Multifunctional film, preparation method therefor and use thereof, and light-transmitting panel

Abstract

Disclosed in the present invention are a multifunctional film, a preparation method therefor and a use thereof, and a light-transmitting panel. The multifunctional film comprises a multilayer film and a hydrophobic film layer which are connected in an overlapping manner, the multilayer film comprises a plurality of high refractive index film layers and a plurality of low refractive index film layers, and the plurality of high refractive index film layers and the plurality of low refractive index film layers are alternately and overlappingly arranged in sequence, wherein the side of the multilayer film connected to the hydrophobic film layer is the high refractive index film layer, and wherein the hydrophobic film layer comprises element Si, element C, and element O. The multifunctional film of the present invention can achieve multiple effects of surface hydrophobicity, anti-aging, abrasion resistance, anti-reflection, and the like for a product.

Description

Multifunctional films, their preparation methods, applications, and light-transmitting panels

[0001] This application claims priority to Chinese Patent Application No. 2024119471433, filed on December 26, 2024, entitled "Multifunctional Film and Preparation Method Thereof, Application and Light Transmitting Panel", the entire contents of which are incorporated herein by reference. Technical Field

[0002] This application relates to the fields of materials and display technology, and in particular to a multifunctional film, its preparation method, and a light-transmitting panel. Background Technology

[0003] Low-reflectivity materials have wide applications in display panels, lens imaging systems, and solar cells. Anti-reflective materials can eliminate stray light in devices and improve the light transmittance of components. In existing technologies, the preparation of anti-reflective coatings involves stacking multiple layers of high and low refractive index materials using physical vapor deposition or chemical vapor deposition. While these methods produce films with low reflectivity, they cannot achieve the self-cleaning effect required for anti-reflective coatings, making them difficult to use outdoors or in harsh environments. For example, when display panels, lens devices, and solar cells are used outdoors, their surfaces accumulate large amounts of moisture and dust, affecting display performance and reducing transmission efficiency. Therefore, materials with both anti-reflective and self-cleaning functions are attracting increasing attention. A relatively novel approach is to prepare submicron-scale film structures on the sample surface, achieving both anti-reflective and hydrophobic effects simultaneously. However, submicron-scale film structures themselves have low strength and poor mechanical properties, failing to achieve wear resistance. Furthermore, the preparation process for submicron-scale film structures is complex and costly, making direct application to the outermost layer of devices difficult. Summary of the Invention

[0004] Therefore, it is necessary to provide a multifunctional film. The multifunctional film of the present invention can be used on the surface of light-transmitting products to achieve multiple effects such as hydrophobicity, anti-aging, wear resistance, and anti-reflection on the surface of light-transmitting products.

[0005] One embodiment of this application provides a multifunctional membrane.

[0006] A multifunctional membrane includes an overlapping multilayer membrane and a hydrophobic membrane layer. The multilayer membrane includes multiple high-refractive-index membrane layers and multiple low-refractive-index membrane layers, which are alternately overlapped in sequence. The high-refractive-index membrane layer is located on one side of the multilayer membrane connected to the hydrophobic membrane layer. The hydrophobic membrane layer includes elements Si, C, and O.

[0007] In some embodiments, the carbon-to-oxygen ratio at the bottom of the hydrophobic film layer in contact with the multilayer film is (0.2-2.5):(0.7-2.3).

[0008] In some embodiments, the carbon-to-oxygen ratio of the hydrophobic film layer away from the surface of the multilayer film is (1.6-2.7):(0.5-1).

[0009] In some embodiments, the carbon-oxygen ratio in the hydrophobic film layer varies continuously or in stages from the side in contact with the multilayer film to the side away from the multilayer film.

[0010] In some embodiments, the hydrophobic film layer comprises a siloxane film layer.

[0011] In some embodiments, the side of the multilayer film away from the hydrophobic film layer is the high refractive index film layer.

[0012] In some embodiments, the high-refractive-index film layer in the multilayer film has at least two layers.

[0013] In some embodiments, the thickness of the high refractive index film is 1 nm to 150 nm.

[0014] In some embodiments, the thickness of the low-refractive-index film is 1 nm to 200 nm.

[0015] In some embodiments, the thickness of the different low-refractive-index films is different.

[0016] In some embodiments, the thickness of the hydrophobic film is 1 nm to 200 nm.

[0017] In some embodiments, the thickness of the hydrophobic film layer is no greater than 100 nm.

[0018] In some embodiments, one or more of TiO2, Ta2O5, HfO2, Nb2O5, ZrO2, and Al2O3 are used.

[0019] In some embodiments, the material used to prepare the low-refractive-index film includes one or both of SiO2 and MgF2.

[0020] An embodiment of this application also provides a method for preparing a multifunctional membrane.

[0021] A method for preparing a multifunctional membrane includes the following steps:

[0022] A multilayer film consisting of alternating layers of high-refractive-index and low-refractive-index films is prepared on a substrate.

[0023] In addition, a hydrophobic film layer is prepared on the outermost high refractive index film layer of the multilayer film.

[0024] In some embodiments, when preparing a multilayer film consisting of multiple high-refractive-index films and multiple low-refractive-index films alternately overlapping on a substrate, one or more of the following methods are employed: atomic layer deposition, magnetron sputtering, ion beam sputtering, and evaporation deposition.

[0025] In some embodiments, when preparing a hydrophobic film layer on the outermost high-refractive-index film layer of the multilayer film, the following steps are included: introducing a monomer source and a protective gas into a reaction chamber for deposition.

[0026] In some embodiments, the monomer source is selected from one or more of hexamethyldisiloxane, octamethylcyclotetrasiloxane, hexamethyldisiloxane, tetramethyldisiloxane, and tetraethylsiloxane.

[0027] In some embodiments, the preparation of a hydrophobic film layer on the outermost high-refractive-index film layer of the multilayer film includes the following steps: introducing a monomer source and a protective gas into a reaction chamber, and simultaneously introducing plasma to carry out an ionization reaction to prepare the hydrophobic film layer.

[0028] In some embodiments, the protective gas includes argon. The carrier gas flow rate of the single-unit source is 50 sccm to 2000 sccm, the power of the plasma source is 100W to 8000W, and the argon flow rate is 100 sccm to 5000 sccm.

