A phase change memory cell uses a vacuum spacer between electrodes to minimize heat transfer and reduce reset currents.
Correlated electron materials switch impedance states via Mott transitions, bypassing slow structural phase changes to lower power consumption.
An oxygen-diffusion barrier pattern placed between the resistive layer and upper electrode maintains stable resistance switching states.
Segmented metal nitride electrodes with intervening layers disrupt columnar morphology to prevent etchant penetration and chalcogenide erosion.
A resistance type memory device uses a tungsten oxide layer between conductors to enable multiple-bit storage through adjustable resistivity states.
Nitrogen-doped amorphous silicon stabilizes metal ion filaments, resolving the trade-off between low operating current and data retention reliability.
Series coupled NDR devices stabilize integrated circuits against thermal noise without continuous power consumption.