [Synthesis example 3] 10.00 g (39.79 mmol) of MOI-BP and 0.78 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 25.1 g of PGMEA and reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 30% by mass. The obtained polymer solution was gradually added dropwise to 400 g of methanol to precipitate a solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (B-1) having repeating units represented by the following formula. The obtained polymer had an Mw of 32,000 and an Mn of 14,000. 【0143】 【0144】[Synthesis Example 4] 10.00 g (41.27 mmol) of MOI-BM and 0.40 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 31.2 g of PGMEA and reacted at 80°C for 20 hours to obtain a polymer solution with a solid content of 25% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (B-2) having repeating units represented by the following formula. The obtained polymer had a Mw of 7,800 and a Mn of 4,100. 【0145】 【0146】 [Synthesis Example 5] 10.00 g (42.15 mmol) of AOI-BP and 0.42 g of azobisisobutyronitrile as a polymerization catalyst were dissolved in 32.0 g of PGMEA and reacted at 80°C for 20 hours to obtain a polymer solution with a solid content of 25% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (B-3) having repeating units represented by the following formula. The obtained polymer had a Mw of 30,000 and a Mn of 13,000. 【0147】 【0148】 [Synthesis Example 6] 5.00 g (19.90 mmol) of MOI-BP and 2.75 g (8.53 mmol) of RUVA-93 were dissolved in 46.3 g of PGMEA with 0.42 g of azobisisobutyronitrile as a polymerization catalyst, and the mixture was reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 15% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (B-4) having repeating units represented by the following formula. The obtained polymer had a Mw of 21,000 and a Mn of 9,300. 【0149】 【0150】[Synthesis Example 7] 5.00 g (19.90 mmol) of MOI-BP and 1.63 g (8.53 mmol) of vinyl biphenyl were dissolved in 35.6 g of PGMEA with 0.42 g of azobisisobutyronitrile as a polymerization catalyst, and the mixture was reacted at 70°C for 20 hours to obtain a polymer solution with a solid content of 15% by mass. The obtained polymer solution was gradually added dropwise to 500 g of methanol to precipitate the solid. The precipitated solid was filtered off and dried under reduced pressure to obtain a polymer (B-5) having repeating units represented by the following formula. The obtained polymer had a Mw of 31,000 and a Mn of 13,000. 【0151】 【0152】 [3] Preparation of film-forming composition [Example 2-1] 100 parts by mass of the nonpolymer compound (A-1) obtained in Example 1-1 was mixed with 30 parts by mass of the polymer (B-1) obtained in Synthesis Example 1 as a curing agent, and 0.5 parts by mass of Polyflow No. 90 (manufactured by Kyoeisha Chemical Co., Ltd.) as a surfactant. CHN was added as an organic solvent to obtain a solution with a solid content of 21.0% by mass. The obtained solution was then filtered using a PTFE microfilter with a pore size of 0.2 μm to prepare the film-forming composition (C-1). 【0153】 [Examples 2-2 to 2-17, Comparative Examples 2-1 to 2-7] Film-forming compositions (C-2) to (C-24) were prepared in the same manner as in Example 2-1, except that the types and amounts of each component were changed as shown in Table 1. 【0154】 【0155】 [4] Evaluation of film-forming compositions and cured films To 1.8 g of each organic solvent (PGME, PGMEA, MEK) shown in Table 2, 0.2 g of the film-forming compositions prepared in Examples 2-1 to 2-17 and Comparative Examples 2-1 to 2-7 were added and shaken, and then allowed to stand for 24 hours. The mixture was visually observed immediately after shaking and after 24 hours to see if any precipitation or turbidity had occurred. Solubility was evaluated according to the following criteria. The results are shown in Table 2. 【0156】《Evaluation Criteria》 ○: No precipitation or turbidity occurred immediately after shaking or after 24 hours of standing. ×: Precipitation or turbidity occurred either immediately after shaking or after 24 hours of standing. 【0157】 [Refractive Index] The film-forming compositions prepared in Examples 2-1 to 2-17 and Comparative Examples 2-1 to 2-7 were each coated onto a silicon wafer using a spin coater, and baked on a hot plate at 100°C for 1 minute, followed by baking at 230°C for 10 minutes to form a cured film with a thickness of 1,000 nm. The refractive index at a wavelength of 550 nm was measured on the obtained cured film using a spectroscopic ellipsometer M-2000 (J.A. Woolam Japan Co., Ltd.). The results are shown in Table 2. 【0158】 [Transmittance Measurement] The film-forming compositions prepared in Examples 2-1 to 2-17 and Comparative Examples 2-1 to 2-7 were each applied to a quartz substrate using a spin coater, and baked on a hot plate at 100°C for 1 minute, followed by 230°C for 10 minutes, to form a cured film with a thickness of 1,000 nm. The transmittance of these cured films was measured in the wavelength range of 200 to 800 nm using a UV-2600 ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation). The visible light transmittance was evaluated from the measurement results according to the following criteria. The results are shown in Table 2. [Visible Light Transmittance Evaluation Criteria] ○: Minimum transmittance measured in the wavelength range of 400 to 800 nm is 90% or higher ×: Minimum transmittance measured in the wavelength range of 400 to 800 nm is less than 90% 【0159】 【0160】 The film-forming compositions of the examples did not precipitate or become cloudy when mixed with organic solvents, demonstrating excellent solubility in those organic solvents. On the other hand, the film-forming compositions of Comparative Examples 2-1 and 2-5 to 2-7 precipitated when mixed with specific organic solvents, resulting in low solubility in those organic solvents. Therefore, the film-forming compositions of the present invention have high solubility in organic solvents and can prevent problems such as clogging of equipment piping, making them superior from a production standpoint. 【0161】The cured film formed from the film-forming composition of the example showed a high refractive index (1.68 or higher). On the other hand, the cured film formed from the film-forming composition of the comparative example had a lower refractive index compared to the cured film formed from the film-forming composition of the example. Therefore, the cured film obtained from the film-forming composition of the present invention can improve light-gathering efficiency and improve the properties of microlens materials and electronic devices. 【0162】 The cured film formed from the film-forming composition of the example exhibited high transmittance in the visible light region (over 90% in the 400-800 nm range), similar to the cured film formed from the film-forming composition of the comparative example. Therefore, the cured film formed from the film-forming composition of the above example is suitable for microlens materials that require high transparency.

