Nanoimprint recess patterning replaces LDI to form fine-line component carrier structures with fewer steps and fewer electrical opens.
A resist layer forming method uses a laminate roller and a forming press to adhere the resist layer on a base.
Photoresist molds shape resin openings in wiring substrates, replacing slow laser radiation to boost manufacturing speed.
Upward protrusions on the external connection terminal bottom layer enhance adhesiveness and heat dissipation, preventing peeling from thermal stress.