Decorative Surface Effects TRIZ Cases

A substrate patterning method widens openings into spaced pillars that serve as etch masks for sub-lithographic features.

A transfer sheet uses a thermoplastic resin binder in its uneven layer to bond the release layer and prevent defective transfers.

Segmented upper yoke film prevents neck height induced track width extension, maintaining overwrite characteristics.

A suspended membrane structure uses a patterned dielectric layer to connect lower electrodes through conductive vias for capacitive detection.

A block copolymer layer undergoes microphase separation to form precise patterns on a neutral guide layer.

A MEMS base surface processing method applies a protective film to prevent unintended etching of non-ground regions during wet-etching.

Inkjet nozzles dispense precursor drops to form user-defined polymer films, eliminating vacuum processing costs and material wastage.

A pattern forming method uses block copolymer self-assembly to generate precise sub-10nm structures on semiconductor substrates.

Segmenting deposition from mechanical embossing controls aesthetic appearance and conductivity while maintaining electromagnetic signal transmissivity.

A decorative sheet uses a low hydroxyl value primer layer to achieve vivid raven blackness.

A conductive mask layer replaces dielectric materials in semiconductor fabrication to form precise openings.