Directional deposition forms masking layers on pyramidal pits to etch precise through-holes, reducing manufacturing complexity and cost.
Fabricating the lid from doped semiconductor material merges shielding and protection, eliminating costly assembly steps required by metal lids.
Capillary slots in MEMS cavities pull etching agents via capillary action, preventing bubble entrapment that blocks deep cavity access.
Segmented spring arms with integrated electrodes enable parallel micro device transfer while accommodating height variations.