Claims

1. A nonpolymer compound represented by the following formula (1). (In the formula, Ar 1 Each of these independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of methyl, ethyl, phenyl, and benzyl groups. 1 The groups may be linked to each other via ether bonds, where Et represents an ethylene group, n independently represents 0 or 1, R independently represents a hydrogen atom, a methyl group, an ethyl group, a phenyl group, or a naphthyl group, k represents 0 or 1, and X independently represents a functional group having a triazine skeleton.

2. The nonpolymer compound according to claim 1, represented by the following formula (1-1). (In the formula, Ar 1 , k and X are equivalent to the definitions in equation (1) above.

3. The nonpolymer compound according to claim 1, wherein each of the aromatic hydrocarbon groups is independently a phenylene group, a naphthylene group, or a biphenylylene group, and each of the aromatic heterocyclic groups is independently a divalent group having a furan ring, a thiophene ring, a pyridine ring, a thiazole ring, a benzothiazole ring, a quinoline ring, an isoquinoline ring, a benzofuran ring, an isobenzofuran ring, or a carbazole ring.

4. The nonpolymer compound according to claim 1, wherein each of the functional groups having the triazine skeleton is independently represented by the following formula (x0). (In the formula, Ar 2 Each independently represents an aromatic hydrocarbon group having 6 to 14 carbon atoms or an aromatic heterocyclic group having 3 to 14 carbon atoms, which may each have substituents selected from the group consisting of hydroxyl groups, methyl groups, ethyl groups, and phenyl groups, and each independently represents a single bond, an ether bond, a sulfide bond, an -O-C(=O)- group, or an -NR 3 - Represents the base, R 3 represents a hydrogen atom, a methyl group, or an ethyl group. * represents a bonding bond.

5. The non-polymer compound according to claim 4, wherein the functional group having the triazine skeleton is independently a group represented by the following formula (x1). (In the formula, R a and R b each independently represent a hydrogen atom, a hydroxy group, a methyl group or an ethyl group, R 1 and R 2 each independently represent a methyl group, an ethyl group or a phenyl group, m1 each independently represents an integer of 0 to 3, m2 represents an integer of 0 to 2, and Z and * are synonymous with the definitions in the above formula (x0).) 6. The nonpolymer compound according to claim 5, wherein each of the functional groups having the triazine skeleton is independently represented by the following formula (x1-1). (In the formula, R 1 m1 and * are equivalent to the definitions in the above formula (x1).

7. The nonpolymer compound according to claim 1, wherein the molecular weight is 500 to 3,500.

8. The nonpolymer compound according to claim 1, which is a reaction product of a compound having two epoxy groups in one molecule and a fluorene skeleton and a compound having a functional group having the above-mentioned triazine skeleton.

9. The nonpolymer compound according to claim 8, wherein the compound having the above-mentioned triazine skeleton functional group further has a phenolic hydroxyl group.

10. A film-forming composition comprising a nonpolymer compound represented by formula (1) according to any one of claims 1 to 9, a curing agent, and an organic solvent, wherein the content of the curing agent is 15 parts by mass or more per 100 parts by mass of the nonpolymer compound.

11. The film-forming composition according to claim 10, wherein the curing agent is a polyfunctional blocked isocyanate compound.

12. The film-forming composition according to claim 11, wherein the polyfunctional blocked isocyanate compound is a homopolymer of (meth)acrylate having a blocked isocyanate group, or a copolymer containing a (meth)acrylate having a blocked isocyanate group.

13. The film-forming composition according to claim 10, further comprising a hindered amine-based light stabilizer.

14. The film-forming composition according to claim 10, further comprising a surfactant.

15. A microlens comprising a cured product of the film-forming composition according to claim 10.

16. An electronic device comprising a microlens according to claim 15.

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