[0029] In some embodiments, the preparation of a hydrophobic film layer on the outermost high-refractive-index film layer of the multilayer film includes the following steps: sequentially introducing a monomer source and a reactive plasma gas into a reaction chamber, and preparing the hydrophobic film layer by performing a plasma reaction using an atomic layer deposition method.

[0030] In some embodiments, the reactive plasma gas includes argon or hydrogen. The carrier gas flow rate of the single-unit source is 50 sccm to 2000 sccm, the power of the plasma source is 100W to 8000W, and the flow rate of argon or hydrogen is 100 sccm to 5000 sccm.

[0031] In some embodiments, during the preparation of the hydrophobic film, the concentration of the monomer source in the reaction chamber and / or the discharge power of the plasma source are varied to regulate the carbon-oxygen ratio of the hydrophobic film.

[0032] One embodiment of this application also provides an application of a multifunctional membrane.

[0033] The multifunctional film of any one of the above-mentioned methods or the multifunctional film prepared by any one of the above-mentioned methods shall be used in at least display devices, lenses, and solar cells.

[0034] One embodiment of this application also provides a light-transmitting panel.

[0035] A light-transmitting panel comprising a multifunctional film according to any one of the above-mentioned methods or a multifunctional film prepared by any one of the above-mentioned methods.

[0036] The multifunctional membrane of the present invention includes an overlapping multilayer membrane and a hydrophobic membrane layer. The side of the multilayer membrane connected to the hydrophobic membrane layer is the high refractive index membrane layer. The high refractive index membrane layer is used as the outermost membrane layer of the multilayer antireflective membrane, replacing the low refractive index material SiO2 layer on the surface of the product in the traditional technology. This not only achieves lower reflectivity and surface self-cleaning effect, but also plays a role in anti-aging and wear resistance. The hydrophobic membrane layer can be deposited at room temperature, which increases the application scenarios of the hydrophobic antireflective membrane layer.

[0037] In summary, compared with traditional technologies, the multifunctional membrane of this application has the following technical advantages:

[0038] (1) After alternating layers of high refractive index film and low refractive index film, the outermost high refractive index film is then connected by a hydrophobic film layer. The hydrophobic film layer achieves low reflectivity and hydrophobic function on the surface of the product, and has the advantages of anti-aging and wear resistance.

[0039] (2) This application can reduce the reflectivity of the entire multifunctional film by increasing the number of high refractive index film layers and low refractive index film layers in the multilayer film.

[0040] (3) The carbon-oxygen ratio on the side of the hydrophobic film layer in contact with the multilayer film is (0.2-2.5):(0.7-2.3), and the carbon-oxygen ratio on the side of the hydrophobic film layer away from the multilayer film is (1.6-2.7):(0.5-1). The hydrophobic film layer can be grown by adjusting the carbon-oxygen ratio to further regulate the hydrophobicity of the hydrophobic film layer and the bonding force of the multilayer film. Attached Figure Description

[0041] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0042] To gain a more complete understanding of this application and its beneficial effects, the following description will be provided in conjunction with the accompanying drawings. In the following description, the same reference numerals denote the same parts.

[0043] Figure 1 is a schematic diagram of a multifunctional membrane according to an embodiment of the present invention;

[0044] Figure 2 is a reflectance curve of the multifunctional film prepared in Example 1 of the present invention, where the horizontal axis is wavelength and the vertical axis is reflectance.

[0045] Figure 3 is a schematic diagram of the contact angle of the multifunctional membrane prepared in Example 1 of the present invention;

[0046] Figure 4 is a reflectance curve of a multifunctional film prepared according to another embodiment of the present invention, wherein the horizontal axis is wavelength and the vertical axis is reflectance.

[0047] Figure 5 shows the reflectance curve of the multifunctional film prepared in Comparative Example 1, where the horizontal axis represents wavelength and the vertical axis represents reflectance.

[0048] Figure 6 is a schematic diagram of the contact angle of the multifunctional membrane prepared in Comparative Example 1.

[0049] Explanation of reference numerals in the attached figures

[0050] 10. Multifunctional membrane; 100. Multilayer membrane; 101. High refractive index membrane; 102. Low refractive index membrane; 200. Hydrophobic membrane. Detailed Implementation

[0051] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0052] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0053] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0054] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0055] In the description of this invention, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0056] In this document, "optionally," "optionally," and "optional" mean that something is optional, that is, it is selected from either "with" or "without." If multiple "options" appear in a technical solution, unless otherwise specified and there are no contradictions or mutual constraints, each "option" is independent. In this application, descriptions such as "optionally contains" and "optionally includes" indicate "contains or does not contain."

[0057] In this application, when numerical intervals (i.e., numerical ranges) are involved, unless otherwise specified, the distribution of selectable numerical values ​​within the numerical interval is considered continuous, and includes the two endpoints of the numerical interval (i.e., the minimum and maximum values), as well as every numerical value between these two endpoints. Unless otherwise specified, when a numerical interval refers only to integers within that numerical interval, it includes the two endpoint integers of the numerical range, as well as every integer between the two endpoints, which is equivalent to directly listing every integer. When multiple numerical ranges are provided to describe features or characteristics, these numerical ranges can be merged. In other words, unless otherwise specified, the numerical ranges disclosed in this application should be understood to include any and all subranges included therein. The "numerical value" in the numerical interval can be any quantitative value, such as a number, percentage, ratio, etc. The term "numerical interval" can be broadly included to include percentage intervals, ratio intervals, proportion intervals, etc.

[0058] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the specification of this invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0059] This application provides a multifunctional film to address the problems in the prior art where submicron-level film structures with both antireflective and self-cleaning functions suffer from low inherent strength, poor mechanical properties, and inability to achieve wear resistance; and the cumbersome and costly fabrication process of submicron-level film structures, making them difficult to apply directly to the outermost layer of devices. The multifunctional film will be described below with reference to the accompanying drawings.

[0060] The multifunctional film provided in this application is exemplified by Figure 1, which is a schematic diagram of the structure of the multifunctional film provided in this application. The multifunctional film of this application can be used for anti-reflection purposes in light-transmitting products.

[0061] To illustrate the structure of the multifunctional membrane more clearly, the following description will be provided in conjunction with the accompanying drawings.

