A photo-detector uses a barrier layer to block majority carrier tunneling and thermalization between the absorbing layer and contact area.
Lateral trench growth bypasses critical thickness constraints, enhancing near-infrared light sensitivity.
A backside illuminated image sensor pixel positions circuitry adjacent to the interlinking diffusion region between the photodiode and die frontside.
Non-rectangular imaging zone minimizes wafer edge defects while maintaining signal integrity across larger body organs.
An irregular asperity on the back-illuminated silicon photodiode array enhances near-infrared spectral sensitivity while eliminating guard rings.
Transparent substrate material provides mechanical support during wafer grinding to achieve thin encapsulation structures.
A CdTe radiation detector UBM electrode structure uses layered sputtering to deposit metal films on the substrate.
Tapered dual-layer metal apertures create optical waveguides that focus light onto pixels, reducing crosstalk and leakage in dense image sensors.
Wafer bonding aligns micro-optical elements with sensor arrays, resolving sub-micron adjustment accuracy challenges in miniaturized optoelectronics.
Segmented substrate doping establishes independent potential wells across photodetector arrays to maintain stable reverse bias conditions.
Localized doping in a photodiode device extends charge collection time while reducing pixel crosstalk.
A solid-state imaging element positions a floating diffusion unit below a cross-shaped light shielding structure to block stray light.
This design simplifies manufacturing by eliminating complex sidewall routing steps while maximizing chip surface area through effective connection distribution.
Graded hafnium-aluminum-oxide and tantalum-oxide layers reduce dark current by inducing hole density, resolving thickness constraints.
A photoelectric conversion device incorporates a fifth semiconductor region with lowered impurity concentration to reduce leakage current.
Hexagonal pixel arrays with asymmetric TFT switches resolve interline pitch narrowing and signal line resistance issues in radiation detection elements.
Floating diffusion node readout circuit structure with charge recovery mechanism eliminates 1/f noise and memory storage requirements in hybrid sensors.
A phase difference detection pixel uses misaligned sub-lens vertices to direct light precisely onto photoelectric conversion elements.
Segmented doped barrier layers suppress dark current and enhance quantum efficiency in MWIR detection.
A p-n graphene electromagnetic wave detector uses differential photocurrents to achieve high sensitivity.
Asymmetric detection pixels provide precise alignment information, reducing information loss from manual adjustment errors in optical coherence tomography.
Resonant cavities boost absorption efficiency in silicon, eliminating hazardous materials and cooling requirements.