Composition, trihydroxybenzene having a protective group, and production method of trihydroxybenzene

A method for producing high-purity trihydroxybenzene under mild conditions addresses the limitations of existing methods by reacting deoxysiloidose with a protecting agent, enabling its use in high-purity applications and electronic materials.

WO2026127068A1PCT designated stage Publication Date: 2026-06-18MITSUI CHEMICALS INC
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
MITSUI CHEMICALS INC
Filing Date
2025-12-10
Publication Date
2026-06-18

AI Technical Summary

⚠Technical Problem

Existing methods for producing trihydroxybenzene, such as those using 2-deoxy-scyllo-inosose, require harsh reaction conditions (high temperature and high pressure) and may result in trihydroxybenzene with metal impurities, limiting its application in high-purity applications.

⚗Method used

A method for producing trihydroxybenzene with a protecting group that involves reacting a deoxysiloidose compound with a protecting agent under milder conditions (low temperature and pressure) to achieve high-purity trihydroxybenzene, using a composition that meets specific metal content criteria.

🎯Benefits of technology

The method produces high-purity trihydroxybenzene without high-temperature and high-pressure conditions, suitable for applications requiring high purity, and can be used in electronic materials, semiconductor manufacturing, and display applications.

✦ Generated by Eureka AI based on patent content.

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Abstract

Provided is a composition, represented by formula (II) and containing trihydroxybenzene which may have a protective group, wherein said composition satisfies at least one condition selected from the group consisting of (a-1) and (a-2). (a-1) The total metallic element content is less than 500 ppm. (a-2) The content of each metallic element is less than 20 ppm. [In formula (II), X1 to X3 are each independently a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms, an acyl group having 2-20 carbon atoms, a silyl group having 3-30 carbon atoms, or a sulfonyl group having 1-20 carbon atoms.]
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