[0062] For example, as shown in Figure 1, a multifunctional membrane 10 includes an overlapping multilayer membrane 100 and a hydrophobic membrane layer 200. The multilayer membrane 100 includes multiple high-refractive-index membrane layers 101 and multiple low-refractive-index membrane layers 102. As shown in Figure 1, the multiple high-refractive-index membrane layers 101 and multiple low-refractive-index membrane layers 102 are alternately overlapped. The side of the multilayer membrane 100 connected to the hydrophobic membrane layer 200 is the high-refractive-index membrane layer 101. The hydrophobic membrane layer 200 includes elements Si, C, and O.

[0063] The multifunctional membrane 10 of the present invention includes an overlapping multilayer membrane 100 and a hydrophobic membrane layer 200. The side of the multilayer membrane 100 connected to the hydrophobic membrane layer 200 is a high refractive index membrane layer 101. Using the hydrophobic membrane layer 200 as the outermost membrane layer can not only achieve a low reflectivity and surface self-cleaning effect, but also play a role in anti-aging and wear resistance. The deposition of the hydrophobic membrane layer 200 can be carried out at room temperature, wherein the room temperature can be 15℃~38℃, preferably 20℃~28℃, which can increase the application scenarios of the multifunctional membrane 10.

[0064] In some embodiments, the carbon-to-oxygen ratio at the bottom where the hydrophobic film layer 200 contacts the multilayer film 100 is (0.2-2.5):(0.7-2.3). Preferably, the carbon-to-oxygen ratio at the bottom where the hydrophobic film layer 200 contacts the multilayer film 100 is (0.7-2.2):(0.9-2.2).

[0065] In some embodiments, the carbon-to-oxygen ratio of the hydrophobic film layer 200 away from the surface of the multilayer film 100 is (1.6-2.7):(0.5-1). Preferably, the carbon-to-oxygen ratio of the hydrophobic film layer 200 away from the surface of the multilayer film 100 is (1.7-2.4):(0.6-0.95).

[0066] In some embodiments, the carbon-oxygen ratio in the hydrophobic film layer varies continuously or in stages from the side in contact with the multilayer film to the side away from the multilayer film.

[0067] The continuous variation in the carbon-oxygen ratio of the hydrophobic film layer enables it to have good adhesion and bonding force on the side in contact with the multilayer film, and good hydrophobicity and self-cleaning effect on the side away from the multilayer film.

[0068] In some embodiments, the hydrophobic film layer 200 includes a siloxane film layer.

[0069] In some embodiments, as shown in FIG1, the side of the multilayer film 100 away from the hydrophobic film layer 200 is a high refractive index film layer 101.

[0070] In some embodiments, the high refractive index film layer 101 in the multilayer film 100 has no fewer than two layers.

[0071] In some embodiments, the number of high-refractive-index film layers 101 in the multilayer film 100 is greater than or equal to three. For example, please refer to Figure 1, which shows three high-refractive-index film layers 101. It is easy to understand that in other examples, the number of high-refractive-index film layers 101 can also be four, five, six, etc. This application can reduce the reflectivity of the entire multifunctional film 10 by appropriately increasing the number of high-refractive-index film layers 101 and the number of low-refractive-index film layers 102 in the multilayer film 100.

[0072] In some embodiments, the thickness of the high refractive index film 101 is 1 nm to 150 nm. Preferably, the thickness of the high refractive index film 101 is 10 nm to 120 nm. More preferably, the thickness of the high refractive index film 101 is 20 nm to 100 nm. In one specific example, the thickness of the high refractive index film 101 is 1 nm; in another specific example, the thickness of the high refractive index film 101 is 150 nm. It is easy to understand that in other examples, the thickness of the high refractive index film 101 can also be 5 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, 50 nm, 55 nm, 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, or other values ​​or ranges.

[0073] In some embodiments, the thicknesses of the different high-refractive-index film layers 101 vary. The thickness of the high-refractive-index film layers 101 at different locations can be adaptively selected according to the actual application scenario.

[0074] In some embodiments, the thickness of the low-refractive-index film 102 is 1 nm to 200 nm. Preferably, the thickness of the low-refractive-index film 102 is 10 nm to 150 nm. More preferably, the thickness of the low-refractive-index film 102 is 20 nm to 100 nm. In one specific example, the thickness of the low-refractive-index film 102 is 1 nm; in another specific example, the thickness of the low-refractive-index film 102 is 200 nm. It is easy to understand that in other examples, the thickness of the low-refractive-index film 102 can also be 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, 55 nm, 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, 160 nm, 170 nm, 190 nm, or other values ​​or ranges.

[0075] In some embodiments, the thickness of different low-refractive-index film layers 102 is different, and the thickness of low-refractive-index film layers 102 at different locations can be adaptively selected according to the actual application scenario.

[0076] In some embodiments, the thickness of the hydrophobic film layer 200 is 1 nm to 200 nm. Preferably, the thickness of the hydrophobic film layer 200 is no greater than 100 nm. In one specific example, the thickness of the hydrophobic film layer 200 is 50 nm; in another specific example, the thickness of the hydrophobic film layer 200 is 200 nm. It is easy to understand that in other examples, the thickness of the hydrophobic film layer 200 can also be 5 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, 55 nm, 60 nm, 65 nm, 70 nm, 75 nm, 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 120 nm, 130 nm, 135 nm, 140 nm, 150 nm, 155 nm, 165 nm, 180 nm, 190 nm, 195 nm, or other values ​​or ranges.

[0077] For example, in a specific example, the number of high-refractive-index film layers 101 is three, and correspondingly, the number of low-refractive-index film layers 102 is two. The film system structure in the multilayer film 100 is a first high-refractive-index film layer 101, a first low-refractive-index film layer 102, a second high-refractive-index film layer 101, a second low-refractive-index film layer 102, and a third high-refractive-index film layer 101. The thickness of the first high-refractive-index film layer 101 is 10 nm to 18 nm; the thickness of the first low-refractive-index film layer 102 is 33 nm to 35 nm; the thickness of the second high-refractive-index film layer 101 is 65 nm to 70 nm; the thickness of the second low-refractive-index film layer 102 is 1.5 nm to 3 nm; and the thickness of the third high-refractive-index film layer 101 is 42 nm to 45 nm.

