A method for preparing non-marking products based on microporous ceramic adsorption platform

Abstract

The present invention discloses a microporous ceramic adsorption platform and a method for preparing a non-marking product based on the microporous ceramic adsorption platform. The microporous ceramic adsorption platform does not contain a traditional groove design, thereby solving the problem of ultra-thin glass imprints and replacing the traditional groove vacuum adsorption platform. When preparing a non-marking product based on the adsorption platform, pattern photolithography, black glue film coating, soft baking, exposure and curing are sequentially performed to obtain a non-marking product. The manufacturing process is simple and easy to operate. The equipment matching, weight, flatness, adsorption effect, vacuum breaking effect, and particle adhesion of the manufactured microporous ceramic adsorption platform are verified; by comparing the traditional groove adsorption platform and the microporous ceramic adsorption platform under dark field strong light after photolithography under the same process conditions, it is confirmed that the product made using the microporous ceramic adsorption platform has the abnormal disappearance of the adsorption mark.

Description

Technical Field

[0001] The invention belongs to the field of optical lens production, and relates to a method for preparing a non-marking product based on a microporous ceramic adsorption platform. Background Art

[0002] Traditional groove adsorption platforms are all designed with grooves. The substrate for making optical lenses is ultra-thin glass (thickness 70~140μm). The groove adsorption platform can easily cause the ultra-thin glass to undergo groove-shaped deformation, resulting in focus differences due to the height difference inside and outside the groove during photolithography, which ultimately causes differences in the size of the image inside and outside the groove after photolithography is completed, causing defects. Summary of the invention

[0003] The purpose of the present invention is to overcome the disadvantage of the above-mentioned prior art that the adsorption platform has grooves so that the products prepared based on it have imprints, and to provide a method for preparing non-imprinted products based on a microporous ceramic adsorption platform.

[0004] In order to achieve the above object, the present invention adopts the following technical solutions:

[0005] A microporous ceramic adsorption platform comprises an adsorption plate, the adsorption plate is circular, three first through holes are opened in the center of the adsorption plate, and three second through holes are evenly opened at the edge of the adsorption plate;

[0006] The adsorption plate is a microporous ceramic plate, in which the opening rate is 40% and the pore size is 10-20 μm.

[0007] Preferably, the microporous ceramic plate has a bending strength greater than 40 Mpa, a compressive strength greater than or equal to 600 Mpa, and an HRA hardness greater than 50;

[0008] In the microporous ceramic plate, there are gaps between adjacent micropores, and the size of the gaps is 5 to 20 μm.

[0009] Preferably, the microporous ceramic plate comprises alumina and silica;

[0010] In terms of mass percentage, the content of aluminum oxide in the microporous ceramic plate is at least 80%, and the content of silicon dioxide is 18%.

[0011] Preferably, the acid resistance of the microporous ceramic plate is less than or equal to 10 mg / cm 2 , alkali resistance is less than 20 mg / cm 2 ;

[0012] The volume density of microporous ceramic plate is 2.3~2.5g / cm 3 .

[0013] A method for producing a non-marking product based on the microporous ceramic adsorption platform comprises the following steps:

[0014] Step 1) using photoresist to perform patterning on the adsorption plate;

[0015] Step 2) coating a black glue film on the surface of the adsorption plate after photolithography;

[0016] Step 3) The adsorption plate coated with the black glue film is soft-baked, exposed and cured in sequence to obtain a non-marking product made based on the microporous ceramic adsorption platform.

[0017] Preferably, the photoresist is mixed with a photosensitive resin, a sensitizer and a solvent, wherein the feed ratio of the photosensitive resin, the sensitizer and the solvent is (0.2~1)g:1g:10ml.

[0018] Preferably, photoresists are divided into positive and negative types according to the images they form.

[0019] The positive photoresist is a linear phenolic resin;

[0020] The negative photoresist is polyvinyl laurate.

[0021] Preferably, in step 2), the coating thickness of the black glue film is 1.2 um;

[0022] In step 3), the soft baking conditions are: baking at a temperature of 90° C. for 60 seconds; and the curing is specifically heating at a temperature of 220° C. for 20 minutes.