[0078] For example, in a specific example, the high refractive index film 101 has four layers, and correspondingly, the low refractive index film 102 has three layers. The multilayer film 100 has the following film structure: a first high-refractive-index film 101, a first low-refractive-index film 102, a second high-refractive-index film 101, a second low-refractive-index film 102, a third high-refractive-index film 101, a third low-refractive-index film 102, and a fourth high-refractive-index film 101. The thickness of the first high-refractive-index film 101 is 10 nm to 18 nm; the thickness of the first low-refractive-index film 102 is 33 nm to 35 nm; the thickness of the second high-refractive-index film 101 is 65 nm to 70 nm; the thickness of the second low-refractive-index film 102 is 1.5 nm to 3 nm; the thickness of the third high-refractive-index film 101 is 42 nm to 45 nm; the thickness of the third low-refractive-index film 102 is 0.5 nm to 5 nm; and the thickness of the fourth high-refractive-index film 101 is 40 nm to 60 nm.

[0079] In some embodiments, the high refractive index film 101 is prepared from one or more of TiO2, Ta2O5, HfO2, Nb2O5, ZrO2, and Al2O3.

[0080] In some embodiments, the low refractive index film 102 is prepared from one or both of SiO2 and MgF2.

[0081] An embodiment of this application also provides a method for preparing a multifunctional membrane 10.

[0082] It should be noted that, unless otherwise stated, the reaction steps may be performed in the order described herein or not. For example, other steps may be included between reaction steps, and the order of reaction steps may be appropriately interchanged. This is something that those skilled in the art can determine based on conventional knowledge and experience. Preferably, the reaction methods described herein are performed sequentially.

[0083] A method for preparing a multifunctional membrane 10 includes the following steps:

[0084] A multilayer film 100 is prepared on a substrate by sequentially and alternately overlapping multiple high-refractive-index film layers 101 and multiple low-refractive-index film layers 102.

[0085] Furthermore, a hydrophobic film layer 200 is prepared on the outermost high-refractive-index film layer 101 of the multilayer film 100. The structure of the prepared multifunctional film 10 is shown in Figure 1.

[0086] In some embodiments, when preparing a multilayer film 100 on a substrate, which consists of multiple high-refractive-index film layers 101 and multiple low-refractive-index film layers 102 alternately overlapped in sequence, one or more of the following methods are employed: atomic layer deposition, magnetron sputtering, ion beam sputtering, and evaporation deposition.

[0087] In some embodiments, when preparing high-refractive-index film 101 and low-refractive-index film 102 using atomic layer deposition, the process includes: introducing an inert gas such as Ar and / or N2 with a flow rate of 100 sccm to 5000 sccm into the chamber to carry the source; after complete purging, introducing an inert gas such as Ar and / or N2 with a flow rate of 100 sccm to 5000 sccm into the chamber to participate in the reaction and purging; repeating this process to deposit each high-refractive-index film 101; and introducing the source into the chamber to participate in the reaction and purging using the same method, repeating this process to deposit each low-refractive-index film 102, and controlling the required thickness.

[0088] In some embodiments, when preparing a high-refractive-index film 101 and a low-refractive-index film 102 using magnetron sputtering, the process includes: ionizing an inert gas such as Ar with a radio frequency power supply of 200W to 8000W and an Ar flow rate of 50sccm to 1000sccm; bombarding the target surface with the generated argon ions to sputter and deposit its atoms onto the substrate; and alternatingly depositing the high-refractive-index film 101 and the low-refractive-index film 102 by changing the target material and controlling the required thickness.

[0089] In some embodiments, when preparing the high refractive index film 101 and the low refractive index film 102 using an ion beam sputtering method, the process includes: ionizing an inert gas such as Ar with an ion source power of 200W to 8000W and an Ar flow rate of 100sccm to 2000sccm; bombarding the target material with the generated ion beam to cause its atoms to be sputtered and deposited onto the substrate; and alternatingly depositing the high refractive index film 101 and the low refractive index film 102 by changing the target material, while controlling the required thickness.

[0090] In some embodiments, when preparing the high-refractive-index film 101 and the low-refractive-index film 102 using an evaporation deposition method, the process includes: placing the high-refractive-index material and the low-refractive-index material to be evaporated into evaporation crucibles respectively, controlling the evaporation current to be 10A to 15A, and maintaining a cavity vacuum degree of less than 10A. -4 Pa, alternately deposit high-refractive-index film layer 101 and low-refractive-index film layer 102, and control the required thickness.

[0091] In some embodiments, when preparing a hydrophobic film 200 on the outermost high refractive index film 101 of the multilayer film 100, the following steps are included: introducing a monomer source and a protective gas into the reaction chamber for deposition.

[0092] In some embodiments, the monomer source is selected from one or more of hexamethyldisiloxane, octamethylcyclotetrasiloxane, hexamethyldisiloxane, tetramethyldisiloxane, and tetraethylsiloxane.

[0093] In some embodiments, the preparation of a hydrophobic film layer 200 on the outermost high-refractive-index film layer 101 of the multilayer film 100 includes the following steps:

[0094] A precursor monomer source and a protective gas are introduced into the reaction chamber, and a hydrophobic film layer 200 is prepared by ionization reaction using the PECVD (Plasma-Enhanced Chemical Vapor Deposition) method.

[0095] In some embodiments, when the hydrophobic film layer 200 is prepared by the PECVD method, the protective gas includes argon (Ar).

[0096] In some embodiments, when preparing the hydrophobic film layer 200 by PECVD, the carrier gas flow rate of the precursor monomer source is 50 sccm to 2000 sccm, the ion source power is 100 W to 8000 W, and the protective gas flow rate is 100 sccm to 5000 sccm. Preferably, the carrier gas flow rate of the precursor monomer source is 10 sccm to 500 sccm. Preferably, the ion source power is 1000 W to 5000 W. Preferably, the protective gas flow rate is 500 sccm to 3000 sccm.

[0097] In some embodiments, the preparation of a hydrophobic film layer 200 on the outermost high-refractive-index film layer 101 of the multilayer film 100 includes the following steps:

[0098] A precursor monomer source and reactive plasma gas are introduced into the reaction chamber, and a hydrophobic film layer 200 is prepared by plasma reaction using the PEALD (Plasma-Enhanced Atomic Layer Deposition) method.

[0099] In some embodiments, when preparing the hydrophobic film 200 using the PEALD method, the reactive plasma gas includes argon (Ar) or hydrogen (H2).

[0100] In some embodiments, when preparing the hydrophobic film layer 200 using the PEALD method, the carrier gas flow rate of the monomer source during the reaction is 50 sccm to 2000 sccm, the ion source power is 100 W to 8000 W, and the argon or hydrogen flow rate is 100 sccm to 5000 sccm. Preferably, the carrier gas flow rate of the precursor monomer source during the reaction is 10 sccm to 500 sccm, and the ion source power is 500 W to 5000 W. Preferably, the argon or hydrogen flow rate is 500 sccm to 3000 sccm.

[0101] In some embodiments, during the fabrication of the hydrophobic film 200, variations in the concentration of the monomer source within the reaction chamber and / or the discharge power of the plasma source are controlled to regulate the carbon-oxygen ratio of the hydrophobic film. Controlling the concentration of the monomer source within the reaction chamber or varying the plasma discharge power allows for the regulation of the deposition ratio of carbon and oxygen atoms in the deposited hydrophobic film, thereby controlling the carbon-oxygen ratio of the grown hydrophobic film. For example, the carbon-oxygen ratio on the side of the hydrophobic film 200 in contact with the multilayer film 100 is controlled to be (0.2-2.5):(0.7-2.3). Preferably, the carbon-oxygen ratio at the bottom of the hydrophobic film 200 in contact with the multilayer film 100 is controlled to be (0.7-2.2):(0.9-2.2). More preferably, the carbon-oxygen ratio at the bottom of the hydrophobic film 200 in contact with the multilayer film 100 is controlled to be (1-2):(1-2). It should be noted that the side of the hydrophobic film layer 200 that contacts the multilayer film 100 can be a region of 1 / 4 to 1 / 2 of the thickness of the hydrophobic film layer 200 that contacts the multilayer film 100 in the thickness direction.

[0102] In some embodiments, when preparing the hydrophobic film layer 200, the carbon-to-oxygen ratio of the side of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to be (1.6-2.7):(0.5-1). Preferably, the carbon-to-oxygen ratio of the surface layer of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to be (1.7-2.4):(0.6-0.95). More preferably, the carbon-to-oxygen ratio of the surface layer of the hydrophobic film layer 200 away from the multilayer film 100 is controlled to be (2-2.4):(0.75-0.9). It should be noted that the side of the hydrophobic film layer 200 away from the multilayer film 100 can be a region that is 1 / 4 to 1 / 2 of the thickness of the multilayer film 100 in the thickness direction of the hydrophobic film layer 200.

[0103] In some embodiments, the carbon-oxygen ratio in the hydrophobic film layer 200 changes continuously or in stages from the side in contact with the multilayer film 100 to the side away from the multilayer film 100. This continuous change gives the hydrophobic film layer 200 itself high wear resistance.

[0104] In some embodiments, the continuous change described above includes one or more of linear continuous increase, linear continuous decrease, nonlinear continuous increase, and nonlinear continuous decrease. The staged change described above includes one or more of staged increase, staged decrease, staged increase followed by decrease, staged decrease followed by increase, alternating staged increase or decrease in a regular manner, and irregular alternation of staged increase or decrease.

[0105] Preferably, in this application, the side of the hydrophobic film layer 200 that contacts the multilayer film 100 has a low carbon-oxygen ratio, which can achieve a high bonding force between the hydrophobic film layer 200 and the multilayer film 100. The side of the hydrophobic film layer 200 that is away from the multilayer film 100 has a high carbon-oxygen ratio and high hydrophobicity, so that the hydrophobic film layer 200 has high hydrophobicity on the basis of having a good bonding force with the multilayer film 100.

[0106] One embodiment of this application also provides an application of a multifunctional membrane.

[0107] The multifunctional film of any one of the above-mentioned methods or the multifunctional film prepared by any one of the above-mentioned methods can be used in display devices, lenses, and solar cells.

[0108] One embodiment of this application also provides a light-transmitting panel.

[0109] A light-transmitting panel includes any of the above-described multifunctional film 10 or the multifunctional film 10 prepared by any of the above-described preparation methods.

[0110] In some embodiments, the substrate of the light-transmitting panel can be a glass plate, such as K9 glass.

[0111] In some embodiments, the light-transmitting panel can be applied to products such as display device panels, lenses of lens imaging systems, or glass panels of solar cells.

[0112] Example 1

[0113] This embodiment provides a multifunctional membrane 10.

[0114] The preparation method of the multifunctional membrane 10 in this embodiment includes the following steps:

[0115] Alternating high-refractive-index layers 101 and low-refractive-index layers 102 were prepared on a K9 glass substrate using atomic layer deposition. High-refractive-index layer 101 was a TiO2 film made of TiO2 material, and low-refractive-index layer 102 was a SiO2 film made of SiO2 material. The high-refractive-index layer 101 consisted of three layers, and the low-refractive-index layer 102 consisted of two layers, forming a multilayer film 100 with high-refractive-index layers 101 on both sides.

[0116] A hydrophobic film 200 is prepared on a high-refractive-index film 101 on one side of the multilayer film 100. The precursor hexamethyldisiloxane (HMDSO) and protective gas argon (Ar) are introduced into the reaction chamber, and the hydrophobic film 200 is prepared by ionization reaction using PECVD. The hydrophobic film 200 is a siloxane film. During the reaction, the carrier gas flow rate of the HMDSO monomer source is 50 sccm, the ion source power is 500 W, the argon flow rate is 750 sccm, the chamber pressure is 25 Pa, and the reaction chamber temperature is room temperature. The carbon-to-oxygen ratio at the bottom of the hydrophobic film 200 in contact with the multilayer film 100 is controlled to be 0.8:1, and the carbon-to-oxygen ratio at the surface of the hydrophobic film 200 away from the multilayer film 100 is 2:0.8.