[0023] Compared with the prior art, the present invention has the following beneficial effects:

[0024] The present invention discloses a microporous ceramic adsorption platform, which does not contain the traditional groove design, thereby solving the technology of ultra-thin glass imprint, replacing the traditional groove vacuum adsorption platform, and using microporous ceramic material to redesign the vacuum adsorption platform to solve the abnormal adsorption platform imprint caused by the traditional groove vacuum adsorption platform on the ultra-thin glass substrate. Because the important feature of the microporous ceramic material is that it has a large number of uniform and controllable pores, and the amount of vacuum allocated to each micropore is extremely small, it is difficult for the ultra-thin glass to undergo a large deformation at each micropore, so there is no obvious difference in the size of the pattern after photolithography; the 3D size of the groove adsorption platform of the measuring equipment is drawn, and a material manufacturer that meets the parameters of the microporous ceramic material is found to produce the microporous ceramic adsorption platform, requiring the pore size to be 10~20μm, the pore size to be 5~20μm, the surface to be wear-resistant and chemically stable, the mass to be small and the material to be dust-resistant.

[0025] Further, after the coating is exposed and developed, when the exposed portion is dissolved and the unexposed portion remains, the coating material is a positive photoresist, also known as a positive photoresist. Positive photoresist resin is a phenolic formaldehyde called linear phenolic resin, which provides the photoresist with adhesion and chemical resistance. When there is no dissolution inhibitor, the linear phenolic resin will dissolve in the developer. The photosensitizer is a photosensitive compound, the most common of which is diazonaphthoquinone (DNQ). Before exposure, DNQ is a strong dissolution inhibitor that reduces the dissolution rate of the resin. After ultraviolet exposure, DNQ chemically decomposes in the photoresist and becomes a solubility enhancer, which greatly increases the solubility factor in the developer to 100 or more. This exposure reaction produces carboxylic acid in DNQ, which is highly soluble in the developer. Positive photoresist has good contrast, so the generated graphics have good resolution. After the coating is exposed and developed, when the exposed portion is retained and the unexposed portion is dissolved, the coating material is a negative photoresist. After exposure to light, negative photoresist photosensitive resin can quickly undergo photocuring reaction in the exposed area, causing significant changes in the physical properties of this material, especially solubility and affinity. After appropriate solvent treatment, the soluble part is dissolved to obtain the desired image; polyvinyl alcohol laurate is used as a photosensitive material. Under the action of light, the double bonds in its molecules are opened, and the chains are cross-linked to form an insoluble network structure, which plays an anti-corrosion role. This is a typical negative photoresist.

[0026] The present invention also discloses a method for making a non-marked product based on a microporous ceramic adsorption platform, which sequentially performs pattern photolithography, coating a black glue film, soft baking, exposure and curing to obtain a non-marked product. The manufacturing process is simple and easy to operate. The equipment matching, weight, flatness, adsorption effect, vacuum breaking effect, and particle adhesion condition of the manufactured microporous ceramic adsorption platform are verified; by comparing the traditional groove adsorption platform and the microporous ceramic adsorption platform under dark field strong light after photolithography under the same process conditions, it is confirmed that the product made using the microporous ceramic adsorption platform has the abnormal disappearance of the adsorption mark. DETAILED DESCRIPTION

[0027] The present invention is described in further detail below:

[0028] Example 1

[0029] A microporous ceramic adsorption platform comprises an adsorption plate, the adsorption plate is circular, three first through holes are opened in the center of the adsorption plate, and three second through holes are evenly opened at the edge of the adsorption plate;

[0030] The adsorption plate is a microporous ceramic plate. The opening rate of the microporous ceramic plate is 40% and the pore size is 10~20μm.

[0031] Example 2

[0032] Except for the following contents, the rest are the same as Example 1.

[0033]

[0034] Example 3

[0035] A method for making a non-marking product based on the above-mentioned microporous ceramic adsorption platform comprises the following steps:

[0036] Step 1) using photoresist to perform patterning on the adsorption plate;

[0037] Step 2) coating a black glue film on the surface of the adsorption plate after photolithography;

[0038] Step 3) The adsorption plate coated with the black glue film is soft-baked, exposed and cured in sequence to obtain a non-marking product made based on the microporous ceramic adsorption platform.

[0039] The use of a microporous ceramic adsorption platform solves the abnormal adsorption mark of an ultra-thin glass substrate.