[0117] The resulting membrane structure is TiO2 membrane layer / SiO2 membrane layer / TiO2 membrane layer / SiO2 membrane layer / TiO2 membrane layer / hydrophobic membrane layer 200, with the thicknesses of each layer being 15nm±2nm, 35nm±2nm, 70nm±2nm, 2nm±2nm, 42nm±2nm, and 90nm±2nm, respectively.

[0118] As shown in Figure 2, the reflectance curve of the multifunctional film 10 prepared in Example 1 is R<0.5%@420nm-708nm. Within the wavelength range of 420nm to 708nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%, indicating that the multifunctional film 10 of this embodiment has low reflectance over a relatively wide wavelength range (420nm to 708nm). Referring to Figure 3, which is a schematic diagram of the contact angle of the multifunctional film 10 prepared in Example 1 of this invention, the measured contact angle is approximately 102°, indicating that the multifunctional film 10 of Example 1 has good hydrophobicity. Wiping the surface of K9 glass 50 times with a 100g weight of alcohol-soaked lint-free cloth, the contact angle of the multifunctional film 10 remained almost unchanged before and after wiping, indicating that the multifunctional film 10 has good abrasion resistance. K9 glass was aged in a constant temperature and humidity chamber at 85% humidity and 85°C for 200 hours. The reflectivity did not change, and the contact angle of the multifunctional film 10 was about 100°. It can be seen that the multifunctional film 10 in this embodiment has good anti-aging performance.

[0119] Example 2

[0120] This embodiment provides a multifunctional membrane 10.

[0121] The preparation method of the multifunctional membrane 10 in this embodiment includes the following steps:

[0122] Alternating high-refractive-index layers 101 and low-refractive-index layers 102 were prepared on a K9 glass substrate using atomic layer deposition. High-refractive-index layer 101 was a TiO2 film made of TiO2 material, and low-refractive-index layer 102 was a SiO2 film made of SiO2 material. The high-refractive-index layer 101 consisted of four layers, and the low-refractive-index layer 102 consisted of three layers, forming a multilayer film 100 with high-refractive-index layers 101 on both sides.

[0123] A hydrophobic film 200 is prepared on a high-refractive-index film layer 101 on one side of the multilayer film 100. The precursor octamethylcyclotetrasiloxane (OMCTS) and protective gas argon (Ar) are introduced into a reaction chamber, and the hydrophobic film 200 is prepared by ionization reaction using the PEALD method. During the reaction, the carrier gas flow rate of the precursor OMCTS monomer source is 50 sccm, the ion source power is 500 W, the argon flow rate is 750 sccm, the chamber pressure is 25 Pa, and the reaction chamber temperature is room temperature. The carbon-to-oxygen ratio at the bottom of the hydrophobic film 200 in contact with the multilayer film 100 is controlled to be 0.8:1, and the carbon-to-oxygen ratio at the surface of the hydrophobic film 200 away from the multilayer film 100 is controlled to be 2:0.8.

[0124] The formed film structure is TiO2 film layer / SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / hydrophobic film layer 200, and the thicknesses of each layer of the film structure are 5nm±2nm, 55nm±2nm, 20nm±2nm, 28nm±2nm, 72nm±2nm, 7nm±2nm, 35nm±2nm, and 90nm±2nm, respectively.

[0125] As shown in Figure 4, which is a reflectance curve of the multifunctional film 10 prepared according to another embodiment of the present invention, R < 0.38% @ 416nm-708nm. Within the wavelength range of 416nm to 708nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.38%. This indicates that the multifunctional film 10 of this embodiment has a low reflectance over a relatively wide wavelength range (416nm to 708nm). Furthermore, compared to Example 1, the 8-layer film system in Example 2 has a wider reflectance range and a smaller average reflectance tolerance, resulting in better uniformity compared to the 6-layer film system in Example 1. This demonstrates that increasing the number of TiO2 and SiO2 film layers can reduce reflectance.

[0126] Example 3

[0127] This embodiment provides a multifunctional membrane 10.

[0128] The multifunctional membrane 10 in this embodiment was prepared using a method essentially the same as that in Example 1, except that the precursor in Example 3 was hexamethyldisilazane (HMDSO). The carbon-to-oxygen ratio at the bottom of the hydrophobic membrane layer 200 in contact with the multilayer membrane 100 was controlled to be 1.5:1, and the carbon-to-oxygen ratio at the surface of the hydrophobic membrane layer 200 away from the multilayer membrane 100 was controlled to be 2.2:0.7.

[0129] The reflectance of the multifunctional film 10 prepared in Example 3 is: R<0.5%@420nm-710nm. In the wavelength range of 420nm to 710nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%. It can be seen that the multifunctional film 10 of Example 3 has a low reflectance in a wide wavelength range (420nm to 710nm).

[0130] Example 4

[0131] This embodiment provides a multifunctional membrane 10.

[0132] The multifunctional membrane 10 in this embodiment was prepared using a method essentially the same as that in Example 2, except that in Example 4, the precursor was octamethylcyclotetrasiloxane (OMCTS). The carbon-to-oxygen ratio at the bottom of the hydrophobic membrane layer 200 in contact with the multilayer membrane 100 was controlled to be 0.5:2, and the carbon-to-oxygen ratio at the surface of the hydrophobic membrane layer 200 away from the multilayer membrane 100 was controlled to be 2.5:0.5.

[0133] The reflectance of the multifunctional film 10 prepared in Example 4 is: R<0.5%@420nm-710nm. In the wavelength range of 420nm to 710nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%. It can be seen that the multifunctional film 10 of Example 4 has a low reflectance in a wide wavelength range (420nm to 710nm).

[0134] Example 5

[0135] This embodiment provides a multifunctional membrane 10.

[0136] The multifunctional film 10 in this embodiment is prepared using a preparation method that is basically the same as that in Example 1. The difference is that in Example 5, the material of the high refractive index film 101 is Al2O3, and the material of the low refractive index film 102 is MgF2.

[0137] The reflectance of the multifunctional film 10 prepared in Example 5 is: R<0.5%@420nm-680nm. In the wavelength range of 420nm to 680nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%. It can be seen that the multifunctional film 10 of Example 5 has a low reflectance in a wide wavelength range (420nm to 680nm).

[0138] Example 6

[0139] This embodiment provides a multifunctional membrane 10.

[0140] The multifunctional film 10 in this embodiment is prepared using a preparation method that is basically the same as that in Example 2. The difference is that in Example 6, the material of the high refractive index film layer 101 is Ta2O5, and the material of the low refractive index film layer 102 is SiO2.

[0141] The reflectance of the multifunctional film 10 prepared in Example 6 is: R<0.5%@420nm-700nm. In the wavelength range of 420nm to 700nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%. It can be seen that the multifunctional film 10 of Example 6 has a low reflectance in a wide wavelength range (420nm to 700nm).

[0142] Example 7

[0143] This embodiment provides a multifunctional membrane 10.

[0144] The multifunctional membrane 10 in this embodiment was prepared using a method that is basically the same as that in Example 1. The difference is that in Example 7, the thickness of the hydrophobic membrane layer 200 is 200 nm.

[0145] The reflectance of the multifunctional film 10 prepared in Example 7 is: R<0.5%@420nm-705nm. In the wavelength range of 420nm to 705nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%. It can be seen that the multifunctional film 10 of Example 7 has a low reflectance in a wide wavelength range (420nm to 705nm).

[0146] Example 8

[0147] This embodiment provides a multifunctional membrane 10.

[0148] The multifunctional membrane 10 in this embodiment is prepared using a preparation method that is basically the same as that in Example 1. The difference is that in Example 8, the hydrophobic membrane layer 200 is prepared using the PEALD method in Example 2.

[0149] The reflectance of the multifunctional film 10 prepared in Example 8 is: R<0.5%@420nm-708nm. In the wavelength range of 420nm to 708nm, the reflectance (R) of the surface of the multifunctional film 10 is less than 0.5%. It can be seen that the multifunctional film 10 of Example 8 has a low reflectance in a wide wavelength range (420nm to 708nm).

[0150] Comparative Example 1

[0151] This comparative example provides an antireflective coating.

[0152] The preparation method of the antireflective film in this comparative example is basically the same as that in Example 1 in terms of the steps for preparing the high refractive index film layer 101 and the low refractive index film layer 102, but Comparative Example 1 does not contain the hydrophobic film layer 200. Specifically, it includes the following steps:

[0153] Alternating high-refractive-index layers 101 and low-refractive-index layers 102 were prepared on a K9 glass substrate using atomic layer deposition. High-refractive-index layer 101 is a TiO2 film made of TiO2 material, and low-refractive-index layer 102 is a SiO2 film made of SiO2 material. The high-refractive-index layer 101 has three layers, and the low-refractive-index layer 102 has three layers, forming a multilayer film 100.

[0154] The resulting film structure is TiO2 film layer / SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / TiO2 film layer, with the thicknesses of each layer being 15nm±2nm, 35nm±2nm, 70nm±2nm, 2nm±2nm, 42nm±2nm, and 90nm±2nm, respectively.

[0155] Referring to Figure 5, which shows the reflectance curve of the multifunctional film 10 prepared in Comparative Example 1, the reflectance R of the multilayer film 100 is <0.5% @ 426nm-700nm. Within the wavelength range of 426nm to 700nm, the reflectance (R) of the antireflection film surface is less than 0.5%, indicating that the antireflection film of the comparative example has a smaller reflectance bandwidth. Compared with Example 1, the reflectance bandwidth of Comparative Example 1 is reduced. Referring to Figure 6, which shows the contact angle of the multifunctional film 10 prepared in Example 1 of this invention, the contact angle of the multilayer film 100 is approximately 77°. It can be seen that Comparative Example 1 does not contain a hydrophobic film layer 200, and the antireflection film prepared in Comparative Example 1 is not hydrophobic.

[0156] Comparative Example 2

[0157] This comparative example provides an antireflective coating.

[0158] The preparation method of the antireflective film in this comparative example is basically the same as that in Example 1. The difference is that in Comparative Example 2, when preparing the multilayer film 100, the number of high refractive index film layers 101 is two, and the number of low refractive index film layers 102 is three, forming a multilayer film 100 with low refractive index film layers 102 on both sides. The resulting film structure is SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / hydrophobic film layer 200, and the thicknesses of each layer in the film structure are 150nm±2nm, 11nm±2nm, 35nm±2nm, 110nm±2nm, and 90nm±2nm, respectively.

[0159] The reflectance of the multifunctional film prepared in this comparative example is: R<0.5%@424nm-705nm. In the wavelength range of 424nm to 705nm, the reflectance (R) of the multifunctional film surface is less than 0.5%. It can be seen that the multifunctional film of this comparative example 2 has a low reflectance in a wide wavelength range (424nm to 705nm).

[0160] Comparative Example 3

[0161] This comparative example provides an antireflective coating.

[0162] The preparation method of the antireflective film in this comparative example is basically the same as that in Example 2. The difference is that in Comparative Example 3, when preparing the multilayer film 100, the number of high-refractive-index film layers 101 is three, and the number of low-refractive-index film layers 102 is four, forming a multilayer film 100 with low-refractive-index film layers 102 on both sides. The resulting film system structure is SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / SiO2 film layer / TiO2 film layer / SiO2 film layer / hydrophobic film layer 200, and the thicknesses of each layer of the film system structure are 55nm±2nm, 20nm±2nm, 28nm±2nm, 72nm±2nm, 7nm±2nm, 35nm±2nm, 5nm±2nm, and 90nm±2nm, respectively.

[0163] The multifunctional membrane prepared in this comparative example could not achieve the anti-reflection effect.

[0164] Comparative Example 4

[0165] This comparative example provides a multifunctional membrane.

[0166] The multifunctional membrane in this comparative example was prepared using a method that is basically the same as that in Example 1. The difference is that the thickness of the hydrophobic membrane layer in this comparative example is 300 nm.

[0167] The multifunctional membrane prepared in this comparative example could not achieve the anti-reflection effect.

[0168] In summary, compared with traditional technologies, the multifunctional membrane 10 of this application has the following technical advantages:

[0169] (1) After the high refractive index film layer 101 and the low refractive index film layer 102 are alternately stacked, the outermost high refractive index film layer 101 is then stacked and connected to the hydrophobic film layer 200, so as to achieve low reflectivity and hydrophobic function on the surface of the product, and has the advantages of anti-aging and wear resistance.