[0040] This technology is made by using glass-based black glue, which is a special negative photoresist. Photoresist, also known as photoresist, refers to a thin film material whose solubility changes through irradiation or radiation of ultraviolet light, electron beam, ion beam, X-ray, etc. It is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. When semiconductor materials are processed on the surface, if an appropriate selective photoresist is used, the desired image can be obtained on the surface. Photoresists are classified into two categories: positive and negative according to the image they form. In the photoresist process, after the coating is exposed and developed, the exposed part is dissolved and the unexposed part remains. The coating material is a positive photoresist. If the exposed part is retained and the unexposed part is dissolved, the coating material is a negative photoresist. In addition to the above-mentioned characteristics of photoresist, black glue has many excellent physical properties such as extremely low light transmittance (less than 3%) and reflectivity (less than 15%), scratch resistance, as well as good chemical stability and some other semiconductor properties. It is easy to prepare into light-blocking patterns in optical devices and has been widely used in structured light, ultra-thin fingerprints, camera optical structures and many other aspects.

[0041] To perform pattern photolithography on a glass substrate, first use a coating machine to spin coat a black film of a certain thickness on the first side. The thickness of the black film must be precisely controlled and adjusted according to product requirements. After coating, it is soft-baked at 90°C for 60 seconds to evaporate the solvent in the black film and enhance the adhesion between the black film and the glass substrate. Then, an exposure machine equipped with the first mask is used to expose the first side. Appropriate exposure energy and focus should be selected during exposure to ensure that the black film is fully exposed. After that, the first side is developed and finally sent to a box oven to cure the black film.

[0042] After baking, observe the products made with the microporous ceramic adsorption platform under dark light to confirm whether the platform solves the abnormal groove adsorption platform imprint.

[0043] Advantages of microporous ceramics: high porosity, the important feature of porous ceramics is that they have more uniform and porous pores. High heat resistance, because it is an object sintered at high temperature, it has the characteristics of high temperature resistance. Chemical corrosion resistance, objects made mainly of inert raw materials, weak chemical reactions such as acid and alkali. Wear resistance, with the hard characteristics of ceramics, and wear resistance. Lightweight, because the internal structure is uniformly porous, the specific gravity coefficient is 1.6-2.8 and the insulation performance is high and the resistance is large. Material, the material is clean. There will be no dust inside the porous ceramic, and there will be no dust in the vacuum state. High surface finish. After precision grinding, the porous ceramic material has a smooth surface and will not scratch the workpiece.

[0044] The above contents are only for explaining the technical idea of ​​the present invention and cannot be used to limit the protection scope of the present invention. Any changes made on the basis of the technical solution in accordance with the technical idea proposed by the present invention shall fall within the protection scope of the claims of the present invention.

Claims

1. A method for making a non-marking product based on a microporous ceramic adsorption platform, characterized in that: The steps include: Step 1) using photoresist to perform patterning on the adsorption plate; Step 2) coating a black glue film on the surface of the adsorption plate after photolithography; Step 3) The adsorption plate coated with the black glue film is soft-baked, exposed and cured in sequence to obtain a non-marking product made based on the microporous ceramic adsorption platform; The microporous ceramic adsorption platform includes an adsorption plate, which is circular, has three first through holes in the center, and three second through holes evenly arranged at the edge of the adsorption plate; The adsorption plate is a microporous ceramic plate, in which the opening rate is 40% and the pore size is 10~20μm; The bending strength of the microporous ceramic plate is greater than 40 Mpa, the compressive strength is greater than or equal to 600 Mpa, and the HRA hardness is greater than 50; In the microporous ceramic plate, there are gaps between adjacent micropores, and the size of the gaps is 5-20 μm; Microporous ceramic plates include alumina and silica; In terms of mass percentage, the content of aluminum oxide in the microporous ceramic plate is at least 80% and the content of silicon dioxide is 18%; The acid resistance of microporous ceramic plate is less than or equal to 10 mg / cm 2 , alkali resistance is less than 20 mg / cm 2 ; The volume density of microporous ceramic plate is 2.3~2.5g / cm 3 ; The photoresist is made of a mixture of photosensitive resin, sensitizer and solvent, wherein the feed ratio of photosensitive resin, sensitizer and solvent is (0.2~1)g:1g:10ml; The coating thickness of the black glue film is 1.2um; The soft baking conditions are: baking at 90°C for 60s; the curing conditions are: heating at 220°C for 20min.

2. The method for producing a non-marking product based on a microporous ceramic adsorption platform according to claim 1, characterized in that: Photoresists are divided into positive and negative types according to the images they form. The positive photoresist is a linear phenolic resin; The negative photoresist is polyvinyl laurate.

3. The method for producing a non-marking product based on a microporous ceramic adsorption platform according to claim 1, characterized in that: In step 2), the coating thickness of the black glue film is 1.2 um; In step 3), the soft baking conditions are: baking at a temperature of 90° C. for 60 seconds; and the curing is specifically heating at a temperature of 220° C. for 20 minutes.

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