[0170] (2) When the hydrophobic film layer 200 is used to replace the traditional silicon oxide film, the reflectivity will increase to a certain extent. Therefore, this application can reduce the reflectivity of the entire multifunctional film 10 by increasing the number of high refractive index film layers 101 and low refractive index film layers 102 of the multilayer film 100.

[0171] (3) The carbon-oxygen ratio at the bottom of the hydrophobic film layer 200 in contact with the multilayer film 100 is (0.2-2.5):(0.7-2.3), and the carbon-oxygen ratio at the surface of the hydrophobic film layer 200 away from the multilayer film 100 is (1.6-2.7):(0.5-1). The hydrophobic film layer 200 can be grown by adjusting the carbon-oxygen ratio to further regulate the hydrophobicity of the hydrophobic film layer 200 and the bonding force of the multilayer film 100.

[0172] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0173] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0174] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the scope of protection of the present invention. Therefore, the scope of protection of this patent should be determined by the appended claims.

Claims

1. A multifunctional membrane, characterized in that, The invention includes an overlapping multilayer film and a hydrophobic film layer. The multilayer film includes multiple high-refractive-index film layers and multiple low-refractive-index film layers, which are alternately overlapped in sequence. The side of the multilayer film connected to the hydrophobic film layer is the high-refractive-index film layer. The hydrophobic film layer includes elements Si, C, and O.

2. The multifunctional membrane according to claim 1, characterized in that, The carbon-to-oxygen ratio at the bottom of the hydrophobic film layer in contact with the multilayer film is (0.2-2.5):(0.7-2.3).

3. The multifunctional membrane according to claim 1, characterized in that, The carbon-to-oxygen ratio of the hydrophobic film layer away from the surface of the multilayer film is (1.6-2.7):(0.5-1).

4. The multifunctional membrane according to claim 1, characterized in that, The carbon-oxygen ratio in the hydrophobic film layer changes continuously or in stages from the side in contact with the multilayer film to the side away from the multilayer film.

5. The multifunctional membrane according to claim 1, characterized in that, The hydrophobic film layer includes a siloxane film layer.

6. The multifunctional membrane according to any one of claims 1 to 5, characterized in that, The side of the multilayer film furthest from the hydrophobic film layer is the high refractive index film layer.

7. The multifunctional membrane according to any one of claims 1 to 6, characterized in that, In the multilayer film, the number of high refractive index film layers is not less than two.

8. The multifunctional membrane according to any one of claims 1 to 7, characterized in that, The thickness of the high refractive index film is 1 nm to 150 nm.

9. The multifunctional membrane according to any one of claims 1 to 8, characterized in that, The thickness of the low-refractive-index film is 1 nm to 200 nm.

10. The multifunctional membrane according to any one of claims 1 to 9, characterized in that, The thickness of the hydrophobic film is 1 nm to 200 nm.

11. The multifunctional membrane according to claim 10, characterized in that, The thickness of the hydrophobic film layer is no greater than 100 nm.

12. The multifunctional membrane according to any one of claims 1 to 11, characterized in that, The materials used to prepare the high refractive index film include one or more of TiO2, Ta2O5, HfO2, Nb2O5, ZrO2, and Al2O3.

13. The multifunctional membrane according to any one of claims 1 to 12, characterized in that, The materials used to prepare the low-refractive-index film include one or both of SiO2 and MgF2.

14. A method for preparing a multifunctional membrane, characterized in that, Includes the following steps: A multilayer film consisting of alternating layers of high-refractive-index and low-refractive-index films is prepared on a substrate. In addition, a hydrophobic film layer is prepared on the outermost high refractive index film layer of the multilayer film.

15. The method for preparing the multifunctional membrane according to claim 14, characterized in that, When preparing a multilayer film consisting of multiple high-refractive-index films and multiple low-refractive-index films alternately overlapping on a substrate, one or more of the following methods are employed: atomic layer deposition, magnetron sputtering, ion beam sputtering, and evaporation deposition.

16. The method for preparing the multifunctional membrane according to claim 15, characterized in that, When preparing a hydrophobic film layer on the outermost high-refractive-index film layer of the multilayer film, the following steps are included: introducing a monomer source and a protective gas into the reaction chamber for deposition; the monomer source is selected from one or more of hexamethyldisiloxane, octamethylcyclotetrasiloxane, hexamethyldisiloxane, tetramethyldisiloxane and tetraethylsiloxane.

17. The method for preparing the multifunctional membrane according to claim 16, characterized in that, When preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: introducing a monomer source and a protective gas into the reaction chamber, and simultaneously introducing plasma to carry out an ionization reaction to prepare the hydrophobic film layer.

18. The method for preparing the multifunctional membrane according to claim 17, characterized in that, The protective gas includes argon; the carrier gas flow rate of the single source is 50 sccm to 2000 sccm, the power of the plasma source is 100W to 8000W, and the argon flow rate is 100 sccm to 5000 sccm.

19. The method for preparing the multifunctional membrane according to claim 16, characterized in that, When preparing a hydrophobic film layer on the outermost high refractive index film layer of the multilayer film, the following steps are included: introducing a monomer source and a reactive plasma gas sequentially into the reaction chamber, and preparing the hydrophobic film layer by performing a plasma reaction using an atomic layer deposition method.

20. The method for preparing the multifunctional membrane according to claim 19, characterized in that, The reactive plasma gas includes argon or hydrogen; the carrier gas flow rate of the single source is 50 sccm to 2000 sccm, the power of the plasma source is 100W to 8000W, and the flow rate of argon or hydrogen is 100 sccm to 5000 sccm.

21. The method for preparing the multifunctional membrane according to any one of claims 17 to 20, characterized in that, During the preparation of the hydrophobic film, the concentration of the monomer source in the reaction chamber and / or the discharge power of the plasma source are controlled to adjust the carbon-oxygen ratio of the hydrophobic film.

22. The application of a multifunctional film according to any one of claims 1 to 13 or a multifunctional film prepared by the preparation method according to any one of claims 14 to 21 in at least display devices, lenses, and solar cells.

23. A light-transmitting panel, characterized in that, The multifunctional membrane includes the multifunctional membrane according to any one of claims 1 to 13 or the multifunctional membrane prepared by the preparation method according to any one of claims 14 to 21.

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